Naein Lee

Person

Hwasung-City, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor devices and methods of fabricating the same
- Patent number 10,497,647
- Issue date Dec 3, 2019
- Samsung Electronics Co., Ltd.
- Jongmin Baek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating a semiconductor device
- Patent number 10,438,802
- Issue date Oct 8, 2019
- Samsung Electronics Co., Ltd.
- Hyun Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of fabricating the same
- Patent number 10,199,325
- Issue date Feb 5, 2019
- Samsung Electronics Co., Ltd.
- Taejin Yim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device using a plurality of e...
- Patent number 10,192,782
- Issue date Jan 29, 2019
- Samsung Electronics Co., Ltd.
- Woojin Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Planarized interlayer dielectric with air gap isolation
- Patent number 10,186,485
- Issue date Jan 22, 2019
- Samsung Electronics Co., Ltd.
- VietHa Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices having staggered air gaps
- Patent number 10,141,258
- Issue date Nov 27, 2018
- Samsung Electronics Co., Ltd.
- Sangho Rha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of fabricating the same
- Patent number 10,109,665
- Issue date Oct 23, 2018
- Samsung Electronics Co., Ltd.
- Ho-Jin Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of fabricating the same
- Patent number 10,049,997
- Issue date Aug 14, 2018
- Samsung Electronics Co., Ltd.
- Ju-Il Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices
- Patent number 9,972,528
- Issue date May 15, 2018
- Samsung Electronics Co., Ltd.
- VietHa Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming semiconductor device having dielectric layer and...
- Patent number 9,953,827
- Issue date Apr 24, 2018
- Samsung Electronics Co., Ltd.
- Woochoel Noh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Planarized interlayer dielectric with air gap isolation
- Patent number 9,929,099
- Issue date Mar 27, 2018
- Samsung Electronics Co., Ltd.
- VietHa Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices and methods of fabricating the same
- Patent number 9,911,644
- Issue date Mar 6, 2018
- Samsung Electronics Co., Ltd.
- Wookyung You
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices including gaps between conductive patterns
- Patent number 9,842,803
- Issue date Dec 12, 2017
- Samsung Electronics Co., Ltd.
- Jongmin Baek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices having staggered air gaps
- Patent number 9,748,170
- Issue date Aug 29, 2017
- Samsung Electronics Co., Ltd.
- Sangho Rha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of treating a porous dielectric layer and a method of fabric...
- Patent number 9,576,848
- Issue date Feb 21, 2017
- Samsung Electronics Co., Ltd.
- Taejin Yim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices and methods of forming the same
- Patent number 9,548,389
- Issue date Jan 17, 2017
- Samsung Electronics Co., Ltd.
- Donghyun Roh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices and methods of fabricating the same
- Patent number 9,524,937
- Issue date Dec 20, 2016
- Samsung Electronics Co., Ltd.
- Jongmin Baek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices and methods of fabricating the same
- Patent number 9,520,300
- Issue date Dec 13, 2016
- Samsung Electronics Co., Ltd.
- Wookyung You
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices having staggered air gaps
- Patent number 9,343,409
- Issue date May 17, 2016
- Samsung Electronics Co., Ltd.
- Sangho Rha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices having through-electrodes and methods for fab...
- Patent number 9,312,171
- Issue date Apr 12, 2016
- Samsung Electronics Co., Ltd.
- Kyu-Hee Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices including multilayer source/drain stressors a...
- Patent number 9,299,836
- Issue date Mar 29, 2016
- Samsung Electronics Co, Ltd.
- Dong Hyuk Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices and methods of forming the same
- Patent number 9,252,235
- Issue date Feb 2, 2016
- Samsung Electronics Co., Ltd.
- Donghyun Roh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device including transistor and method of manufacturi...
- Patent number 9,082,874
- Issue date Jul 14, 2015
- Samsung Electronics Co., Ltd.
- Dong Hyuk Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device including transistor and method of manufacturi...
- Patent number 8,937,343
- Issue date Jan 20, 2015
- Samsung Electronics Co., Ltd.
- Dong Hyuk Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming semiconductor devices using electrolyzed sulfuri...
- Patent number 8,759,183
- Issue date Jun 24, 2014
- Samsung Electronics Co., Ltd.
- Jung Shik Heo
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLANARIZED INTERLAYER DIELECTRIC WITH AIR GAP ISOLATION
- Publication number 20180174977
- Publication date Jun 21, 2018
- Samsung Electronics Co., Ltd.
- VietHa Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME
- Publication number 20180151490
- Publication date May 31, 2018
- Samsung Electronics Co., Ltd.
- Taejin YIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING A SEMICONDUCTOR DEVICE
- Publication number 20180130665
- Publication date May 10, 2018
- Samsung Electronics Co., Ltd.
