Motosuke Miyoshi

Person

Fujisawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate inspection apparatus, substrate inspection method and met...
- Patent number 7,847,250
- Issue date Dec 7, 2010
- Kabushiki Kaisha Toshiba
- Ichirota Nagahama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
X-ray source
- Patent number 7,649,980
- Issue date Jan 19, 2010
- The University of Tokyo
- Nobutada Aoki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate inspection apparatus, substrate inspection method and met...
- Patent number 7,462,829
- Issue date Dec 9, 2008
- Kabushiki Kaisha Toshiba
- Ichirota Nagahama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate inspection apparatus, substrate inspection method and met...
- Patent number 7,211,796
- Issue date May 1, 2007
- Kabushiki Kaisha Toshiba
- Ichirota Nagahama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electronic optical lens barrel and production method therefor
- Patent number 7,193,221
- Issue date Mar 20, 2007
- Toudai TLO, Ltd.
- Katsuya Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photomask repair method and apparatus
- Patent number 6,991,878
- Issue date Jan 31, 2006
- Kabushiki Kaisha Toshiba
- Shingo Kanamitsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam exposure system
- Patent number 6,815,698
- Issue date Nov 9, 2004
- Kabushiki Kaisha Toshiba
- Osamu Nagano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate inspection system and method for controlling same
- Patent number 6,768,112
- Issue date Jul 27, 2004
- Kabushiki Kaisha Toshiba
- Yuichiro Yamazaki
- G01 - MEASURING TESTING
Information Patent Grant
Substrate inspecting system using electron beam and substrate inspe...
- Patent number 6,563,114
- Issue date May 13, 2003
- Kabushiki Kaisha Toshiba
- Ichirota Nagahama
- G01 - MEASURING TESTING
Information Patent Grant
Eddy current loss measuring sensor, thickness measuring system, thi...
- Patent number 6,563,308
- Issue date May 13, 2003
- Kabushiki Kaisha Toshiba
- Osamu Nagano
- G01 - MEASURING TESTING
Information Patent Grant
Electron beam lithography system and pattern writing method
- Patent number 6,525,328
- Issue date Feb 25, 2003
- Kabushiki Kaisha Toshiba
- Motosuke Miyoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern dimension measuring system and pattern dimension measuring...
- Patent number 6,515,296
- Issue date Feb 4, 2003
- Kabushiki Kaisha Toshiba
- Fumio Komatsu
- G01 - MEASURING TESTING
Information Patent Grant
Charged beam drawing apparatus
- Patent number 6,495,841
- Issue date Dec 17, 2002
- Kabushiki Kaisha Toshiba
- Atsushi Ando
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus and method of controlling charged p...
- Patent number 6,414,323
- Issue date Jul 2, 2002
- Kabushiki Kaisha Toshiba
- Hideaki Abe
- G01 - MEASURING TESTING
Information Patent Grant
Semiconductor polishing apparatus and method for chemical/mechanica...
- Patent number 6,410,439
- Issue date Jun 25, 2002
- Kabushiki Kaisha Toshiba
- Masako Kodera
- B24 - GRINDING POLISHING
Information Patent Grant
Inspection method and apparatus using electron beam
- Patent number 6,265,719
- Issue date Jul 24, 2001
- Kabushiki Kaisha Toshiba
- Yuichiro Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam inspection method and apparatus
- Patent number 6,259,094
- Issue date Jul 10, 2001
- Kabushiki Kaisha Toshiba
- Takamitsu Nagai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic method utilizing charged particle beam exposure and fl...
- Patent number 6,171,760
- Issue date Jan 9, 2001
- Kabushiki Kaisha Toshiba
- Yuichiro Yamazaki
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Substrate inspecting apparatus, substrate inspecting system having...
- Patent number 6,038,018
- Issue date Mar 14, 2000
- Kabushiki Kaisha Toshiba
- Yuichiro Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam irradiating apparatus and electric signal detecting a...
- Patent number 5,818,217
- Issue date Oct 6, 1998
- Kabushiki Kaisha Toshiba
- Fumio Komatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma apparatus
- Patent number 5,639,308
- Issue date Jun 17, 1997
- Kabushiki Kaisha Toshiba
- Yuichiro Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focused ion beam deposition using TMCTS
- Patent number 5,639,699
- Issue date Jun 17, 1997
- Kabushiki Kaisha Toshiba
- Hiroko Nakamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer pattern defect detection method and apparatus therefor
- Patent number 5,576,833
- Issue date Nov 19, 1996
- Kabushiki Kaisha Toshiba
- Motosuke Miyoshi
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for repairing defect on plane surface of phase...
- Patent number 5,569,392
- Issue date Oct 29, 1996
- Kabushiki Kaisha Toshiba
- Motosuke Miyoshi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Magnetic field immersion type electron gun
- Patent number 5,548,183
- Issue date Aug 20, 1996
- Kabushiki Kaisha Toshiba
- Motosuke Miyoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing an electrostatic lens
- Patent number 5,535,508
- Issue date Jul 16, 1996
- Kabushiki Kaisha Toshiba
- Takamitsu Nagai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Defect detecting apparatus and method
- Patent number 5,498,874
- Issue date Mar 12, 1996
- Kabushiki Kaisha Toshiba
- Motosuke Miyoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle detection device and charged particle radiation ap...
- Patent number 5,491,339
- Issue date Feb 13, 1996
- Kabushiki Kaisha Toshiba
- Tadashi Mitsui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic lens and method for producing the same
- Patent number 5,444,256
- Issue date Aug 22, 1995
- Kabushiki Kaisha Toshiba
- Takamitsu Nagai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of repairing defect of structure
- Patent number 5,429,730
- Issue date Jul 4, 1995
- Kabushiki Kaisha Toshiba
- Hiroko Nakamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Substrate inspection apparatus, substrate inspection method and met...
- Publication number 20090072139
- Publication date Mar 19, 2009
- Kabushiki Kaisha Toshiba
- Ichirota Nagahama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
X-RAY SOURCE
- Publication number 20080304624
- Publication date Dec 11, 2008
- THE UNIVERSITY OF TOKYO
- Nobutada Aoki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate inspection apparatus, substrate inspection method and met...
- Publication number 20070187600
- Publication date Aug 16, 2007
- Kabushiki Kaisha Toshiba
- Ichirota Nagahama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electronic optical lens barrel and production method therefor
- Publication number 20050173649
- Publication date Aug 11, 2005
- Katsuya Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate inspection apparatus, substrate inspection method and met...
- Publication number 20050029451
- Publication date Feb 10, 2005
- Ichirota Nagahama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Photomask repair method and apparatus
- Publication number 20030215722
- Publication date Nov 20, 2003
- Shingo Kanamitsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EDDY CURRENT LOSS MEASURING SENSOR, THICKNESS MEASURING SYSTEM, THI...
- Publication number 20030067298
- Publication date Apr 10, 2003
- Kabushiki Kaisha Toshiba
- Osamu Nagano
- G01 - MEASURING TESTING
Information Patent Application
Substrate inspection system and method for controlling same
- Publication number 20020084411
- Publication date Jul 4, 2002
- Yuichiro Yamazaki
- G01 - MEASURING TESTING
Information Patent Application
Charged particle beam exposure system
- Publication number 20020033458
- Publication date Mar 21, 2002
- Osamu Nagano
- B82 - NANO-TECHNOLOGY

