Michael S. Kang

Person

San Ramon, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Gas distribution system for ceramic showerhead of plasma etch reactor
- Patent number 10,366,865
- Issue date Jul 30, 2019
- Lam Research Corporation
- Michael Kang
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Gas distribution showerhead for inductively coupled plasma etch rea...
- Patent number 9,934,979
- Issue date Apr 3, 2018
- Lam Research Corporation
- Michael Kang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Replaceable upper chamber section of plasma processing apparatus
- Patent number 9,613,834
- Issue date Apr 4, 2017
- Lam Research Corporation
- Leonard J. Sharpless
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas distribution system for ceramic showerhead of plasma etch reactor
- Patent number 9,245,717
- Issue date Jan 26, 2016
- Lam Research Corporation
- Michael Kang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas distribution showerhead for inductively coupled plasma etch rea...
- Patent number 9,099,398
- Issue date Aug 4, 2015
- Lam Research Corporation
- Michael Kang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Temperature controlled window of a plasma processing chamber component
- Patent number 8,970,114
- Issue date Mar 3, 2015
- Lam Research Corporation
- Matt Busche
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bare aluminum baffles for resist stripping chambers
- Patent number 8,859,432
- Issue date Oct 14, 2014
- Lam Research Corporation
- Fred D. Egley
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Edge ring assembly for plasma etching chambers
- Patent number 8,845,856
- Issue date Sep 30, 2014
- Lam Research Corporation
- Michael S. Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas distribution showerhead for inductively coupled plasma etch rea...
- Patent number 8,562,785
- Issue date Oct 22, 2013
- Lam Research Corporation
- Michael Kang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Apparatus and method for temperature control of a semiconductor sub...
- Patent number 8,410,393
- Issue date Apr 2, 2013
- Lam Research Corporation
- Anthony Ricci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bare aluminum baffles for resist stripping chambers
- Patent number 8,313,635
- Issue date Nov 20, 2012
- Lam Research Corporation
- Fred D. Egley
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Bare aluminum baffles for resist stripping chambers
- Patent number 7,811,409
- Issue date Oct 12, 2010
- Lam Research Corporation
- Fred D. Egley
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
ASSAY FOR SARS-CoV-2 INFECTION OF VULNERABLE HUMAN CELLS
- Publication number 20240295544
- Publication date Sep 5, 2024
- Todd C. McDevitt
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Application
Gas Distribution System For Ceramic Showerhead of Plasma Etch Reactor
- Publication number 20160217977
- Publication date Jul 28, 2016
- LAM RESEARCH CORPORATION
- Michael Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS DISTRIBUTION SHOWERHEAD FOR INDUCTIVELY COUPLED PLASMA ETCH REA...
- Publication number 20150318147
- Publication date Nov 5, 2015
- LAM RESEARCH CORPORATION
- Michael KANG
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
EDGE RING ASSEMBLY FOR PLASMA ETCHING CHAMBERS
- Publication number 20140367047
- Publication date Dec 18, 2014
- Michael S. Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE CONTROLLED WINDOW OF A PLASMA PROCESSING CHAMBER COMPONENT
- Publication number 20140217895
- Publication date Aug 7, 2014
- LAM RESEARCH CORPORATION
- Matt Busche
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS DISTRIBUTION SHOWERHEAD FOR INDUCTIVELY COUPLED PLASMA ETCH REA...
- Publication number 20140065827
- Publication date Mar 6, 2014
- LAM RESEARCH CORPORATION
- Michael Kang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
BARE ALUMINUM BAFFLES FOR RESIST STRIPPING CHAMBERS
- Publication number 20130056022
- Publication date Mar 7, 2013
- LAM RESEARCH CORPORATION
- Fred D. Egley
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS DISTRIBUTION SYSTEM FOR CERAMIC SHOWERHEAD OF PLASMA ETCH REACTOR
- Publication number 20120305190
- Publication date Dec 6, 2012
- LAM RESEARCH CORPORATION
- Michael Kang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS DISTRIBUTION SHOWERHEAD FOR INDUCTIVELY COUPLED PLASMA ETCH REA...
- Publication number 20120309204
- Publication date Dec 6, 2012
- LAM RESEARCH CORPORATION
- Michael Kang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
APPARATUS AND METHOD FOR TEMPERATURE CONTROL OF A SEMICONDUCTOR SUB...
- Publication number 20110284505
- Publication date Nov 24, 2011
- LAM RESEARCH CORPORATION
- Anthony Ricci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE RING ASSEMBLY FOR PLASMA ETCHING CHAMBERS
- Publication number 20110126984
- Publication date Jun 2, 2011
- LAM RESEARCH CORPORATION
- Michael S. Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BARE ALUMINUM BAFFLES FOR RESIST STRIPPING CHAMBERS
- Publication number 20100319813
- Publication date Dec 23, 2010
- LAM RESEARCH CORPORATION
- Fred D. Egley
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REPLACEABLE UPPER CHAMBER SECTION OF PLASMA PROCESSING APPARATUS
- Publication number 20100243164
- Publication date Sep 30, 2010
- LAM RESEARCH CORPORATION
- Leonard J. Sharpless
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Bare aluminum baffles for resist stripping chambers
- Publication number 20080178906
- Publication date Jul 31, 2008
- Lam Research Corporation
- Fred D. Egley
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Bare aluminum baffles for resist stripping chambers
- Publication number 20050284573
- Publication date Dec 29, 2005
- Fred D. Egley
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Michael S. Kang

