Naomasa Shiraishi

Person

Saitama-ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Illumination optical apparatus and projection exposure apparatus
- Patent number 9,760,014
- Issue date Sep 12, 2017
- Nikon Corporation
- Naomasa Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical apparatus and projection exposure apparatus
- Patent number 9,423,698
- Issue date Aug 23, 2016
- Nikon Corporation
- Naomasa Shiraishi
- G02 - OPTICS
Information Patent Grant
Illumination optical apparatus and projection exposure apparatus
- Patent number 9,423,697
- Issue date Aug 23, 2016
- Nikon Corporation
- Naomasa Shiraishi
- G02 - OPTICS
Information Patent Grant
Illumination optical apparatus and projection exposure apparatus
- Patent number 9,244,359
- Issue date Jan 26, 2016
- Nikon Corporation
- Naomasa Shiraishi
- G02 - OPTICS
Information Patent Grant
Illumination optical apparatus and projection exposure apparatus
- Patent number 9,207,542
- Issue date Dec 8, 2015
- Nikon Corporation
- Naomasa Shiraishi
- G02 - OPTICS
Information Patent Grant
Illumination optical apparatus and projection exposure apparatus
- Patent number 9,146,476
- Issue date Sep 29, 2015
- Nikon Corporation
- Naomasa Shiraishi
- G02 - OPTICS
Information Patent Grant
Illumination optical apparatus and projection exposure apparatus
- Patent number 9,140,992
- Issue date Sep 22, 2015
- Nikon Corporation
- Naomasa Shiraishi
- G02 - OPTICS
Information Patent Grant
Illumination optical apparatus and projection exposure apparatus
- Patent number 9,140,993
- Issue date Sep 22, 2015
- Nikon Corporation
- Naomasa Shiraishi
- G02 - OPTICS
Information Patent Grant
Exposure method and electronic device manufacturing method
- Patent number 8,440,375
- Issue date May 14, 2013
- Nikon Corporation
- Tohru Kiuchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method, method for manufacturing flat panel display substr...
- Patent number 8,431,328
- Issue date Apr 30, 2013
- Nikon Corporation
- Naomasa Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical apparatus, projection exposure apparatus, proj...
- Patent number 7,884,921
- Issue date Feb 8, 2011
- Nikon Corporation
- Michio Noboru
- G02 - OPTICS
Information Patent Grant
Projection exposure apparatus with luminous flux distribution
- Patent number 7,656,504
- Issue date Feb 2, 2010
- Nikon Corporation
- Naomasa Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Display device manufacturing method and display device
- Patent number 7,432,993
- Issue date Oct 7, 2008
- Nikon Corporation
- Masaomi Kameyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Projection exposure apparatus and method, catadioptric optical syst...
- Patent number 7,319,508
- Issue date Jan 15, 2008
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Grant
Projection exposure apparatus and method, catadioptric optical syst...
- Patent number 7,301,605
- Issue date Nov 27, 2007
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Grant
Method of detecting position of mark on substrate, position detecti...
- Patent number 7,109,508
- Issue date Sep 19, 2006
- Nikon Corporation
- Naomasa Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of detecting position of mark on substrate, position detecti...
- Patent number 7,053,390
- Issue date May 30, 2006
- Nikon Corporation
- Naomasa Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical unit, exposure apparatus, and device manufacturing method
- Patent number 7,050,148
- Issue date May 23, 2006
- Nikon Corporation
- Naomasa Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and exposure method
- Patent number 7,050,149
- Issue date May 23, 2006
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus and method
- Patent number 6,967,710
- Issue date Nov 22, 2005
- Nikon Corporation
- Naomasa Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus and method
- Patent number 6,897,942
- Issue date May 24, 2005
- Nikon Corporation
- Naomasa Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus and method
- Patent number 6,885,433
- Issue date Apr 26, 2005
- Nikon Corporation
- Naomasa Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus
- Patent number 6,864,959
- Issue date Mar 8, 2005
- Nikon Corporation
- Naomasa Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method, exposure apparatus and its making method, device m...
- Patent number 6,850,313
- Issue date Feb 1, 2005
- Nikon Corporation
- Jun Ishikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system and exposure apparatus provided with the optical system
- Patent number 6,844,915
- Issue date Jan 18, 2005
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and exposure method, and device manufacturing me...
- Patent number 6,842,221
- Issue date Jan 11, 2005
- Nikon Corporation
- Naomasa Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection optical system and an exposure apparatus with the projec...
- Patent number 6,831,731
- Issue date Dec 14, 2004
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Grant
Exposure apparatus, exposure method and device production method
- Patent number 6,798,495
- Issue date Sep 28, 2004
- Nikon Corporation
- Hiroyuki Nagasaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system and exposure apparatus having the optical system
- Patent number 6,775,063
- Issue date Aug 10, 2004
- Nikon Corporation
- Naomasa Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method and apparatus, and method of fabricating a device
- Patent number 6,731,371
- Issue date May 4, 2004
- Naomasa Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
ILLUMINATION OPTICAL APPARATUS AND PROJECTION EXPOSURE APPARATUS
- Publication number 20170227698
- Publication date Aug 10, 2017
- Nikon Corporation
- Naomasa Shiraishi
- G02 - OPTICS
Information Patent Application
ILLUMINATION OPTICAL APPARATUS AND PROJECTION EXPOSURE APPARATUS
- Publication number 20150248065
