Michael Patra

Person

Oberkochen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Measurement illumination optical unit for guiding illumination ligh...
- Patent number 11,720,028
- Issue date Aug 8, 2023
- Carl Zeiss SMT GmbH
- Thomas Fischer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stop for arrangement in a constriction of an EUV illumination beam
- Patent number 11,350,513
- Issue date May 31, 2022
- Carl Zeiss SMT GmbH
- Michael Patra
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Optical system for transferring original structure portions of a li...
- Patent number 11,137,688
- Issue date Oct 5, 2021
- Carl Zeiss SMT GmbH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optic for projection lithography
- Patent number 10,928,733
- Issue date Feb 23, 2021
- Carl Zeiss SMT GmbH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical assembly for guiding an output beam of a free electron laser
- Patent number 10,928,734
- Issue date Feb 23, 2021
- Carl Zeiss SMT GmbH
- Michael Patra
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Optical system for a projection exposure apparatus
- Patent number 10,871,717
- Issue date Dec 22, 2020
- Carl Zeiss SMT GmbH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for the microlithographic production of microstructured comp...
- Patent number 10,802,403
- Issue date Oct 13, 2020
- Carl Zeiss SMT GmbH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure method and projection exposure apparatus for mi...
- Patent number 10,678,144
- Issue date Jun 9, 2020
- Carl Zeiss SMT GmbH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure method and projection exposure apparatus for mi...
- Patent number 10,514,611
- Issue date Dec 24, 2019
- Carl Zeiss SMT GmbH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system for EUV projection lithography
- Patent number 10,310,381
- Issue date Jun 4, 2019
- Carl Zeiss SMT GmbH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical component for use in a radiation source module of a project...
- Patent number 10,288,894
- Issue date May 14, 2019
- Carl Zeiss SMT GmbH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Facet mirror for an illumination optical unit for projection lithog...
- Patent number 10,216,091
- Issue date Feb 26, 2019
- Carl Zeiss SMT GmbH
- Markus Deguenther
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system for illuminating a mask in a microlithographic...
- Patent number 10,191,382
- Issue date Jan 29, 2019
- Carl Zeiss SMT GmbH
- Erich Schubert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic projection exposure apparatus having a multi-mirr...
- Patent number 10,146,135
- Issue date Dec 4, 2018
- Carl Zeiss SMT GmbH
- Michael Layh
- G02 - OPTICS
Information Patent Grant
Optical component
- Patent number 10,133,183
- Issue date Nov 20, 2018
- Carl Zeiss SMT GmbH
- Michael Patra
- G02 - OPTICS
Information Patent Grant
Illumination optical unit for EUV projection lithography
- Patent number 10,126,658
- Issue date Nov 13, 2018
- Carl Zeiss SMT GmbH
- Michael Patra
- G02 - OPTICS
Information Patent Grant
Beam distributing optical device and associated unit, system and ap...
- Patent number 10,061,203
- Issue date Aug 28, 2018
- Carl Zeiss SMT GmbH
- Markus Deguenther
- G02 - OPTICS
Information Patent Grant
Illumination optical unit for EUV projection lithography
- Patent number 10,018,917
- Issue date Jul 10, 2018
- Carl Zeiss SMT GmbH
- Stig Bieling
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus and method for controlling a projecti...
- Patent number 10,007,193
- Issue date Jun 26, 2018
- Carl Zeiss SMT GmbH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Spectacle lens for a display device that can be fitted on the head...
- Patent number 9,989,767
- Issue date Jun 5, 2018
- tooz technologies GmbH
- Hans-Juergen Dobschal
- G02 - OPTICS
Information Patent Grant
Spectacle lens for a display device that can be fitted on the head...