Person

Patents Grantslast 30 patents

Gas distribution system for ceramic showerhead of plasma etch reactor

Gas distribution showerhead for inductively coupled plasma etch rea...

Replaceable upper chamber section of plasma processing apparatus

Gas distribution system for ceramic showerhead of plasma etch reactor

Gas distribution showerhead for inductively coupled plasma etch rea...

Temperature controlled window of a plasma processing chamber component

Bare aluminum baffles for resist stripping chambers

Edge ring assembly for plasma etching chambers

Gas distribution showerhead for inductively coupled plasma etch rea...

Apparatus and method for temperature control of a semiconductor sub...

Bare aluminum baffles for resist stripping chambers

Bare aluminum baffles for resist stripping chambers

Patents Applicationslast 30 patents

ASSAY FOR SARS-CoV-2 INFECTION OF VULNERABLE HUMAN CELLS

Gas Distribution System For Ceramic Showerhead of Plasma Etch Reactor

GAS DISTRIBUTION SHOWERHEAD FOR INDUCTIVELY COUPLED PLASMA ETCH REA...

EDGE RING ASSEMBLY FOR PLASMA ETCHING CHAMBERS

TEMPERATURE CONTROLLED WINDOW OF A PLASMA PROCESSING CHAMBER COMPONENT

GAS DISTRIBUTION SHOWERHEAD FOR INDUCTIVELY COUPLED PLASMA ETCH REA...

BARE ALUMINUM BAFFLES FOR RESIST STRIPPING CHAMBERS

GAS DISTRIBUTION SYSTEM FOR CERAMIC SHOWERHEAD OF PLASMA ETCH REACTOR

GAS DISTRIBUTION SHOWERHEAD FOR INDUCTIVELY COUPLED PLASMA ETCH REA...

APPARATUS AND METHOD FOR TEMPERATURE CONTROL OF A SEMICONDUCTOR SUB...

EDGE RING ASSEMBLY FOR PLASMA ETCHING CHAMBERS

BARE ALUMINUM BAFFLES FOR RESIST STRIPPING CHAMBERS

REPLACEABLE UPPER CHAMBER SECTION OF PLASMA PROCESSING APPARATUS

Bare aluminum baffles for resist stripping chambers

Bare aluminum baffles for resist stripping chambers