Nancy Fung

Person

People

Patents Grantslast 30 patents

Information Patent Grant
Selective deposition of carbon on photoresist layer for lithography...
- Patent number 11,776,811
- Issue date Oct 3, 2023
- Applied Materials, Inc.
- Larry Gao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective anisotropic metal etch
- Patent number 11,658,043
- Issue date May 23, 2023
- Applied Materials, Inc.
- Jonathan Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for etching structures and smoothing sidewalls
- Patent number 11,658,042
- Issue date May 23, 2023
- Applied Materials, Inc.
- Nancy Fung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multicolor approach to DRAM STI active cut patterning
- Patent number 11,638,374
- Issue date Apr 25, 2023
- Applied Materials, Inc.
- Tejinder Singh
Information Patent Grant
Methods for etching structures with oxygen pulsing
- Patent number 11,527,414
- Issue date Dec 13, 2022
- Applied Materials, Inc.
- Nancy Fung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Patterning scheme to improve EUV resist and hard mask selectivity
- Patent number 11,437,238
- Issue date Sep 6, 2022
- Applied Materials, Inc.
- Nancy Fung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multicolor approach to DRAM STI active cut patterning
- Patent number 11,335,690
- Issue date May 17, 2022
- Applied Materials, Inc.
- Tejinder Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Diamond-like carbon as mandrel
- Patent number 10,954,129
- Issue date Mar 23, 2021
- Applied Materials, Inc.
- Takehito Koshizawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multicolor approach to DRAM STI active cut patterning
- Patent number 10,910,381
- Issue date Feb 2, 2021
- Applied Materials, Inc.
- Tejinder Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching hardmasks containing high hardness materials
- Patent number 10,867,795
- Issue date Dec 15, 2020
- Applied Materials, Inc.
- Nancy Fung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon addition for silicon nitride etching selectivity
- Patent number 10,283,370
- Issue date May 7, 2019
- Applied Materials, Inc.
- Onintza Ros Bengoechea
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Silicon oxide recess etch
- Patent number 8,748,322
- Issue date Jun 10, 2014
- Applied Materials, Inc.
- Nancy Fung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for removing polymer from the wafer backside a...
- Patent number 8,329,593
- Issue date Dec 11, 2012
- Applied Materials, Inc.
- Imad Yousif
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for front side protection during backside clea...
- Patent number 7,879,183
- Issue date Feb 1, 2011
- Applied Materials, Inc.
- Imad Yousif
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Heated gas box for PECVD applications
- Patent number 7,628,863
- Issue date Dec 8, 2009
- Applied Materials, Inc.
- Soovo Sen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
EUV SENSITIVE METAL OXIDE MATERIAL AS UNDERLAYER FOR THIN CAR TO IM...
- Publication number 20240319603
- Publication date Sep 26, 2024
- Applied Materials, Inc.
- ZHENXING HAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELECTIVE DEPOSITION OF CARBON ON PHOTORESIST LAYER FOR LITHOGRAPHY...
- Publication number 20230377890
- Publication date Nov 23, 2023
- Applied Materials, Inc.
- Larry GAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR ETCHING STRUCTURES WITH OXYGEN PULSING
- Publication number 20230072732
- Publication date Mar 9, 2023
- Applied Materials, Inc.
- Nancy FUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF METAL OXIDE INFILTRATION INTO PHOTORESIST
- Publication number 20230002878
- Publication date Jan 5, 2023
- Applied Materials, Inc.
- Nancy FUNG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PATTERNING SCHEME TO IMPROVE EUV RESIST AND HARD MASK SELECTIVITY
- Publication number 20220367186
- Publication date Nov 17, 2022
- Applied Materials, Inc.
- Nancy Fung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multicolor Approach To DRAM STI Active Cut Patterning
- Publication number 20220238531
- Publication date Jul 28, 2022
- Applied Materials, Inc.
- Tejinder Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE ANISOTROPIC METAL ETCH
- Publication number 20220068661
- Publication date Mar 3, 2022
- Applied Materials, Inc.
- Jonathan SHAW
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR ETCHING STRUCTURES AND SMOOTHING SIDEWALLS
- Publication number 20220059365
- Publication date Feb 24, 2022
- Applied Materials, Inc.
- Nancy FUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR ETCHING STRUCTURES WITH OXYGEN PULSING
- Publication number 20220059366
- Publication date Feb 24, 2022
- Applied Materials, Inc.
- Nancy FUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE DEPOSITION OF CARBON ON PHOTORESIST LAYER FOR LITHOGRAPHY...
- Publication number 20220005688
- Publication date Jan 6, 2022
- Applied Materials, Inc.
- NANCY FUNG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE DEPOSITION OF CARBON ON PHOTORESIST LAYER FOR LITHOGRAPHY...
- Publication number 20210358751
- Publication date Nov 18, 2021
- Applied Materials, Inc.
- Larry GAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multicolor Approach To DRAM STI Active Cut Patterning
- Publication number 20210134807
- Publication date May 6, 2021
- Applied Materials, Inc.
- Tejinder Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multicolor Approach To DRAM STI Active Cut Patterning
- Publication number 20200043932
- Publication date Feb 6, 2020
- Applied Materials, Inc.
- Tejinder Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Patterning Scheme To Improve EUV Resist And Hard Mask Selectivity
- Publication number 20200013620
- Publication date Jan 9, 2020
- Applied Materials, Inc.
- Nancy Fung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Diamond-Like Carbon As Mandrel
- Publication number 20180358229
- Publication date Dec 13, 2018
- Applied Materials, Inc.
- Takehito Koshizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF ETCHING HARDMASKS CONTAINING HIGH HARDNESS MATERIALS
- Publication number 20180337047
- Publication date Nov 22, 2018
- Applied Materials, Inc.
- Nancy FUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIRECTED BLOCK COPOLYMER SELF-ASSEMBLY PATTERNS FOR ADVANCED PHOTOL...
- Publication number 20140357083
- Publication date Dec 4, 2014
- Applied Materials, Inc.
- Mang-Mang LING
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
IN-SITU PROCESS CHAMBER CLEAN TO REMOVE TITANIUM NITRIDE ETCH BY-PR...
- Publication number 20110162674
- Publication date Jul 7, 2011
- Applied Materials, Inc.
- HAIRONG TANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR FRONT SIDE PROTECTION DURING BACKSIDE CLEA...
- Publication number 20110120505
- Publication date May 26, 2011
- Applied Materials, Inc.
- IMAD YOUSIF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA-BASED ORGANIC MASK REMOVAL WITH SILICON FLUORIDE
- Publication number 20110079918
- Publication date Apr 7, 2011
- Applied Materials, Inc.
- Yifeng ZHOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR REMOVING POLYMER FROM A SUBSTRATE
- Publication number 20090302002
- Publication date Dec 10, 2009
- Applied Materials, Inc.
- Kenneth Collins
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF SUBSTRATE POLYMER REMOVAL
- Publication number 20090293907
- Publication date Dec 3, 2009
- Nancy Fung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR FRONT SIDE PROTECTION DURING BACKSIDE CLEA...
- Publication number 20090214798
- Publication date Aug 27, 2009
- IMAD YOUSIF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HARDMASK OPEN PROCESS WITH ENHANCED CD SPACE SHRINK AND REDUCTION
- Publication number 20090191711
- Publication date Jul 30, 2009
- Ying Rui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for removing polymer from the wafer backside a...
- Publication number 20090156013
- Publication date Jun 18, 2009
- Imad Yousif
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Heated gas box for PECVD applications
- Publication number 20070107660
- Publication date May 17, 2007
- APPLIED MATERIALS, INC.
- Soovo Sen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Heated gas box for PECVD applications
- Publication number 20060027165
- Publication date Feb 9, 2006
- APPLIED MATERIALS, INC.
- Soovo Sen
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Selective deposition of carbon on photoresist layer for lithography...