- Patent number 9,989,766
- Issue date Jun 5, 2018
- tooz technologies GmbH
- Hans-Juergen Dobschal
- G02 - OPTICS
Information Patent Grant
Illumination system of a microlithographic projection exposure appa...
- Patent number 9,983,483
- Issue date May 29, 2018
- Carl Zeiss SMT GmbH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system for illuminating a mask in a microlithographic...
- Patent number 9,977,333
- Issue date May 22, 2018
- Carl Zeiss SMT GmbH
- Erich Schubert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system for EUV projection lithography
- Patent number 9,958,783
- Issue date May 1, 2018
- Carl Zeiss SMT GmbH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithography illumination optical system and microlithography p...
- Patent number 9,933,704
- Issue date Apr 3, 2018
- Carl Zeiss SMT GmbH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical unit and illumination system for EUV projectio...
- Patent number 9,915,874
- Issue date Mar 13, 2018
- Carl Zeiss SMT GmbH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for monitoring multiple mirror arrays in an illum...
- Patent number 9,897,925
- Issue date Feb 20, 2018
- Carl Zeiss SMT GmbH
- Stefan Xalter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical unit
- Patent number 9,891,530
- Issue date Feb 13, 2018
- Carl Zeiss SMT GmbH
- Martin Endres
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System for producing structures in a substrate
- Patent number 9,880,474
- Issue date Jan 30, 2018
- Carl Zeiss SMT GmbH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system for an EUV projection lithographic projection e...
- Patent number 9,851,641
- Issue date Dec 26, 2017
- Carl Zeiss SMT GmbH
- Michael Patra
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL COMPONENT GROUP, IN PARTICULAR FOR USE IN AN ILLUMINATION D...
- Publication number 20240255856
- Publication date Aug 1, 2024
- Carl Zeiss SMT GMBH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING A POSITION OF A MIRROR
- Publication number 20240255319
- Publication date Aug 1, 2024
- Carl Zeiss SMT GMBH
- Michael Patra
- G01 - MEASURING TESTING
Information Patent Application
EUV ILLUMINATION DEVICE AND METHOD FOR OPERATING A MICROLITHOGRAPHI...
- Publication number 20240248410
- Publication date Jul 25, 2024
- Carl Zeiss SMT GMBH
- Michael Patra
- G02 - OPTICS
Information Patent Application
OPTICAL SYSTEM FOR A LITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20240012333
- Publication date Jan 11, 2024
- Carl Zeiss SMT GMBH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DIGITAL MICROMIRROR DEVICE FOR AN ILLUMINATION OPTICAL COMPONENT OF...
- Publication number 20230221649
- Publication date Jul 13, 2023
- Carl Zeiss SMT GMBH
- Michael Patra
- G02 - OPTICS
Information Patent Application
OPTICAL ILLUMINATION SYSTEM FOR GUIDING EUV RADIATION
- Publication number 20220163897
- Publication date May 26, 2022
- Carl Zeiss SMT GMBH
- Michael Patra
- G02 - OPTICS
Information Patent Application
MEASUREMENT ILLUMINATION OPTICAL UNIT FOR GUIDING ILLUMINATION LIGH...
- Publication number 20220057717
- Publication date Feb 24, 2022
- Carl Zeiss SMT GMBH
- Thomas Fischer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STOP FOR ARRANGEMENT IN A CONSTRICTION OF AN EUV ILLUMINATION BEAM
- Publication number 20210084741
- Publication date Mar 18, 2021
- Carl Zeiss SMT GMBH
- Michael Patra
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
OPTICAL SYSTEM FOR TRANSFERRING ORIGINAL STRUCTURE PORTIONS OF A LI...
- Publication number 20210055661
- Publication date Feb 25, 2021
- Carl Zeiss SMT GMBH
- Michael PATRA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION OPTIC FOR PROJECTION LITHOGRAPHY
- Publication number 20200348600
- Publication date Nov 5, 2020
- Carl Zeiss SMT GMBH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM FOR A PROJECTION EXPOSURE APPARATUS
