Michiaki Hashimoto

Person

Tsukuba, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photosensitive resin composition and method of forming resist images
- Patent number 6,319,649
- Issue date Nov 20, 2001
- Hitachi, Ltd.
- Koji Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive quinone diazide and resin composition having high ab...
- Patent number 5,314,783
- Issue date May 24, 1994
- Hitachi Chemical Co., Ltd.
- Shigeru Koibuchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming a positive photoresist pattern utilizing contrast...
- Patent number 5,290,666
- Issue date Mar 1, 1994
- Hitachi, Ltd.
- Michiaki Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition and pattern formation using the same
- Patent number 5,215,858
- Issue date Jun 1, 1993
- Hitachi Chemical Company, Ltd.
- Shigeru Koibuchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for forming a pattern using a photosensitive azide and a hi...
- Patent number 5,024,920
- Issue date Jun 18, 1991
- Hitachi, Ltd.
- Hajime Morishita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation imaging process for forming pattern without alkali-solubl...
- Patent number 4,985,344
- Issue date Jan 15, 1991
- Hitachi, Ltd.
- Shoichi Uchino
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation imaging process for formation of contrast enhanced patter...
- Patent number 4,983,500
- Issue date Jan 8, 1991
- Hitachi, Ltd.
- Shouichi Uchino
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist pattern forming process with dry etching
- Patent number 4,835,089
- Issue date May 30, 1989
- Hitachi, Ltd.
- Takao Iwayanagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive composition with azide or bisazide compound with oxa...
- Patent number 4,728,594
- Issue date Mar 1, 1988
- Hitachi Chemical Co., Ltd.
- Saburo Nonogaki
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive azide composition with alkali soluble polymer and pr...
- Patent number 4,565,768
- Issue date Jan 21, 1986
- Hitachi Chemical Company, Ltd.
- Saburo Nonogaki
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method of producing color filters using dehydrating solution
- Patent number 4,430,400
- Issue date Feb 7, 1984
- Hitachi, Ltd.
- Toshio Nakano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Color solid-state imager
- Patent number 4,412,236
- Issue date Oct 25, 1983
- Hitachi, Ltd.
- Akira Sasano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Solid-state color imager and method of manufacturing the same
- Patent number 4,395,629
- Issue date Jul 26, 1983
- Hitachi, Ltd.
- Akira Sasano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of producing color filters
- Patent number 4,311,773
- Issue date Jan 19, 1982
- Hitachi, Ltd.
- Tadao Kaneko
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Color solid-state imager and method of making the same
- Patent number 4,285,007
- Issue date Aug 18, 1981
- Hitachi, Ltd.
- Toshio Nakano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for forming patternwise coated powder layer
- Patent number 4,273,842
- Issue date Jun 16, 1981
- Hitachi, Ltd.
- Saburo Nonogaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light sensitive photoresist materials
- Patent number 4,241,162
- Issue date Dec 23, 1980
- Hitachi, Ltd.
- Yoshio Hatano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Michiaki Hashimoto

Person

Patents Grantslast 30 patents

Photosensitive resin composition and method of forming resist images

Photosensitive quinone diazide and resin composition having high ab...

Method of forming a positive photoresist pattern utilizing contrast...

Photosensitive resin composition and pattern formation using the same

Process for forming a pattern using a photosensitive azide and a hi...

Radiation imaging process for forming pattern without alkali-solubl...

Radiation imaging process for formation of contrast enhanced patter...

Resist pattern forming process with dry etching

Photosensitive composition with azide or bisazide compound with oxa...

Photosensitive azide composition with alkali soluble polymer and pr...

Method of producing color filters using dehydrating solution

Color solid-state imager

Solid-state color imager and method of manufacturing the same

Method of producing color filters

Color solid-state imager and method of making the same

Process for forming patternwise coated powder layer

Light sensitive photoresist materials