Minfeng Chen

Person

Hsinchu, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Method of manufacturing a semiconductor device and apparatus for ma...
- Patent number 11,709,435
- Issue date Jul 25, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shinn-Sheng Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing a semiconductor device and apparatus for ma...
- Patent number 11,320,747
- Issue date May 3, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shinn-Sheng Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming photomask and photolithography method
- Patent number 11,307,492
- Issue date Apr 19, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shih-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask design for generating plasmonic effect
- Patent number 11,211,374
- Issue date Dec 28, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Minfeng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pellicle structure for lithography mask
- Patent number 11,175,597
- Issue date Nov 16, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet (EUV) polarization splitter
- Patent number 10,962,885
- Issue date Mar 30, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Minfeng Chen
- G02 - OPTICS
Information Patent Grant
Method of manufacturing a semiconductor device and apparatus for ma...
- Patent number 10,866,525
- Issue date Dec 15, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shinn-Sheng Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming photomask and photolithography method
- Patent number 10,845,699
- Issue date Nov 24, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask design for generating plasmonic effect
- Patent number 10,685,950
- Issue date Jun 16, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Minfeng Chen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20240393690
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Tse Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...
- Publication number 20230333486
- Publication date Oct 19, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shinn-Sheng YU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20230004087
- Publication date Jan 5, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Tse Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME
- Publication number 20220350236
- Publication date Nov 3, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Minfeng CHEN
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...
- Publication number 20220260931
- Publication date Aug 18, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shinn-Sheng YU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...
- Publication number 20210096475
- Publication date Apr 1, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shinn-Sheng YU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING PHOTOMASK AND PHOTOLITHOGRAPHY METHOD
- Publication number 20210080822
- Publication date Mar 18, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Ming CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOMASK DESIGN FOR GENERATING PLASMONIC EFFECT
- Publication number 20200312835
- Publication date Oct 1, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Minfeng CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PELLICLE STRUCTURE FOR LITHOGRAPHY MASK
- Publication number 20200174382
- Publication date Jun 4, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Ming CHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET (EUV) POLARIZATION SPLITTER
- Publication number 20200124978
- Publication date Apr 23, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Minfeng CHEN
- G02 - OPTICS
Information Patent Application
EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME
- Publication number 20200041892
- Publication date Feb 6, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Minfeng CHEN
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...
- Publication number 20200041915
- Publication date Feb 6, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shinn-Sheng YU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING PHOTOMASK AND PHOTOLITHOGRAPHY METHOD
- Publication number 20190163051
- Publication date May 30, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Ming CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Photomask Design for Generating Plasmonic Effect
- Publication number 20190006343
- Publication date Jan 3, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Minfeng Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Minfeng Chen

Person

Patents Grantslast 30 patents

Method of manufacturing a semiconductor device and apparatus for ma...

Method of manufacturing a semiconductor device and apparatus for ma...

Method for forming photomask and photolithography method

Photomask design for generating plasmonic effect

Pellicle structure for lithography mask

Extreme ultraviolet (EUV) polarization splitter

Method of manufacturing a semiconductor device and apparatus for ma...

Method for forming photomask and photolithography method

Photomask design for generating plasmonic effect

Patents Applicationslast 30 patents

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...

METHOD FOR FORMING PHOTOMASK AND PHOTOLITHOGRAPHY METHOD

PHOTOMASK DESIGN FOR GENERATING PLASMONIC EFFECT

PELLICLE STRUCTURE FOR LITHOGRAPHY MASK

EXTREME ULTRAVIOLET (EUV) POLARIZATION SPLITTER

EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...

METHOD FOR FORMING PHOTOMASK AND PHOTOLITHOGRAPHY METHOD

Photomask Design for Generating Plasmonic Effect