- Publication number 20200218164
- Publication date Jul 9, 2020
- Carl Zeiss SMT GMBH
- Michael Patra
- G02 - OPTICS
Information Patent Application
PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS FOR MI...
- Publication number 20200096877
- Publication date Mar 26, 2020
- Carl Zeiss SMT GMBH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ASSEMBLY FOR GUIDING AN OUTPUT BEAM OF A FREE ELECTRON LASER
- Publication number 20200019064
- Publication date Jan 16, 2020
- Carl Zeiss SMT GMBH
- Michael Patra
- G02 - OPTICS
Information Patent Application
METHOD FOR THE MICROLITHOGRAPHIC PRODUCTION OF MICROSTRUCTURED COMP...
- Publication number 20190243248
- Publication date Aug 8, 2019
- Carl Zeiss SMT GMBH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS FOR MI...
- Publication number 20190204756
- Publication date Jul 4, 2019
- Carl Zeiss SMT GMBH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION SYSTEM FOR ILLUMINATING A MASK IN A MICROLITHOGRAPHIC...
- Publication number 20180335702
- Publication date Nov 22, 2018
- Carl Zeiss SMT GMBH
- Erich Schubert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...
- Publication number 20180246415
- Publication date Aug 30, 2018
- Carl Zeiss SMT GMBH
- Stefan Xalter
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
ILLUMINATION SYSTEM FOR EUV PROJECTION LITHOGRAPHY
- Publication number 20180224750
- Publication date Aug 9, 2018
- Carl Zeiss SMT GMBH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION SYSTEM FOR ILLUMINATING A MASK IN A MICROLITHOGRAPHIC...
- Publication number 20170351183
- Publication date Dec 7, 2017
- Carl Zeiss SMT GMBH
- Erich Schubert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL COMPONENT
- Publication number 20170293154
- Publication date Oct 12, 2017
- Carl Zeiss SMT GMBH
- Michael Patra
- G02 - OPTICS
Information Patent Application
SPECTACLE LENS FOR A DISPLAY DEVICE THAT CAN BE FITTED ON THE HEAD...
- Publication number 20170192237
- Publication date Jul 6, 2017
- CARL ZEISS SMART OPTICS GMBH
- Hans-Juergen DOBSCHAL
- G02 - OPTICS
Information Patent Application
FACET MIRROR FOR AN ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOG...
- Publication number 20170176865
- Publication date Jun 22, 2017
- Carl Zeiss SMT GMBH
- Markus Deguenther
- G02 - OPTICS
Information Patent Application
ILLUMINATION OPTICAL UNIT FOR EUV PROJECTION LITHOGRAPHY
- Publication number 20170160642
- Publication date Jun 8, 2017
- Carl Zeiss SMT GMBH
- Stig Bieling
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION APPARATUS FOR A PROJECTION EXPOSURE SYSTEM
- Publication number 20170082929
- Publication date Mar 23, 2017
- Carl Zeiss SMT GMBH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SPECTACLE LENS FOR A DISPLAY DEVICE THAT CAN BE FITTED ON THE HEAD...
- Publication number 20170045743
- Publication date Feb 16, 2017
- CARL ZEISS SMART OPTICS GMBH
- Hans-Juergen DOBSCHAL
- G02 - OPTICS
Information Patent Application
ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20170038691
- Publication date Feb 9, 2017
- Carl Zeiss SMT GMBH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV LIGHT SOURCE FOR A LIGHTING DEVICE OF A MICROLITHOGRAPHIC PROJE...
- Publication number 20170003597
- Publication date Jan 5, 2017
- Carl Zeiss SMT GMBH
- Michael Patra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL COMPONENT
- Publication number 20160370707
- Publication date Dec 22, 2016
- Carl Zeiss SMT GMBH
- Michael Patra
- G02 - OPTICS
Information Patent Application
BEAM DISTRIBUTING OPTICAL DEVICE AND ASSOCIATED UNIT, SYSTEM AND AP...
- Publication number 20160357114
- Publication date Dec 8, 2016
- Carl Zeiss SMT GMBH
- Markus Deguenther
- G02 - OPTICS
Information Patent Application
METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...
- Publication number 20160266502
- Publication date Sep 15, 2016
- Carl Zeiss SMT GMBH
- Stefan Xalter
- G01 - MEASURING TESTING