- Hyun PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING AN INTERPOSER AND A METHOD OF MANUFACTURING A SEM...
- Publication number 20180108540
- Publication date Apr 19, 2018
- Samsung Electronics Co., Ltd.
- Jae-Hyun Phee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES AND METHODS OF FABRICATING THE SAME
- Publication number 20180076127
- Publication date Mar 15, 2018
- Samsung Electronics Co., Ltd.
- Jongmin Baek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME
- Publication number 20180053797
- Publication date Feb 22, 2018
- Samsung Electronics Co., Ltd.
- Ho-Jin LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME
- Publication number 20170358545
- Publication date Dec 14, 2017
- Samsung Electronics Co., Ltd.
- JU-IL CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES HAVING STAGGERED AIR GAPS
- Publication number 20170323850
- Publication date Nov 9, 2017
- Samsung Electronics Co., Ltd.
- Sangho Rha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES
- Publication number 20170178949
- Publication date Jun 22, 2017
- Samsung Electronics Co., Ltd.
- VietHa Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLANARIZED INTERLAYER DIELECTRIC WITH AIR GAP ISOLATION
- Publication number 20170170184
- Publication date Jun 15, 2017
- Samsung Electronics Co., Ltd.
- VietHa Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES AND METHODS OF FABRICATING THE SAME
- Publication number 20170092578
- Publication date Mar 30, 2017
- Samsung Electronics Co., Ltd.
- Jongmin Baek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES AND METHODS OF FORMING THE SAME
- Publication number 20170092769
- Publication date Mar 30, 2017
- Samsung Electronics Co., Ltd.
- Donghyun Roh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING SEMICONDUCTOR DEVICE HAVING DIELECTRIC LAYER AND...
- Publication number 20170084481
- Publication date Mar 23, 2017
- Samsung Electronics Co., Ltd.
- Woochoel NOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES AND METHODS OF FABRICATING THE SAME
- Publication number 20170076975
- Publication date Mar 16, 2017
- Samsung Electronics Co., Ltd.
- Wookyung You
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES HAVING STAGGERED AIR GAPS
- Publication number 20160247759
- Publication date Aug 25, 2016
- Samsung Electronics Co., Ltd.
- Sangho Rha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF TREATING A POROUS DIELECTRIC LAYER AND A METHOD OF FABRIC...
- Publication number 20160148837
- Publication date May 26, 2016
- Samsung Electronics Co., Ltd.
- Taejin Yim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING A PLURALITY OF E...
- Publication number 20160133512
- Publication date May 12, 2016
- Woojin LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES AND METHODS OF FORMING THE SAME
- Publication number 20160111538
- Publication date Apr 21, 2016
- Samsung Electronics Co., Ltd.
- Donghyun Roh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES AND METHODS OF FABRICATING THE SAME
- Publication number 20150332955
- Publication date Nov 19, 2015
- Samsung Electronics Co., Ltd.
- Wookyung You
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES HAVING STAGGERED AIR GAPS
- Publication number 20150287676
- Publication date Oct 8, 2015
- Sangho Rha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES AND METHODS OF FABRICATING THE SAME
- Publication number 20150187699
- Publication date Jul 2, 2015
- Samsung Electronics Co., Ltd.
- Jongmin Baek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES INCLUDING MULTILAYER SOURCE/DRAIN STRESSORS A...
- Publication number 20150179795
- Publication date Jun 25, 2015
- Samsung Electronics Co., Ltd.
- Dong Hyuk Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES HAVING THROUGH-ELECTRODES AND METHODS FOR FAB...
- Publication number 20150155233
- Publication date Jun 4, 2015
- Samsung Electronics Co., Ltd.
- Kyu-Hee Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE INCLUDING TRANSISTOR AND METHOD OF MANUFACTURI...
- Publication number 20150140747
- Publication date May 21, 2015
- Samsung Electronics Co., Ltd.
- Dong Hyuk Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE INCLUDING TRANSISTOR AND METHOD OF MANUFACTURI...
- Publication number 20140084350
- Publication date Mar 27, 2014
- Samsung Electronics Co., Ltd.
- Dong Hyuk Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES INCLUDING MULTILAYER SOURCE/DRAIN STRESSORS A...
- Publication number 20140087537
- Publication date Mar 27, 2014
- Samsung Electronics Co., Ltd.
- Dong Hyuk Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES AND METHODS OF FORMING THE SAME
- Publication number 20140087535
- Publication date Mar 27, 2014
- Samsung Electronics Co., Ltd.
- Donghyun Roh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING SEMICONDUCTOR DEVICES USING ELECTROLYZED SULFURI...
- Publication number 20130171793
- Publication date Jul 4, 2013
- Jung Shik HEO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Forming Semiconductor Devices Including an Epitaxial Lay...
- Publication number 20130089961
- Publication date Apr 11, 2013
- SAMSUNG ELECTRONICS CO., LTD.
- Geo Myung SHIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE WITH IMPROVED STRESSOR SHAPE
- Publication number 20100230758
- Publication date Sep 16, 2010
- Chong Kwang CHANG
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Semiconductor devices and methods of fabricating the same

