Naoko Asai

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Kokubunji, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist pattern forming method using anti-reflective layer, resist p...
- Patent number 6,555,295
- Issue date Apr 29, 2003
- Hitachi, Ltd.
- Toshihiko Tanaka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Manufacturing method of semiconductor integrated circuit devices an...
- Patent number 6,548,312
- Issue date Apr 15, 2003
- Hitachi, Ltd.
- Katsuya Hayano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern forming method using anti-reflective layer, with var...
- Patent number 6,461,776
- Issue date Oct 8, 2002
- Hitachi, Ltd.
- Toshihiko Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern forming method using anti-reflective layer, resist p...
- Patent number 6,355,400
- Issue date Mar 12, 2002
- Hitachi, Ltd.
- Toshihiko Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern forming method using anti-reflective layer, resist p...
- Patent number 6,255,036
- Issue date Jul 3, 2001
- Hitachi, Ltd.
- Toshihiko Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing semiconductor devices utilizing plurality...
- Patent number 6,225,011
- Issue date May 1, 2001
- Hitachi, Ltd.
- Yasuko Gotoh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern forming method using anti-reflective layer and metho...
- Patent number 6,162,588
- Issue date Dec 19, 2000
- Hitachi, Ltd.
- Toshihiko Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern forming method using anti-reflective layer resist
- Patent number 5,985,517
- Issue date Nov 16, 1999
- Hitachi, Ltd.
- Toshihiko Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern forming method using anti-reflective layer with vari...
- Patent number 5,935,765
- Issue date Aug 10, 1999
- Hitachi, Ltd.
- Toshihiko Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern forming method using anti-reflective layer with vari...
- Patent number 5,846,693
- Issue date Dec 8, 1998
- Hitachi, Ltd.
- Toshihiko Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern forming method using anti-reflective layer, resist p...
- Patent number 5,733,712
- Issue date Mar 31, 1998
- Hitachi, Ltd.
- Toshihiko Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Resist pattern forming method using anti-reflective layer, resist p...
- Publication number 20020136970
- Publication date Sep 26, 2002
- Toshihiko Tanaka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Person

Patents Grantslast 30 patents

Resist pattern forming method using anti-reflective layer, resist p...

Manufacturing method of semiconductor integrated circuit devices an...

Resist pattern forming method using anti-reflective layer, with var...

Resist pattern forming method using anti-reflective layer, resist p...

Resist pattern forming method using anti-reflective layer, resist p...

Method for manufacturing semiconductor devices utilizing plurality...

Resist pattern forming method using anti-reflective layer and metho...

Resist pattern forming method using anti-reflective layer resist

Resist pattern forming method using anti-reflective layer with vari...

Resist pattern forming method using anti-reflective layer with vari...

Resist pattern forming method using anti-reflective layer, resist p...

Patents Applicationslast 30 patents

Resist pattern forming method using anti-reflective layer, resist p...