Mircea Dusa

Person

Campbell, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for angular-resolved spectroscopic lithography...
- Patent number 11,525,786
- Issue date Dec 13, 2022
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for angular-resolved spectroscopic lithography...
- Patent number 10,955,353
- Issue date Mar 23, 2021
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G01 - MEASURING TESTING
Information Patent Grant
Substrate support, method for loading a substrate on a substrate su...
- Patent number 10,656,536
- Issue date May 19, 2020
- ASML Netherlands B.V.
- Martinus Hendrikus Antonius Leenders
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for angular-resolved spectroscopic lithography...
- Patent number 10,241,055
- Issue date Mar 26, 2019
- ASML Netherlands B.V.
- Arie Jeffrey Maria Den Boef
- G01 - MEASURING TESTING
Information Patent Grant
Methods for providing spaced lithography features on a substrate by...
- Patent number 9,368,366
- Issue date Jun 14, 2016
- ASML Netherlands B.V.
- Sander Frederik Wuister
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Alignment target contrast in a lithographic double patterning process
- Patent number 8,980,724
- Issue date Mar 17, 2015
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for angular-resolved spectroscopic lithography...
- Patent number 8,760,662
- Issue date Jun 24, 2014
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G01 - MEASURING TESTING
Information Patent Grant
Improving alignment target contrast in a lithographic double patter...
- Patent number 8,709,908
- Issue date Apr 29, 2014
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimization method and a lithographic cell
- Patent number 8,612,045
- Issue date Dec 17, 2013
- ASML Holding N.V.
- Everhardus Cornelis Mos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for angular-resolved spectroscopic lithography...
- Patent number 8,553,230
- Issue date Oct 8, 2013
- ASML Netherlands B.V.
- Arie Jeffrey Maria Den Boef
- G01 - MEASURING TESTING
Information Patent Grant
Inspection method and apparatus, lithographic apparatus, lithograph...
- Patent number 8,189,195
- Issue date May 29, 2012
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for angular-resolved spectroscopic lithography...
- Patent number 8,054,467
- Issue date Nov 8, 2011
- ASML Netherlands B.V.
- Arie Jeffrey Maria Den Boef
- G01 - MEASURING TESTING
Information Patent Grant
Inspection method and apparatus, lithographic apparatus, lithograph...
- Patent number 7,916,284
- Issue date Mar 29, 2011
- ASML Netherlands B.V.
- Mircea Dusa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for angular-resolved spectroscopic lithography...
- Patent number 7,791,732
- Issue date Sep 7, 2010
- ASML Netherlands B.V.
- Arie Jeffrey Maria Den Boef
- G01 - MEASURING TESTING
Information Patent Grant
Characterization of transmission losses in an optical system
- Patent number 7,791,724
- Issue date Sep 7, 2010
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for angular-resolved spectroscopic lithography...
- Patent number 7,791,727
- Issue date Sep 7, 2010
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G01 - MEASURING TESTING
Information Patent Grant
Semiconductor device for measuring an overlay error, method for mea...
- Patent number 7,786,477
- Issue date Aug 31, 2010
- ASML Netherlands B.V.
- Mircea Dusa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device for measuring an overlay error, method for mea...
- Patent number 7,704,850
- Issue date Apr 27, 2010
- ASML Netherlands B.V.
- Mircea Dusa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for angular-resolved spectroscopic lithography...
- Patent number 7,564,555
- Issue date Jul 21, 2009
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Focus determination method, device manufacturing method, and mask
- Patent number 7,532,307
- Issue date May 12, 2009
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic system, sensor, and method of measuring properties of...
- Patent number 7,480,050
- Issue date Jan 20, 2009
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G01 - MEASURING TESTING
Information Patent Grant
Marker structure, mask pattern, alignment method and lithographic m...
- Patent number 7,466,413
- Issue date Dec 16, 2008
- ASML Netherlands B.V.
- Jozef Maria Finders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection apparatus and method of inspection
- Patent number 7,315,384
- Issue date Jan 1, 2008
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G01 - MEASURING TESTING
Information Patent Grant
Test pattern, inspection method, and device manufacturing method
- Patent number 7,312,860
- Issue date Dec 25, 2007
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Test pattern, inspection method, and device manufacturing method
- Patent number 7,151,594
- Issue date Dec 19, 2006
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Test pattern, inspection method, and device manufacturing method
- Patent number 7,148,959
- Issue date Dec 12, 2006
- ASML Netherlands B.V.
- Mircea Dusa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device inspection method and apparatus using an asymmetric marker
- Patent number 7,112,813
- Issue date Sep 26, 2006
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Target acquisition technique for CD measurement machine
- Patent number 6,608,920
- Issue date Aug 19, 2003
- Applied Materials, Inc.
- Bo Su
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE SUPPORT, METHOD FOR LOADING A SUBSTRATE ON A SUBSTRATE SU...
- Publication number 20170192359
- Publication date Jul 6, 2017
- ASML NETHERLANDS B.V.
