Number | Date | Country | Kind |
---|---|---|---|
63-190641 | Aug 1988 | JPX |
This is a File-wrapper-continuation application of application Ser. No. 07/381,876, filed Jul. 19, 1989, now abandoned.
Number | Name | Date | Kind |
---|---|---|---|
3219447 | Neugebauer et al. | Nov 1965 | |
3539345 | Welch | Nov 1970 | |
3679419 | Gillich | Jul 1972 | |
4469772 | Barton et al. | Sep 1984 | |
4482489 | Di Pippo | Nov 1984 | |
4499170 | Amariti et al. | Feb 1985 | |
4777111 | Blumel et al. | Oct 1988 | |
4889795 | Kaifa et al. | Dec 1989 | |
4985344 | Uchino et al. | Jan 1991 |
Number | Date | Country |
---|---|---|
0102450 | Mar 1984 | EPX |
0136679 | Apr 1985 | EPX |
0161660 | Nov 1985 | EPX |
0234327 | Sep 1987 | EPX |
0249941 | Dec 1987 | EPX |
51-93998 | Aug 1976 | JPX |
59-45439 | Mar 1984 | JPX |
60-238829 | Nov 1985 | JPX |
61-219038 | Sep 1986 | JPX |
63-13035 | Jan 1988 | JPX |
Entry |
---|
English translation of pertinent portions of Semicon News 1988.8, pp. 92-98. |
West, P. R. et al., "Contrast Enhanced Photolithograpy: Application of Photobleaching Processes in Microlithography", J. of Imaging Science, vol. 30, No. 2, Mar./Apr., 1986, pp. 65-68. |
M. Hashimoto et al, "I-line resist for half-micron lithography" pp. 88-95, Technical Proceedings, Semicon/Japan, 1989, Nov. 13-15, Tokyo, by Semiconductor Equipment and Materials International. |
Number | Date | Country | |
---|---|---|---|
Parent | 381876 | Jul 1989 |