Michel Luc Cote

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Handling of flat data for phase processing including growing shapes...
- Patent number 8,977,989
- Issue date Mar 10, 2015
- Synopsys, Inc.
- Michel L. Cote
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Layout of phase shifting photolithographic masks with refined shift...
- Patent number 8,566,757
- Issue date Oct 22, 2013
- Synopsys, Inc.
- Michel L. Cote
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon tolerance specification using shapes as design intent markers
- Patent number 8,255,840
- Issue date Aug 28, 2012
- Synopsys, Inc.
- Michel Cote
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Design and layout of phase shifting photolithographic masks
- Patent number 7,739,649
- Issue date Jun 15, 2010
- Synopsys, Inc.
- Michel L. Côté
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure control for phase shifting photolithographic masks
- Patent number 7,629,109
- Issue date Dec 8, 2009
- Synopsys, Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Handling of flat data for phase processing including growing shapes...
- Patent number 7,500,217
- Issue date Mar 3, 2009
- Synopsys, Inc.
- Michel Luc Côté
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon tolerance specification using shapes as design intent markers
- Patent number 7,458,045
- Issue date Nov 25, 2008
- Synopsys, Inc.
- Michel Cote
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Design and layout of phase shifting photolithographic masks
- Patent number 7,435,513
- Issue date Oct 14, 2008
- Synopsys, Inc.
- Michel L. Côté
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure control for phase shifting photolithographic masks
- Patent number 7,422,841
- Issue date Sep 9, 2008
- Synopsys, Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Design and layout of phase shifting photolithographic masks
- Patent number 7,348,108
- Issue date Mar 25, 2008
- Synopsys, Inc.
- Michel L. Côté
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Design and layout of phase shifting photolithographic masks
- Patent number 7,312,003
- Issue date Dec 25, 2007
- Synopsys, Inc.
- Michel L. Côté
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase conflict resolution for photolithographic masks
- Patent number 7,169,515
- Issue date Jan 30, 2007
- Synopsys, Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase conflict resolution for photolithographic masks
- Patent number 7,083,879
- Issue date Aug 1, 2006
- Synopsys, Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Standard cell design incorporating phase information
- Patent number 7,028,285
- Issue date Apr 11, 2006
- Synopsys, Inc.
- Michel L. Côté
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cutting patterns for full phase shifting masks
- Patent number 6,981,240
- Issue date Dec 27, 2005
- Synopsys, Inc.
- Christophe Pierrat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Design data format and hierarchy management for phase processing
- Patent number 6,978,436
- Issue date Dec 20, 2005
- Synopsys, Inc.
- Michel L. Côté
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Design and layout of phase shifting photolithographic masks
- Patent number 6,861,204
- Issue date Mar 1, 2005
- Synopsys, Inc.
- Michel Luc Côté
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure control for phase shifting photolithographic masks
- Patent number 6,852,471
- Issue date Feb 8, 2005
- Numerical Technologies, Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Accelerated layout processing using OPC pre-processing
- Patent number 6,807,663
- Issue date Oct 19, 2004
- Numerical Technologies, Inc.
- Michel Luc Côté
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Design and layout of phase shifting photolithographic masks
- Patent number 6,787,271
- Issue date Sep 7, 2004
- Numerical Technologies, Inc.
- Michel Luc Côté
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for facilitating process-compliant layout opti...
- Patent number 6,745,372
- Issue date Jun 1, 2004
- Numerical Technologies, Inc.
- Michel Luc Côté
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical proximity correction for phase shifting photolithographic m...
- Patent number 6,721,938
- Issue date Apr 13, 2004
- Numerical Technologies, Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shifting design and layout for static random access memory
- Patent number 6,681,379
- Issue date Jan 20, 2004
- Numerical Technologies, Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Design and Layout of Phase Shifting Photolithographic Masks
- Publication number 20100050149
- Publication date Feb 25, 2010
- Synopsys, Inc.
- Michel L. Cote
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure control for phase shifting photolithographic masks
- Publication number 20100040965
- Publication date Feb 18, 2010
- Synopsys, Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Handling Of Flat Data For Phase Processing Including Growing Shapes...
- Publication number 20090125867
- Publication date May 14, 2009
- Synopsys, Inc.
- Michel L. Cote
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Silicon Tolerance Specification Using Shapes As Design Intent Markers
- Publication number 20090055788
- Publication date Feb 26, 2009
- Michel Cote
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Exposure control for phase shifting photolithographic masks
- Publication number 20080187869
- Publication date Aug 7, 2008
- Synopsys, Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Design and Layout of Phase Shifting Photolithographic Masks
- Publication number 20080076042
- Publication date Mar 27, 2008
- Synopsys, Inc.
- Michel Luc Cote
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Silicon tolerance specification using shapes as design intent markers
- Publication number 20060095889
- Publication date May 4, 2006
- SYNOPSYS, INC.
- Michel Cote
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Design data format and hierarchy management for processing
- Publication number 20050166173
- Publication date Jul 28, 2005
- Synopsys, Inc.
- Michel L. Cote
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Design and layout of phase shifting photolithographic masks
- Publication number 20050031971
- Publication date Feb 10, 2005
- Numerical Technologies, Inc.
- Michel Luc Cote
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Design and layout of phase shifting photolithographic masks
- Publication number 20050031972
- Publication date Feb 10, 2005
- Numerical Technologies, Inc.
- Michel Luc Cote
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure control for phase shifting photolithographic masks
- Publication number 20040209193
- Publication date Oct 21, 2004
- Numerical Technologies, Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase conflict resolution for photolithographic masks
- Publication number 20040202965
- Publication date Oct 14, 2004
- Numerical Technologies, Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Design and layout of phase shifting photolithographic masks
- Publication number 20040185351
- Publication date Sep 23, 2004
- Numerical Technologies, Inc.
- Michel Luc Cote
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Design and layout of phase shifting photolithographic masks
- Publication number 20040175634
- Publication date Sep 9, 2004
- Numerical Technologies, Inc.
- Michel Luc Cote
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Accelerated layout processing using OPC pre-processing
- Publication number 20040060034
- Publication date Mar 25, 2004
- NUMERICAL TECHNOLOGIES, INC.
- Michel Luc Cote
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method and apparatus for facilitating process-compliant layout opti...
- Publication number 20030192013
- Publication date Oct 9, 2003
- Numerical Technologies, Inc.
- Michel Luc Cote
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Cutting patterns for full phase shifting masks
- Publication number 20030137886
- Publication date Jul 24, 2003
- NUMERICAL TECHNOLOGIES, INC.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase conflict resolution for photolithographic masks
- Publication number 20020197543
- Publication date Dec 26, 2002
- Numerical Technologies, Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical proximity correction for phase shifting photolithographic m...
- Publication number 20020188924
- Publication date Dec 12, 2002
- Numerical Technologies, Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure control for phase shifting photolithographic masks
- Publication number 20020187636
- Publication date Dec 12, 2002
- Numerical Technologies, Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Standard cell design incorporating phase information
- Publication number 20020155363
- Publication date Oct 24, 2002
- NUMERICAL TECHNOLOGIES, INC.
- Michel Luc Cote
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Design data format and hierarchy management for processing
- Publication number 20020152454
- Publication date Oct 17, 2002
- NUMERICAL TECHNOLOGIES, INC.
- Michel Luc Cote
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase shifting design and layout for static random access memory
- Publication number 20020129327
- Publication date Sep 12, 2002
- Numerical Technologies, Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Design and layout of phase shifting photolithographic masks
- Publication number 20020122994
- Publication date Sep 5, 2002
- Michel Luc Cote
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Michel Luc Cote