- Martinus Hendrikus Antonius LEENDERS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR PROVIDING SPACED LITHOGRAPHY FEATURES ON A SUBSTRATE BY...
- Publication number 20150364335
- Publication date Dec 17, 2015
- ASML NETHERLANDS B.V.
- Sander Frederik WUISTER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for Angular-Resolved Spectroscopic Lithography...
- Publication number 20140233025
- Publication date Aug 21, 2014
- ASML NETHERLANDS B.V.
- Arie Jeffrey Maria DEN BOEF
- G01 - MEASURING TESTING
Information Patent Application
Alignment Target Contrast in a Lithographic Double Patterning Process
- Publication number 20140192333
- Publication date Jul 10, 2014
- ASML NETHERLANDS B.V.
- Harry SEWELL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for Angular-Resolved Spectroscopic Lithography...
- Publication number 20140055788
- Publication date Feb 27, 2014
- ASML NETHERLANDS B.V.
- Arie Jeffrey Maria DEN BOEF
- G01 - MEASURING TESTING
Information Patent Application
Method and Apparatus for Angular-Resolved Spectroscopic Lithography...
- Publication number 20120038929
- Publication date Feb 16, 2012
- ASML NETHERLANDS B.V.
- Arie Jeffrey Maria Den Boef
- G01 - MEASURING TESTING
Information Patent Application
Method and apparatus for angular-resolved spectroscopic lithography...
- Publication number 20110007314
- Publication date Jan 13, 2011
- ASML NETHERLANDS B.V.
- Arie Jeffrey Maria Den Boef
- G01 - MEASURING TESTING
Information Patent Application
Alignment Target Contrast in a Lithographic Double Patterning Process
- Publication number 20100301458
- Publication date Dec 2, 2010
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optimization Method and a Lithographic Cell
- Publication number 20100161099
- Publication date Jun 24, 2010
- ASML NETHERLANDS B.V.
- Everhardus Cornelis Mos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MARKER STRUCTURE, MASK PATTERN, ALIGNMENT METHOD, AND LITHOGRAPHIC...
- Publication number 20090073406
- Publication date Mar 19, 2009
- ASML NETHERLANDS B.V.
- Jozef Maria Finders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Inspection method and apparatus, lithographic apparatus, lithograph...
- Publication number 20080279442
- Publication date Nov 13, 2008
- ASML NETHERLANDS B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor device for measuring an overlay error, method for mea...
- Publication number 20080149925
- Publication date Jun 26, 2008
- ASML NETHERLANDS B.V.
- Mircea Dusa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor device for measuring an overlay error, method for mea...
- Publication number 20080061291
- Publication date Mar 13, 2008
- ASML NETHERLANDS B.V.
- Mircea Dusa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for angular-resolved spectroscopic lithography...
- Publication number 20080043239
- Publication date Feb 21, 2008
- ASML NETHERLANDS B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Inspection method and apparatus, lithographic apparatus, lithograph...
- Publication number 20080018874
- Publication date Jan 24, 2008
- ASML NETHERLANDS B.V.
- Mircea Dusa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of characterising the transmission losses of an optical system
- Publication number 20070296960
- Publication date Dec 27, 2007
- ASML NETHERLANDS B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic system, sensor, and method of measuring properties of...
- Publication number 20070182964
- Publication date Aug 9, 2007
- ASML NETHERLANDS B.V.
- Arie Jeffrey Den Boef
- G01 - MEASURING TESTING
Information Patent Application
Test pattern, inspection method, and device manufacturing method
- Publication number 20070052948
- Publication date Mar 8, 2007
- ASML NETHERLANDS B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Focus determination method, device manufacturing method, and mask
- Publication number 20070003840
- Publication date Jan 4, 2007
- ASML NETHERLANDS B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Inspection apparatus and method of inspection
- Publication number 20060256324
- Publication date Nov 16, 2006
- ASML NETHERLANDS B.V.
- Arie Jeffrey Den Boef
- G01 - MEASURING TESTING
Information Patent Application
Latent overlay metrology
- Publication number 20060139592
- Publication date Jun 29, 2006
- ASML NETHERLANDS B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Latent overlay metrology
- Publication number 20060109463
- Publication date May 25, 2006
- ASML NETHERLANDS B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for angular-resolved spectroscopic lithography...
- Publication number 20060066855
- Publication date Mar 30, 2006
- ASML NETHERLANDS B.V.
- Arie Jeffrey Maria Den Boef
- G01 - MEASURING TESTING
Information Patent Application
Method and apparatus for angular-resolved spectroscopic lithography...
- Publication number 20060033921
- Publication date Feb 16, 2006
- ASML NETHERLANDS B.V.
- Arie Jeffrey Den Boef
- G01 - MEASURING TESTING
Information Patent Application
Marker structure, mask pattern, alignment method and lithographic m...
- Publication number 20050031969
- Publication date Feb 10, 2005
- ASML NETHERLANDS B.V.
- Jozef Maria Finders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Device inspection
- Publication number 20040129900
- Publication date Jul 8, 2004
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Test pattern, inspection method, and device manufacturing method
- Publication number 20040119970
- Publication date Jun 24, 2004
- Mircea Dusa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Test pattern, inspection method, and device manufacturing method
- Publication number 20040114132
- Publication date Jun 17, 2004
- ASML NETHERLANDS B.V,
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Mircea Dusa

