Naohiro TANGO

Person

Haibara-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
- Patent number 11,584,810
- Issue date Feb 21, 2023
- FUJIFILM Corporation
- Akira Takada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 11,579,528
- Issue date Feb 14, 2023
- FUJIFILM Corporation
- Ryo Nishio
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming upper layer film, pattern forming method, r...
- Patent number 11,281,103
- Issue date Mar 22, 2022
- FUJIFILM Corporation
- Naoya Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern forming method, method for manufacturing electronic device,...
- Patent number 11,249,395
- Issue date Feb 15, 2022
- FUJIFILM Corporation
- Naoki Inoue
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern forming method, resist pattern, method for manufacturing el...
- Patent number 10,852,637
- Issue date Dec 1, 2020
- FUJIFILM Corporation
- Naoki Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, resist pattern, and process for producing e...
- Patent number 10,578,968
- Issue date Mar 3, 2020
- FUJIFILM Corporation
- Kei Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method, composition for forming protective film, me...
- Patent number 10,175,578
- Issue date Jan 8, 2019
- Fujifilm Corporation
- Naoki Inoue
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern forming method, resist pattern, and method for manufacturin...
- Patent number 10,114,292
- Issue date Oct 30, 2018
- FUJIFILM Corporation
- Naoki Inoue
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern formation method, etching method, electronic device manufac...
- Patent number 9,810,981
- Issue date Nov 7, 2017
- FUJIFILM Corporation
- Ryosuke Ueba
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray- or radiation-sensitive resin composition, actinic ray-...
- Patent number 9,454,079
- Issue date Sep 27, 2016
- FUJIFILM Corporation
- Akinori Shibuya
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, and...
- Patent number 8,846,293
- Issue date Sep 30, 2014
- FUJIFILM Corporation
- Yusuke Iizuka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition and...
- Patent number 8,846,290
- Issue date Sep 30, 2014
- FUJIFILM Corporation
- Naohiro Tango
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Actinic-ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 8,841,060
- Issue date Sep 23, 2014
- FUJIFILM Corporation
- Shohei Kataoka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR TESTING PHOTOSENSITIVE COMPOSITION AND METHOD FOR PRODUC...
- Publication number 20240280915
- Publication date Aug 22, 2024
- FUJIFILM CORPORATION
- Kei YAMAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR TESTING PHOTOSENSITIVE COMPOSITION AND METHOD FOR PRODUC...
- Publication number 20240280362
- Publication date Aug 22, 2024
- FUJIFILM CORPORATION
- Naohiro TANGO
- G01 - MEASURING TESTING
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND...
- Publication number 20240248397
- Publication date Jul 25, 2024
- FUJIFILM CORPORATION
- Naohiro TANGO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR TESTING PHOTOSENSITIVE COMPOSITION AND METHOD FOR PRODUC...
- Publication number 20240231235
- Publication date Jul 11, 2024
- FUJIFILM CORPORATION
- Kei YAMAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR INSPECTING RESIST COMPOSITION, METHOD FOR PRODUCING RESI...
- Publication number 20240201599
- Publication date Jun 20, 2024
- FUJIFILM CORPORATION
- Michihiro Shirakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING COMPOSITION FOR FORMING NON-PHOTOSENSITIVE UPP...
- Publication number 20230221644
- Publication date Jul 13, 2023
- FUJIFILM CORPORATION
- Naohiro TANGO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING RESIST COMPOSITION AND PATTERN FORMING METHOD
- Publication number 20230045851
- Publication date Feb 16, 2023
- FUJIFILM CORPORATION
- Naohiro TANGO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE R...
- Publication number 20220107561
- Publication date Apr 7, 2022
- FUJIFILM CORPORATION
- Keiyu OU
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESI...
- Publication number 20210286263
- Publication date Sep 16, 2021
- FUJIFILM CORPORATION
- Naohiro TANGO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20210271162
- Publication date Sep 2, 2021
- FUJIFILM CORPORATION
- Keiyu OU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING MET...
- Publication number 20200183279
- Publication date Jun 11, 2020
- FUJI FILM Corporation
- Kazuhiro MARUMO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METH...
- Publication number 20200183274
- Publication date Jun 11, 2020
- FUJIFILM CORPORATION
- Naohiro TANGO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20200159117
- Publication date May 21, 2020
- FUJIFILM CORPORATION
- Ryo NISHIO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20190204736
- Publication date Jul 4, 2019
- FUJIFILM CORPORATION
- Kazuhiro MARUMO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20190171104
- Publication date Jun 6, 2019
- FUJIFILM CORPORATION
- Akira Takada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE,...
- Publication number 20180275518
- Publication date Sep 27, 2018
- FUJIFILM CORPORATION
- Naoki INOUE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, RESIST PATTERN, METHOD FOR MANUFACTURING EL...
- Publication number 20180081277
- Publication date Mar 22, 2018
- FUJIFILM CORPORATION
- Naoki INOUE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, RESIST PATTERN, METHOD FOR MANUFACTURING EL...
- Publication number 20180011406
- Publication date Jan 11, 2018
- FUJIFILM CORPORATION
- Naoya HATAKEYAMA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR FORMING UPPER LAYER FILM, PATTERN FORMING METHOD, R...
- Publication number 20170371244
- Publication date Dec 28, 2017
- FUJIFILM CORPORATION
- Naoya HATAKEYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING METHOD, RESIST PATTERN, METHOD FOR MANUFACTURING EL...
- Publication number 20170349686
- Publication date Dec 7, 2017
- FUJIFILM CORPORATION
- Naoki INOUE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR FORMING UPPER LAYER FILM, PATTERN FORMING METHOD US...
- Publication number 20170351179
- Publication date Dec 7, 2017
- FUJIFILM CORPORATION
- Akiyoshi GOTO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PATTERN FORMING METHOD, RESIST PATTERN, AND METHOD FOR MANUFACTURIN...
- Publication number 20170199460
- Publication date Jul 13, 2017
- FUJIFILM CORPORATION
- Naohiro TANGO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD, RESIST PATTERN, AND PROCESS FOR PRODUCING E...
- Publication number 20170199461
- Publication date Jul 13, 2017
- FUJIFILM CORPORATION
- Kei YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD, RESIST PATTERN, AND METHOD FOR MANUFACTURIN...
- Publication number 20170184974
- Publication date Jun 29, 2017
- FUJIFILM CORPORATION
- Naoki INOUE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING METHOD, COMPOSITION FOR FORMING UPPER LAYER FILM, R...
- Publication number 20170184970
- Publication date Jun 29, 2017
- FUJIFILM CORPORATION
- Akiyoshi GOTO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PATTERN FORMING METHOD, COMPOSITION FOR FORMING PROTECTIVE FILM, ME...
- Publication number 20170176862
- Publication date Jun 22, 2017
- FUJIFILM CORPORATION
- Naoki INOUE
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PATTERN FORMATION METHOD, ETCHING METHOD, ELECTRONIC DEVICE MANUFAC...
- Publication number 20160342083
- Publication date Nov 24, 2016
- FUJIFILM CORPORATION
- Ryosuke UEBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
- Publication number 20160026083
- Publication date Jan 28, 2016
- FUJIFILM CORPORATION
- Naohiro TANGO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-...
- Publication number 20140248562
- Publication date Sep 4, 2014
- FUJIFILM CORPORATION
- Akinori SHIBUYA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-...
- Publication number 20140234759
- Publication date Aug 21, 2014
- FUJIFILM CORPORATION
- Shohei KATAOKA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Naohiro TANGO