Motosuke Miyoshi

Person

Patents Grantslast 30 patents

Substrate inspection apparatus, substrate inspection method and met...

X-ray source

Substrate inspection apparatus, substrate inspection method and met...

Substrate inspection apparatus, substrate inspection method and met...

Electronic optical lens barrel and production method therefor

Photomask repair method and apparatus

Charged particle beam exposure system

Substrate inspection system and method for controlling same

Substrate inspecting system using electron beam and substrate inspe...

Eddy current loss measuring sensor, thickness measuring system, thi...

Electron beam lithography system and pattern writing method

Pattern dimension measuring system and pattern dimension measuring...

Charged beam drawing apparatus

Charged particle beam apparatus and method of controlling charged p...

Semiconductor polishing apparatus and method for chemical/mechanica...

Inspection method and apparatus using electron beam

Electron beam inspection method and apparatus

Lithographic method utilizing charged particle beam exposure and fl...

Substrate inspecting apparatus, substrate inspecting system having...

Electron beam irradiating apparatus and electric signal detecting a...

Plasma apparatus

Focused ion beam deposition using TMCTS

Wafer pattern defect detection method and apparatus therefor

Method and apparatus for repairing defect on plane surface of phase...

Magnetic field immersion type electron gun

Method for producing an electrostatic lens

Defect detecting apparatus and method

Charged particle detection device and charged particle radiation ap...

Electrostatic lens and method for producing the same

Method of repairing defect of structure

Patents Applicationslast 30 patents

Substrate inspection apparatus, substrate inspection method and met...

X-RAY SOURCE

Substrate inspection apparatus, substrate inspection method and met...

Electronic optical lens barrel and production method therefor

Substrate inspection apparatus, substrate inspection method and met...

Photomask repair method and apparatus

EDDY CURRENT LOSS MEASURING SENSOR, THICKNESS MEASURING SYSTEM, THI...

Substrate inspection system and method for controlling same

Charged particle beam exposure system