Claims
- 1. A mask for use in microlithography, said mask comprising:membrane portions; support portions connected to said membrane portions; and a data storage element encoded with pattern information, said element located on said support portions.
- 2. The mask of claim 1, wherein said mask is formed of silicon and said element comprises an active programmable memory cell with an external signal connection configured to operably connect to a microlithographic tool.
- 3. The mask of claim 1, wherein said data storage element comprises magnetic random access memory device.
- 4. The mask of claim 1, wherein said data storage element comprises nonvolatile random access memory device.
- 5. The mask of claim 1, wherein said data storage element comprises a nonvolatile memory device.
- 6. A mask for use in microlithography, said mask comprising:membrane portions; support portions connected to said membrane portions; and a data storage element encoded with pattern information, said element located on said support portions, wherein said pattern information includes pattern density and membrane placement of each sub-field of said membrane.
- 7. The mask of claim 2, wherein said microlithographic tool comprises an electron beam projection lithography tool.
- 8. The mask of claim 1, wherein said mask comprises a stencil mask.
- 9. The mask of claim 1, wherein said mask comprises a continuous membrane mask.
- 10. A mask for use in microlithography, said mask comprising:a plurality of patterned sub-field membrane mask areas, struts extending between and supporting said membrane mask areas, and at least one pattern marking of encoded information located on said struts adjacent to said sub-field membrane mask areas.
- 11. A mask for use in microlithography, said mask comprising:a plurality of patterned sub-field membrane mask areas, struts extending between and supporting said membrane mask areas, and at least one pattern marking of encoded information located on said struts adjacent to said sub-field membrane mask areas, wherein said at least one pattern marking is etched into a planar surface of said struts.
- 12. A mask for use in microlithography, said mask comprising:a plurality of patterned sub-field membrane mask areas, struts extending between and supporting said membrane mask areas, and at least one pattern marking of encoded information located on said struts adjacent to said sub-field membrane mask areas, wherein said encoded information includes pattern density and membrane placement of each sub-field membrane.
- 13. A mask for use in microlithography, said mask comprising:a plurality of patterned sub-field membrane mask areas, struts extending between and supporting said membrane mask areas, and at least one pattern marking of encoded information located on said struts adjacent to said sub-field membrane mask areas, wherein said encoded information drives a microlithographic tool that comprises an electron beam (EB) projection lithography tool and said mask is scanned by said EB lithography tool for pattern data from said at least one pattern marking.
- 14. The mask of claim 10, wherein said mask comprises a stencil mask.
- 15. The mask of claim 10, wherein said mask comprises a continuous membrane mask.
FEDERAL RESEARCH STATEMENT
This invention was made with United States Government support under Agreement No N00019-99-3-1366 awarded by the Naval Air Systems Command. The United States Government has certain rights in this invention.
US Referenced Citations (2)
Number |
Name |
Date |
Kind |
6040095 |
Enichen et al. |
Mar 2000 |
A |
6379867 |
Mei et al. |
Apr 2002 |
B1 |