Person

Patents Grantslast 30 patents

Handling of flat data for phase processing including growing shapes...

Layout of phase shifting photolithographic masks with refined shift...

Silicon tolerance specification using shapes as design intent markers

Design and layout of phase shifting photolithographic masks

Exposure control for phase shifting photolithographic masks

Handling of flat data for phase processing including growing shapes...

Silicon tolerance specification using shapes as design intent markers

Design and layout of phase shifting photolithographic masks

Exposure control for phase shifting photolithographic masks

Design and layout of phase shifting photolithographic masks

Design and layout of phase shifting photolithographic masks

Phase conflict resolution for photolithographic masks

Phase conflict resolution for photolithographic masks

Standard cell design incorporating phase information

Cutting patterns for full phase shifting masks

Design data format and hierarchy management for phase processing

Design and layout of phase shifting photolithographic masks

Exposure control for phase shifting photolithographic masks

Accelerated layout processing using OPC pre-processing

Design and layout of phase shifting photolithographic masks

Method and apparatus for facilitating process-compliant layout opti...

Optical proximity correction for phase shifting photolithographic m...

Phase shifting design and layout for static random access memory

Patents Applicationslast 30 patents

Design and Layout of Phase Shifting Photolithographic Masks

Exposure control for phase shifting photolithographic masks

Handling Of Flat Data For Phase Processing Including Growing Shapes...

Silicon Tolerance Specification Using Shapes As Design Intent Markers

Exposure control for phase shifting photolithographic masks

Design and Layout of Phase Shifting Photolithographic Masks

Silicon tolerance specification using shapes as design intent markers

Design data format and hierarchy management for processing

Design and layout of phase shifting photolithographic masks

Design and layout of phase shifting photolithographic masks

Exposure control for phase shifting photolithographic masks

Phase conflict resolution for photolithographic masks

Design and layout of phase shifting photolithographic masks

Design and layout of phase shifting photolithographic masks

Accelerated layout processing using OPC pre-processing

Method and apparatus for facilitating process-compliant layout opti...

Cutting patterns for full phase shifting masks

Phase conflict resolution for photolithographic masks

Optical proximity correction for phase shifting photolithographic m...

Exposure control for phase shifting photolithographic masks

Standard cell design incorporating phase information

Design data format and hierarchy management for processing

Phase shifting design and layout for static random access memory

Design and layout of phase shifting photolithographic masks