Mitsuru Sato

Person

Hillsboro, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Chemical-sensitization resist composition
- Patent number 6,245,930
- Issue date Jun 12, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Katsumi Oomori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist laminate and method for patterning using the same
- Patent number 6,083,665
- Issue date Jul 4, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of removing coating from edge of substrate
- Patent number 6,015,467
- Issue date Jan 18, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Koichi Nagasawa
- B08 - CLEANING
Information Patent Grant
Chemical-sensitization resist composition
- Patent number 5,976,760
- Issue date Nov 2, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Katsumi Oomori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical-amplification-type negative resist composition and method...
- Patent number 5,955,241
- Issue date Sep 21, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Undercoating composition for photolithographic patterning
- Patent number 5,948,847
- Issue date Sep 7, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Etsuko Iguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative-working chemical-sensitization photoresist composition com...
- Patent number 5,928,837
- Issue date Jul 27, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist laminate and method for patterning using the same
- Patent number 5,925,495
- Issue date Jul 20, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Mitsuru Sato

Person

Patents Grantslast 30 patents

Chemical-sensitization resist composition

Photoresist laminate and method for patterning using the same

Method of removing coating from edge of substrate

Chemical-sensitization resist composition

Chemical-amplification-type negative resist composition and method...

Undercoating composition for photolithographic patterning

Negative-working chemical-sensitization photoresist composition com...

Photoresist laminate and method for patterning using the same