- Publication date Sep 3, 2015
- Nikon Corporation
- Naomasa Shiraishi
- G02 - OPTICS
Information Patent Application
ILLUMINATION OPTICAL APPARATUS AND PROJECTION EXPOSURE APPARATUS
- Publication number 20150248066
- Publication date Sep 3, 2015
- Nikon Corporation
- Naomasa Shiraishi
- G02 - OPTICS
Information Patent Application
ILLUMINATION OPTICAL APPARATUS AND PROJECTION EXPOSURE APPARATUS
- Publication number 20130250268
- Publication date Sep 26, 2013
- Nikon Corporation
- Naomasa Shiraishi
- G02 - OPTICS
Information Patent Application
ILLUMINATION OPTICAL APPARATUS AND PROJECTION EXPOSURE APPARATUS
- Publication number 20130242280
- Publication date Sep 19, 2013
- Nikon Corporation
- Naomasa Shiraishi
- G02 - OPTICS
Information Patent Application
METHOD AND APPARATUS FOR MEASURING WAVEFRONT, AND EXPOSURE METHOD A...
- Publication number 20100302523
- Publication date Dec 2, 2010
- Nikon Corporation
- Naomasa Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Illumination optical apparatus and projection exposure apparatus
- Publication number 20090284729
- Publication date Nov 19, 2009
- Nikon Corporation
- Naomasa Shiraishi
- G02 - OPTICS
Information Patent Application
Illumination optical apparatus and projection exposure apparatus
- Publication number 20090122292
- Publication date May 14, 2009
- Nikon Corporation
- Naomasa Shiraishi
- G02 - OPTICS
Information Patent Application
EXPOSURE METHOD AND APPARATUS, AND ELECTRONIC DEVICE MANUFACTURING...
- Publication number 20090068597
- Publication date Mar 12, 2009
- Naomasa Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure apparatus, exposure method, and electronic device manufact...
- Publication number 20090042115
- Publication date Feb 12, 2009
- Nikon Corporation
- Hideya Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure method and electronic device manufacturing method
- Publication number 20090042139
- Publication date Feb 12, 2009
- Nikon Corporation
- Naomasa Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure Method and Apparatus, and Electronic Device Manufacturing...
- Publication number 20090011368
- Publication date Jan 8, 2009
- Yutaka Ichihara
- G02 - OPTICS
Information Patent Application
EXPOSURE METHOD, METHOD OF MANUFACTURING PLATE FOR FLAT PANEL DISPL...
- Publication number 20080299499
- Publication date Dec 4, 2008
- Naomasa Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure method and electronic device manufacturing method
- Publication number 20080299492
- Publication date Dec 4, 2008
- Nikon Corporation
- Tohru Kiuchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for processing pattern data and method for manufacturing ele...
- Publication number 20080270970
- Publication date Oct 30, 2008
- Nikon Corporation
- Naomasa Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure method, method for manufacturing flat panel display substr...
- Publication number 20080206685
- Publication date Aug 28, 2008
- NIKON CORPORATION
- Naomasa Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Projection exposure apparatus and method, catadioptric optical syst...
- Publication number 20070268474
- Publication date Nov 22, 2007
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Application
Illumination optical apparatus, projection exposure apparatus, proj...
- Publication number 20070242363
- Publication date Oct 18, 2007
- Nikon Corporation
- Michio Noboru
- G02 - OPTICS
Information Patent Application
Display device manufacturing method and display device
- Publication number 20060256250
- Publication date Nov 16, 2006
- Nikon Corporation
- Masaomi Kameyama
- G02 - OPTICS
Information Patent Application
Illumination optical apparatus and projection exposure apparatus
- Publication number 20060203214
- Publication date Sep 14, 2006
- Nikon Corporation
- Naomasa Shiraishi
- G02 - OPTICS
Information Patent Application
Exposure apparatus and exposure method
- Publication number 20050157278
- Publication date Jul 21, 2005
- Nikon Corporation
- Soichi Owa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Projection optical system and an exposure apparatus with the projec...
- Publication number 20050122499
- Publication date Jun 9, 2005
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Application
Optical unit, exposure apparatus, and device manufacturing method
- Publication number 20050068512
- Publication date Mar 31, 2005
- Nikon Corporation
- Naomasa Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of detecting position of mark on substrate, position detecti...
- Publication number 20050051742
- Publication date Mar 10, 2005
- NIKON CORPORATION
- Naomasa Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure method, exposure apparatus and device manufacturing method
- Publication number 20040248043
- Publication date Dec 9, 2004
- Nikon Corporation
- Naomasa Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Projection exposure apparatus and method
- Publication number 20040233411
- Publication date Nov 25, 2004
- NIKON CORPORATION
- Naomasa Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Projection exposure apparatus and method
- Publication number 20040233410
- Publication date Nov 25, 2004
- NIKON CORPORATION
- Naomasa Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Projection exposure apparatus and method
- Publication number 20040227919
- Publication date Nov 18, 2004
- NIKON CORPORATION
- Naomasa Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Projection exposure method with luminous flux distribution
- Publication number 20040080733
- Publication date Apr 29, 2004
- Nikon Corporation
- Naomasa Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical unit, exposure apparatus, and device manufacturing method
- Publication number 20030202165
- Publication date Oct 30, 2003
- Nikon Corporation
- Naomasa Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Naomasa Shiraishi

