Naoki Tamaoki

Person

Minato-ku, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Topography simulation apparatus, topography simulation method, and...
- Patent number 10,460,050
- Issue date Oct 29, 2019
- TOSHIBA MEMORY CORPORATION
- Naoki Tamaoki
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Topography simulation apparatus, topography simulation method and r...
- Patent number 9,996,639
- Issue date Jun 12, 2018
- TOSHIBA MEMORY CORPORATION
- Naoki Tamaoki
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Substrate plasma processing apparatus and plasma processing method
- Patent number 8,821,684
- Issue date Sep 2, 2014
- Kabushiki Kaisha Toshiba
- Akio Ui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Simulating a chemical reaction phenomenon in a semiconductor process
- Patent number 8,548,787
- Issue date Oct 1, 2013
- Kabushiki Kaisha Toshiba
- Naoki Tamaoki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus of substrate and plasma processing meth...
- Patent number 8,252,193
- Issue date Aug 28, 2012
- Kabushiki Kaisha Toshiba
- Akio Ui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Simulation method and simulation program
- Patent number 8,209,155
- Issue date Jun 26, 2012
- Kabushiki Kaisha Toshiba
- Takashi Ichikawa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of cleaning a film-forming apparatus
- Patent number 7,942,974
- Issue date May 17, 2011
- Kabushiki Kaisha Toshiba
- Naoki Tamaoki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for producing silicon nitride films and silicon oxynitride...
- Patent number 7,192,626
- Issue date Mar 20, 2007
- L'Air Liquide, Societe Anonyme a Directoire et Conseil de Surveillance pour l...
- Christian Dussarrat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ammonium halide eliminator, chemical vapor deposition system and ch...
- Patent number 6,365,231
- Issue date Apr 2, 2002
- Kabushiki Kaisha Toshiba
- Yuusuke Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming a film in recess by vapor phase growth
- Patent number 6,022,806
- Issue date Feb 8, 2000
- Kabushiki Kaisha Toshiba
- Yuusuke Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Simulation method with respect to trace object that event occurs in...
- Patent number 5,926,402
- Issue date Jul 20, 1999
- Kabushiki Kaisha Toshiba
- Shinichi Tatsuta
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
TOPOGRAPHY SIMULATION APPARATUS, TOPOGRAPHY SIMULATION METHOD, AND...
- Publication number 20170262556
- Publication date Sep 14, 2017
- Kabushiki Kaisha Toshiba
- Naoki TAMAOKI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MANUFACTURING METHOD OF MAGNETORESISTIVE EFFECT ELEMENT AND MANUFAC...
- Publication number 20160380189
- Publication date Dec 29, 2016
- KABUSHIKI KAISHA TOSHIBA
- Yuichi OHSAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TOPOGRAPHY SIMULATION APPARATUS, TOPOGRAPHY SIMULATION METHOD AND R...
- Publication number 20160070823
- Publication date Mar 10, 2016
- Kabushiki Kaisha Toshiba
- Naoki TAMAOKI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
TOPOGRAPHY SIMULATION APPARATUS, TOPOGRAPHY SIMULATION METHOD AND R...
- Publication number 20150205890
- Publication date Jul 23, 2015
- Kabushiki Kaisha Toshiba
- Naoki TAMAOKI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MANUFACTURING METHOD OF MAGNETORESISTIVE EFFECT ELEMENT AND MANUFAC...
- Publication number 20140087483
- Publication date Mar 27, 2014
- Kabushiki Kaisha Toshiba
- Yuichi OHSAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CLEANING A FILM-FORMING APPARATUS
- Publication number 20130220377
- Publication date Aug 29, 2013
- L'AIR LIQUIDE SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEO...
- Yuusuke SATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20090194508
- Publication date Aug 6, 2009
- Akio UI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SIMULATION METHOD AND SIMULATION PROGRAM
- Publication number 20090055143
- Publication date Feb 26, 2009
- Takashi Ichikawa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SIMULATION METHOD AND SIMULATION PROGRAM
- Publication number 20090048813
- Publication date Feb 19, 2009
- Takashi Ichikawa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PLASMA PROCESSING APPARATUS OF SUBSTRATE AND PLASMA PROCESSING METH...
- Publication number 20080237185
- Publication date Oct 2, 2008
- Akio UI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR PRODUCING SILICON NITRIDE FILMS AND SILICON OXYNITRIDE...
- Publication number 20070134433
- Publication date Jun 14, 2007
- Christian DUSSARRAT
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SIMULATION APPARATUS, SIMULATION METHOD, AND COMPUTER PROGRAM PRODUCT
- Publication number 20070118341
- Publication date May 24, 2007
- KABUSHIKI KAISHA TOSHIBA
- Naoki Tamaoki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for annealing and method for manufacturing a semiconductor d...
- Publication number 20060216875
- Publication date Sep 28, 2006
- Takayuki Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for producing silicon nitride films by vapor-phase growth
- Publication number 20060198958
- Publication date Sep 7, 2006
- Christian Dussarrat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of cleaning a film-forming apparatus and film-forming apparatus
- Publication number 20060065289
- Publication date Mar 30, 2006
- Naoki Tamaoki
- B08 - CLEANING
Information Patent Application
Methods for producing silicon nitride films and silicon oxynitride...
- Publication number 20050100670
- Publication date May 12, 2005
- Christian Dussarrat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of cleaning a film-forming apparatus and film-forming apparatus
- Publication number 20050082002
- Publication date Apr 21, 2005
- Yuusuke Sato
- B08 - CLEANING
Information Patent Application
AMMONIUM HALIDE ELIMINATOR, CHEMICAL VAPOR DEPOSITION SYSTEM AND CH...
- Publication number 20010048973
- Publication date Dec 6, 2001
- YUUSUKE SATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Naoki Tamaoki