Selective anisotropic metal etch

Methods for etching structures and smoothing sidewalls

Multicolor approach to DRAM STI active cut patterning

Methods for etching structures with oxygen pulsing

Patterning scheme to improve EUV resist and hard mask selectivity

Multicolor approach to DRAM STI active cut patterning

Diamond-like carbon as mandrel

Multicolor approach to DRAM STI active cut patterning

Method of etching hardmasks containing high hardness materials

Silicon addition for silicon nitride etching selectivity

Silicon oxide recess etch

Method and apparatus for removing polymer from the wafer backside a...

Apparatus and method for front side protection during backside clea...

Heated gas box for PECVD applications

Patents Applicationslast 30 patents

EUV SENSITIVE METAL OXIDE MATERIAL AS UNDERLAYER FOR THIN CAR TO IM...

SELECTIVE DEPOSITION OF CARBON ON PHOTORESIST LAYER FOR LITHOGRAPHY...

METHODS FOR ETCHING STRUCTURES WITH OXYGEN PULSING

METHOD OF METAL OXIDE INFILTRATION INTO PHOTORESIST

PATTERNING SCHEME TO IMPROVE EUV RESIST AND HARD MASK SELECTIVITY

Multicolor Approach To DRAM STI Active Cut Patterning

SELECTIVE ANISOTROPIC METAL ETCH

METHODS FOR ETCHING STRUCTURES AND SMOOTHING SIDEWALLS

METHODS FOR ETCHING STRUCTURES WITH OXYGEN PULSING

SELECTIVE DEPOSITION OF CARBON ON PHOTORESIST LAYER FOR LITHOGRAPHY...

SELECTIVE DEPOSITION OF CARBON ON PHOTORESIST LAYER FOR LITHOGRAPHY...

Multicolor Approach To DRAM STI Active Cut Patterning

Multicolor Approach To DRAM STI Active Cut Patterning

Patterning Scheme To Improve EUV Resist And Hard Mask Selectivity

Diamond-Like Carbon As Mandrel

METHODS OF ETCHING HARDMASKS CONTAINING HIGH HARDNESS MATERIALS

DIRECTED BLOCK COPOLYMER SELF-ASSEMBLY PATTERNS FOR ADVANCED PHOTOL...

IN-SITU PROCESS CHAMBER CLEAN TO REMOVE TITANIUM NITRIDE ETCH BY-PR...

APPARATUS AND METHOD FOR FRONT SIDE PROTECTION DURING BACKSIDE CLEA...

PLASMA-BASED ORGANIC MASK REMOVAL WITH SILICON FLUORIDE

METHOD AND APPARATUS FOR REMOVING POLYMER FROM A SUBSTRATE

METHOD OF SUBSTRATE POLYMER REMOVAL

APPARATUS AND METHOD FOR FRONT SIDE PROTECTION DURING BACKSIDE CLEA...

HARDMASK OPEN PROCESS WITH ENHANCED CD SPACE SHRINK AND REDUCTION

Method and apparatus for removing polymer from the wafer backside a...

Heated gas box for PECVD applications

Heated gas box for PECVD applications