Michael Patra

Person

Patents Grantslast 30 patents

Measurement illumination optical unit for guiding illumination ligh...

Stop for arrangement in a constriction of an EUV illumination beam

Optical system for transferring original structure portions of a li...

Illumination optic for projection lithography

Optical assembly for guiding an output beam of a free electron laser

Optical system for a projection exposure apparatus

Method for the microlithographic production of microstructured comp...

Projection exposure method and projection exposure apparatus for mi...

Projection exposure method and projection exposure apparatus for mi...

Illumination system for EUV projection lithography

Optical component for use in a radiation source module of a project...

Facet mirror for an illumination optical unit for projection lithog...

Illumination system for illuminating a mask in a microlithographic...

Microlithographic projection exposure apparatus having a multi-mirr...

Optical component

Illumination optical unit for EUV projection lithography

Beam distributing optical device and associated unit, system and ap...

Illumination optical unit for EUV projection lithography

Projection exposure apparatus and method for controlling a projecti...

Spectacle lens for a display device that can be fitted on the head...

Spectacle lens for a display device that can be fitted on the head...

Illumination system of a microlithographic projection exposure appa...

Illumination system for illuminating a mask in a microlithographic...

Illumination system for EUV projection lithography

Microlithography illumination optical system and microlithography p...

Illumination optical unit and illumination system for EUV projectio...

Method and device for monitoring multiple mirror arrays in an illum...

Illumination optical unit

System for producing structures in a substrate

Illumination system for an EUV projection lithographic projection e...

Patents Applicationslast 30 patents

OPTICAL COMPONENT GROUP, IN PARTICULAR FOR USE IN AN ILLUMINATION D...

METHOD FOR DETERMINING A POSITION OF A MIRROR

EUV ILLUMINATION DEVICE AND METHOD FOR OPERATING A MICROLITHOGRAPHI...

OPTICAL SYSTEM FOR A LITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

DIGITAL MICROMIRROR DEVICE FOR AN ILLUMINATION OPTICAL COMPONENT OF...

OPTICAL ILLUMINATION SYSTEM FOR GUIDING EUV RADIATION

MEASUREMENT ILLUMINATION OPTICAL UNIT FOR GUIDING ILLUMINATION LIGH...

STOP FOR ARRANGEMENT IN A CONSTRICTION OF AN EUV ILLUMINATION BEAM

OPTICAL SYSTEM FOR TRANSFERRING ORIGINAL STRUCTURE PORTIONS OF A LI...

ILLUMINATION OPTIC FOR PROJECTION LITHOGRAPHY

OPTICAL SYSTEM FOR A PROJECTION EXPOSURE APPARATUS

PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS FOR MI...

OPTICAL ASSEMBLY FOR GUIDING AN OUTPUT BEAM OF A FREE ELECTRON LASER

METHOD FOR THE MICROLITHOGRAPHIC PRODUCTION OF MICROSTRUCTURED COMP...

PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS FOR MI...

ILLUMINATION SYSTEM FOR ILLUMINATING A MASK IN A MICROLITHOGRAPHIC...

METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...

ILLUMINATION SYSTEM FOR EUV PROJECTION LITHOGRAPHY

ILLUMINATION SYSTEM FOR ILLUMINATING A MASK IN A MICROLITHOGRAPHIC...

OPTICAL COMPONENT

SPECTACLE LENS FOR A DISPLAY DEVICE THAT CAN BE FITTED ON THE HEAD...

FACET MIRROR FOR AN ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOG...

ILLUMINATION OPTICAL UNIT FOR EUV PROJECTION LITHOGRAPHY

ILLUMINATION APPARATUS FOR A PROJECTION EXPOSURE SYSTEM

SPECTACLE LENS FOR A DISPLAY DEVICE THAT CAN BE FITTED ON THE HEAD...

ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...

EUV LIGHT SOURCE FOR A LIGHTING DEVICE OF A MICROLITHOGRAPHIC PROJE...

OPTICAL COMPONENT

BEAM DISTRIBUTING OPTICAL DEVICE AND ASSOCIATED UNIT, SYSTEM AND AP...

METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...