Person

Patents Grantslast 30 patents

Topography simulation apparatus, topography simulation method, and...

Topography simulation apparatus, topography simulation method and r...

Substrate plasma processing apparatus and plasma processing method

Simulating a chemical reaction phenomenon in a semiconductor process

Plasma processing apparatus of substrate and plasma processing meth...

Simulation method and simulation program

Method of cleaning a film-forming apparatus

Methods for producing silicon nitride films and silicon oxynitride...

Ammonium halide eliminator, chemical vapor deposition system and ch...

Method of forming a film in recess by vapor phase growth

Simulation method with respect to trace object that event occurs in...

Patents Applicationslast 30 patents

TOPOGRAPHY SIMULATION APPARATUS, TOPOGRAPHY SIMULATION METHOD, AND...

MANUFACTURING METHOD OF MAGNETORESISTIVE EFFECT ELEMENT AND MANUFAC...

TOPOGRAPHY SIMULATION APPARATUS, TOPOGRAPHY SIMULATION METHOD AND R...

TOPOGRAPHY SIMULATION APPARATUS, TOPOGRAPHY SIMULATION METHOD AND R...

MANUFACTURING METHOD OF MAGNETORESISTIVE EFFECT ELEMENT AND MANUFAC...

METHOD OF CLEANING A FILM-FORMING APPARATUS

SUBSTRATE PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SIMULATION METHOD AND SIMULATION PROGRAM

SIMULATION METHOD AND SIMULATION PROGRAM

PLASMA PROCESSING APPARATUS OF SUBSTRATE AND PLASMA PROCESSING METH...

METHODS FOR PRODUCING SILICON NITRIDE FILMS AND SILICON OXYNITRIDE...

SIMULATION APPARATUS, SIMULATION METHOD, AND COMPUTER PROGRAM PRODUCT

Method for annealing and method for manufacturing a semiconductor d...

Methods for producing silicon nitride films by vapor-phase growth

Method of cleaning a film-forming apparatus and film-forming apparatus

Methods for producing silicon nitride films and silicon oxynitride...

Method of cleaning a film-forming apparatus and film-forming apparatus

AMMONIUM HALIDE ELIMINATOR, CHEMICAL VAPOR DEPOSITION SYSTEM AND CH...