Person

Patents Grantslast 30 patents

Illumination optical apparatus and projection exposure apparatus

Illumination optical apparatus and projection exposure apparatus

Illumination optical apparatus and projection exposure apparatus

Illumination optical apparatus and projection exposure apparatus

Illumination optical apparatus and projection exposure apparatus

Illumination optical apparatus and projection exposure apparatus

Illumination optical apparatus and projection exposure apparatus

Illumination optical apparatus and projection exposure apparatus

Exposure method and electronic device manufacturing method

Exposure method, method for manufacturing flat panel display substr...

Illumination optical apparatus, projection exposure apparatus, proj...

Projection exposure apparatus with luminous flux distribution

Display device manufacturing method and display device

Projection exposure apparatus and method, catadioptric optical syst...

Projection exposure apparatus and method, catadioptric optical syst...

Method of detecting position of mark on substrate, position detecti...

Method of detecting position of mark on substrate, position detecti...

Optical unit, exposure apparatus, and device manufacturing method

Exposure apparatus and exposure method

Projection exposure apparatus and method

Projection exposure apparatus and method

Projection exposure apparatus and method

Projection exposure apparatus

Exposure method, exposure apparatus and its making method, device m...

Optical system and exposure apparatus provided with the optical system

Exposure apparatus and exposure method, and device manufacturing me...

Projection optical system and an exposure apparatus with the projec...

Exposure apparatus, exposure method and device production method

Optical system and exposure apparatus having the optical system

Exposure method and apparatus, and method of fabricating a device

Patents Applicationslast 30 patents

ILLUMINATION OPTICAL APPARATUS AND PROJECTION EXPOSURE APPARATUS

ILLUMINATION OPTICAL APPARATUS AND PROJECTION EXPOSURE APPARATUS

ILLUMINATION OPTICAL APPARATUS AND PROJECTION EXPOSURE APPARATUS

ILLUMINATION OPTICAL APPARATUS AND PROJECTION EXPOSURE APPARATUS

ILLUMINATION OPTICAL APPARATUS AND PROJECTION EXPOSURE APPARATUS

METHOD AND APPARATUS FOR MEASURING WAVEFRONT, AND EXPOSURE METHOD A...

Illumination optical apparatus and projection exposure apparatus

Illumination optical apparatus and projection exposure apparatus

EXPOSURE METHOD AND APPARATUS, AND ELECTRONIC DEVICE MANUFACTURING...

Exposure apparatus, exposure method, and electronic device manufact...

Exposure method and electronic device manufacturing method

Exposure Method and Apparatus, and Electronic Device Manufacturing...

EXPOSURE METHOD, METHOD OF MANUFACTURING PLATE FOR FLAT PANEL DISPL...

Exposure method and electronic device manufacturing method

Method for processing pattern data and method for manufacturing ele...

Exposure method, method for manufacturing flat panel display substr...

Projection exposure apparatus and method, catadioptric optical syst...

Illumination optical apparatus, projection exposure apparatus, proj...

Display device manufacturing method and display device

Illumination optical apparatus and projection exposure apparatus

Exposure apparatus and exposure method

Projection optical system and an exposure apparatus with the projec...

Optical unit, exposure apparatus, and device manufacturing method

Method of detecting position of mark on substrate, position detecti...

Exposure method, exposure apparatus and device manufacturing method

Projection exposure apparatus and method

Projection exposure apparatus and method

Projection exposure apparatus and method

Projection exposure method with luminous flux distribution

Optical unit, exposure apparatus, and device manufacturing method