Mitsuhiro HORIKAWA

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
DRAM MIM capacitor using non-noble electrodes
- Patent number 9,281,357
- Issue date Mar 8, 2016
- Intermolecular, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
DRAM MIM capacitor using non-noble electrodes
- Patent number 8,969,169
- Issue date Mar 3, 2015
- Intermolecular, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods to improve leakage for ZrO2 based high K MIM capacitor
- Patent number 8,815,695
- Issue date Aug 26, 2014
- Intermolecular, Inc.
- Xiangxin Rui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 8,748,325
- Issue date Jun 10, 2014
- Mitsuhiro Horikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
High performance dielectric stack for DRAM capacitor
- Patent number 8,546,236
- Issue date Oct 1, 2013
- Intermolecular, Inc.
- Sandra G. Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High performance dielectric stack for DRAM capacitor
- Patent number 8,541,283
- Issue date Sep 24, 2013
- Intermolecular, Inc.
- Sandra G. Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High performance dielectric stack for DRAM capacitor
- Patent number 8,476,141
- Issue date Jul 2, 2013
- Intermolecular, Inc.
- Sandra Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High performance dielectric stack for DRAM capacitor
- Patent number 8,415,227
- Issue date Apr 9, 2013
- Intermolecular, Inc.
- Sandra Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 8,026,184
- Issue date Sep 27, 2011
- Elpida Memory, Inc.
- Mitsuhiro Horikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 7,790,613
- Issue date Sep 7, 2010
- Elpida Memory, Inc.
- Mitsuhiro Horikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Memory with memory cells that include a MIM type capacitor with a l...
- Patent number 7,224,016
- Issue date May 29, 2007
- Elpida Memory, Inc.
- Yoshitaka Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing method
- Patent number 6,562,733
- Issue date May 13, 2003
- NEC Corporation
- Mitsuhiro Horikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing method including gettering of metal imp...
- Patent number 6,372,611
- Issue date Apr 16, 2002
- NEC Corporation
- Mitsuhiro Horikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor substrate and manufacturing method thereof
- Patent number 6,300,680
- Issue date Oct 9, 2001
- NEC Corporation
- Mitsuhiro Horikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor substrate having polysilicon layers and fabrication p...
- Patent number 6,046,095
- Issue date Apr 4, 2000
- NEC Corporation
- Mitsuhiro Horikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor substrate having silicon oxide layers formed between...
- Patent number 5,973,386
- Issue date Oct 26, 1999
- NEC Corporation
- Mitsuhiro Horikawa
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
DRAM MIM Capacitor Using Non-Noble Electrodes
- Publication number 20150137315
- Publication date May 21, 2015
- Intermolecular, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRAM MIM Capacitor Using Non-Noble Electrodes
- Publication number 20150087130
- Publication date Mar 26, 2015
- Elpida Memory, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods to Improve Leakage for ZrO2 Based High K MIM Capacitor
- Publication number 20140187015
- Publication date Jul 3, 2014
- Elpida Memory, Inc.
- Xiangxin Rui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods to Improve Leakage for ZrO2 Based High K MIM Capacitor
- Publication number 20140183696
- Publication date Jul 3, 2014
- INTERMOLECULAR INC.
- Xiangxin Rui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20140038424
- Publication date Feb 6, 2014
- Elpida Memory, Inc.
- Mitsuhiro HORIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH PERFORMANCE DIELECTRIC STACK FOR DRAM CAPACITOR
- Publication number 20130217202
- Publication date Aug 22, 2013
- Elpida Memory, Inc.
- Sandra G. Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High Performance Dielectric Stack for DRAM Capacitor
- Publication number 20130140619
- Publication date Jun 6, 2013
- Intermolecular, Inc.
- Sandra Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH PERFORMANCE DIELECTRIC STACK FOR DRAM CAPACITOR
- Publication number 20130143384
- Publication date Jun 6, 2013
- Elpida Memory, Inc.
- Sandra Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH PERFORMANCE DIELECTRIC STACK FOR DRAM CAPACITOR
- Publication number 20130052792
- Publication date Feb 28, 2013
- Elpida Memory, Inc.
- Sandra Malhotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STORAGE DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20090230510
- Publication date Sep 17, 2009
- Elpida Memory, Inc.
- Hiroshi Miki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor device and method for manufacturing semiconductor device
- Publication number 20090152677
- Publication date Jun 18, 2009
- Elpida Memory, Inc.
- Mitsuhiro HORIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20080210999
- Publication date Sep 4, 2008
- Elpida Memory
- Mitsuhiro HORIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20080157279
- Publication date Jul 3, 2008
- Elpida Memory, Inc.
- Mitsuhiro HORIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device having capacitor large in capacitance and high...
- Publication number 20070155115
- Publication date Jul 5, 2007
- ELPIDA MEMORY INC.
- Mitsuhiro Horikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMORY WITH MEMORY CELLS THAT INCLUDE A MIM TYPE CAPACITOR WITH A L...
- Publication number 20070148896
- Publication date Jun 28, 2007
- ELPIDA MEMORY, INC.
- Yoshitaka Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and fabrication method therefor
- Publication number 20040248362
- Publication date Dec 9, 2004
- ELPIDA MEMORY, INC.
- Yoshitaka Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD
- Publication number 20020037632
- Publication date Mar 28, 2002
- MITSUHIRO HORIKAWA
- H01 - BASIC ELECTRIC ELEMENTS

Mitsuhiro HORIKAWA

Person

Patents Grantslast 30 patents

DRAM MIM capacitor using non-noble electrodes

DRAM MIM capacitor using non-noble electrodes

Methods to improve leakage for ZrO2 based high K MIM capacitor

Method of manufacturing semiconductor device

High performance dielectric stack for DRAM capacitor

High performance dielectric stack for DRAM capacitor

High performance dielectric stack for DRAM capacitor

High performance dielectric stack for DRAM capacitor

Semiconductor device and method of manufacturing the same

Semiconductor device and method of manufacturing the same

Memory with memory cells that include a MIM type capacitor with a l...

Semiconductor device manufacturing method

Semiconductor manufacturing method including gettering of metal imp...

Semiconductor substrate and manufacturing method thereof

Semiconductor substrate having polysilicon layers and fabrication p...

Semiconductor substrate having silicon oxide layers formed between...

Patents Applicationslast 30 patents

DRAM MIM Capacitor Using Non-Noble Electrodes

DRAM MIM Capacitor Using Non-Noble Electrodes

Methods to Improve Leakage for ZrO2 Based High K MIM Capacitor

Methods to Improve Leakage for ZrO2 Based High K MIM Capacitor

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

HIGH PERFORMANCE DIELECTRIC STACK FOR DRAM CAPACITOR

High Performance Dielectric Stack for DRAM Capacitor

HIGH PERFORMANCE DIELECTRIC STACK FOR DRAM CAPACITOR

HIGH PERFORMANCE DIELECTRIC STACK FOR DRAM CAPACITOR

SEMICONDUCTOR STORAGE DEVICE AND METHOD OF MANUFACTURING THE SAME

Semiconductor device and method for manufacturing semiconductor device

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

Semiconductor device having capacitor large in capacitance and high...

MEMORY WITH MEMORY CELLS THAT INCLUDE A MIM TYPE CAPACITOR WITH A L...

Semiconductor device and fabrication method therefor

SEMICONDUCTOR DEVICE MANUFACTURING METHOD