Person

Patents Grantslast 30 patents

Method and apparatus for angular-resolved spectroscopic lithography...

Method and apparatus for angular-resolved spectroscopic lithography...

Substrate support, method for loading a substrate on a substrate su...

Method and apparatus for angular-resolved spectroscopic lithography...

Methods for providing spaced lithography features on a substrate by...

Alignment target contrast in a lithographic double patterning process

Method and apparatus for angular-resolved spectroscopic lithography...

Improving alignment target contrast in a lithographic double patter...

Optimization method and a lithographic cell

Method and apparatus for angular-resolved spectroscopic lithography...

Inspection method and apparatus, lithographic apparatus, lithograph...

Method and apparatus for angular-resolved spectroscopic lithography...

Inspection method and apparatus, lithographic apparatus, lithograph...

Method and apparatus for angular-resolved spectroscopic lithography...

Characterization of transmission losses in an optical system

Method and apparatus for angular-resolved spectroscopic lithography...

Semiconductor device for measuring an overlay error, method for mea...

Semiconductor device for measuring an overlay error, method for mea...

Method and apparatus for angular-resolved spectroscopic lithography...

Focus determination method, device manufacturing method, and mask

Lithographic system, sensor, and method of measuring properties of...

Marker structure, mask pattern, alignment method and lithographic m...

Inspection apparatus and method of inspection

Test pattern, inspection method, and device manufacturing method

Test pattern, inspection method, and device manufacturing method

Test pattern, inspection method, and device manufacturing method

Device inspection method and apparatus using an asymmetric marker

Target acquisition technique for CD measurement machine

Patents Applicationslast 30 patents

SUBSTRATE SUPPORT, METHOD FOR LOADING A SUBSTRATE ON A SUBSTRATE SU...

METHODS FOR PROVIDING SPACED LITHOGRAPHY FEATURES ON A SUBSTRATE BY...

Method and Apparatus for Angular-Resolved Spectroscopic Lithography...

Alignment Target Contrast in a Lithographic Double Patterning Process

Method and Apparatus for Angular-Resolved Spectroscopic Lithography...

Method and Apparatus for Angular-Resolved Spectroscopic Lithography...

Method and apparatus for angular-resolved spectroscopic lithography...

Alignment Target Contrast in a Lithographic Double Patterning Process

Optimization Method and a Lithographic Cell

MARKER STRUCTURE, MASK PATTERN, ALIGNMENT METHOD, AND LITHOGRAPHIC...

Inspection method and apparatus, lithographic apparatus, lithograph...

Semiconductor device for measuring an overlay error, method for mea...

Semiconductor device for measuring an overlay error, method for mea...

Method and apparatus for angular-resolved spectroscopic lithography...

Inspection method and apparatus, lithographic apparatus, lithograph...

Method of characterising the transmission losses of an optical system

Lithographic system, sensor, and method of measuring properties of...

Test pattern, inspection method, and device manufacturing method

Focus determination method, device manufacturing method, and mask

Inspection apparatus and method of inspection

Latent overlay metrology

Latent overlay metrology

Method and apparatus for angular-resolved spectroscopic lithography...

Method and apparatus for angular-resolved spectroscopic lithography...

Marker structure, mask pattern, alignment method and lithographic m...

Device inspection

Test pattern, inspection method, and device manufacturing method

Test pattern, inspection method, and device manufacturing method