Person

Patents Grantslast 30 patents

Actinic ray-sensitive or radiation-sensitive resin composition, act...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Composition for forming upper layer film, pattern forming method, r...

Pattern forming method, method for manufacturing electronic device,...

Pattern forming method, resist pattern, method for manufacturing el...

Pattern forming method, resist pattern, and process for producing e...

Pattern forming method, composition for forming protective film, me...

Pattern forming method, resist pattern, and method for manufacturin...

Pattern formation method, etching method, electronic device manufac...

Actinic ray- or radiation-sensitive resin composition, actinic ray-...

Actinic ray-sensitive or radiation-sensitive resin composition, and...

Actinic ray-sensitive or radiation-sensitive resin composition and...

Actinic-ray-sensitive or radiation-sensitive resin composition, res...

Patents Applicationslast 30 patents

METHOD FOR TESTING PHOTOSENSITIVE COMPOSITION AND METHOD FOR PRODUC...

METHOD FOR TESTING PHOTOSENSITIVE COMPOSITION AND METHOD FOR PRODUC...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND...

METHOD FOR TESTING PHOTOSENSITIVE COMPOSITION AND METHOD FOR PRODUC...

METHOD FOR INSPECTING RESIST COMPOSITION, METHOD FOR PRODUCING RESI...

METHOD FOR PRODUCING COMPOSITION FOR FORMING NON-PHOTOSENSITIVE UPP...

METHOD FOR PRODUCING RESIST COMPOSITION AND PATTERN FORMING METHOD

METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE R...

ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESI...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

PHOTOSENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING MET...

PHOTOSENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METH...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE,...

PATTERN FORMING METHOD, RESIST PATTERN, METHOD FOR MANUFACTURING EL...

PATTERN FORMING METHOD, RESIST PATTERN, METHOD FOR MANUFACTURING EL...

COMPOSITION FOR FORMING UPPER LAYER FILM, PATTERN FORMING METHOD, R...

PATTERN FORMING METHOD, RESIST PATTERN, METHOD FOR MANUFACTURING EL...

COMPOSITION FOR FORMING UPPER LAYER FILM, PATTERN FORMING METHOD US...

PATTERN FORMING METHOD, RESIST PATTERN, AND METHOD FOR MANUFACTURIN...

PATTERN FORMING METHOD, RESIST PATTERN, AND PROCESS FOR PRODUCING E...

PATTERN FORMING METHOD, RESIST PATTERN, AND METHOD FOR MANUFACTURIN...

PATTERN FORMING METHOD, COMPOSITION FOR FORMING UPPER LAYER FILM, R...

PATTERN FORMING METHOD, COMPOSITION FOR FORMING PROTECTIVE FILM, ME...

PATTERN FORMATION METHOD, ETCHING METHOD, ELECTRONIC DEVICE MANUFAC...

PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

ACTINIC RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-...

ACTINIC RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-...