Method of fabricating a semiconductor device

Semiconductor device and method of fabricating the same

Method of manufacturing semiconductor device using a plurality of e...

Planarized interlayer dielectric with air gap isolation

Semiconductor devices having staggered air gaps

Semiconductor device and method of fabricating the same

Semiconductor device and method of fabricating the same

Semiconductor devices

Method of forming semiconductor device having dielectric layer and...

Planarized interlayer dielectric with air gap isolation

Semiconductor devices and methods of fabricating the same

Semiconductor devices including gaps between conductive patterns

Semiconductor devices having staggered air gaps

Method of treating a porous dielectric layer and a method of fabric...

Semiconductor devices and methods of forming the same

Semiconductor devices and methods of fabricating the same

Semiconductor devices and methods of fabricating the same

Semiconductor devices having staggered air gaps

Semiconductor devices having through-electrodes and methods for fab...

Semiconductor devices including multilayer source/drain stressors a...

Semiconductor devices and methods of forming the same

Semiconductor device including transistor and method of manufacturi...

Semiconductor device including transistor and method of manufacturi...

Methods of forming semiconductor devices using electrolyzed sulfuri...

Patents Applicationslast 30 patents

PLANARIZED INTERLAYER DIELECTRIC WITH AIR GAP ISOLATION

SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME

METHOD OF FABRICATING A SEMICONDUCTOR DEVICE

METHOD OF FORMING AN INTERPOSER AND A METHOD OF MANUFACTURING A SEM...

SEMICONDUCTOR DEVICES AND METHODS OF FABRICATING THE SAME

SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME

SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME

SEMICONDUCTOR DEVICES HAVING STAGGERED AIR GAPS

SEMICONDUCTOR DEVICES

PLANARIZED INTERLAYER DIELECTRIC WITH AIR GAP ISOLATION

SEMICONDUCTOR DEVICES AND METHODS OF FABRICATING THE SAME

SEMICONDUCTOR DEVICES AND METHODS OF FORMING THE SAME

METHOD OF FORMING SEMICONDUCTOR DEVICE HAVING DIELECTRIC LAYER AND...

SEMICONDUCTOR DEVICES AND METHODS OF FABRICATING THE SAME

SEMICONDUCTOR DEVICES HAVING STAGGERED AIR GAPS

METHOD OF TREATING A POROUS DIELECTRIC LAYER AND A METHOD OF FABRIC...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING A PLURALITY OF E...

SEMICONDUCTOR DEVICES AND METHODS OF FORMING THE SAME

SEMICONDUCTOR DEVICES AND METHODS OF FABRICATING THE SAME

SEMICONDUCTOR DEVICES HAVING STAGGERED AIR GAPS

SEMICONDUCTOR DEVICES AND METHODS OF FABRICATING THE SAME

SEMICONDUCTOR DEVICES INCLUDING MULTILAYER SOURCE/DRAIN STRESSORS A...

SEMICONDUCTOR DEVICES HAVING THROUGH-ELECTRODES AND METHODS FOR FAB...

SEMICONDUCTOR DEVICE INCLUDING TRANSISTOR AND METHOD OF MANUFACTURI...

SEMICONDUCTOR DEVICE INCLUDING TRANSISTOR AND METHOD OF MANUFACTURI...

SEMICONDUCTOR DEVICES INCLUDING MULTILAYER SOURCE/DRAIN STRESSORS A...

SEMICONDUCTOR DEVICES AND METHODS OF FORMING THE SAME

METHODS OF FORMING SEMICONDUCTOR DEVICES USING ELECTROLYZED SULFURI...

Methods of Forming Semiconductor Devices Including an Epitaxial Lay...

SEMICONDUCTOR DEVICE WITH IMPROVED STRESSOR SHAPE