Natsumi YOKOKAWA

Person

Haibara-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
On-machine development type planographic printing plate precursor,...
- Patent number 12,187,025
- Issue date Jan 7, 2025
- FUJIFILM Corporation
- Kazuaki Enomoto
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Planographic printing plate precursor, method of preparing planogra...
- Patent number 11,635,701
- Issue date Apr 25, 2023
- FUJIFILM Corporation
- Natsumi Yokokawa
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Denture base coating composition, coating film-bearing denture base...
- Patent number 10,945,928
- Issue date Mar 16, 2021
- FUJIFILM Corporation
- Yosuke Yamamoto
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
- Patent number 10,526,266
- Issue date Jan 7, 2020
- FUJIFILM Corporation
- Natsumi Yokokawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern formation method, active light-sensitive or radiation-sensi...
- Patent number 10,444,627
- Issue date Oct 15, 2019
- FUJIFILM Corporation
- Hiroo Takizawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Active light sensitive or radiation sensitive resin composition, ac...
- Patent number 10,324,374
- Issue date Jun 18, 2019
- Fujifilm Corporation
- Shuhei Yamaguchi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
- Patent number 10,120,281
- Issue date Nov 6, 2018
- FUJIFILM Corporation
- Koutarou Takahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
- Patent number 10,011,576
- Issue date Jul 3, 2018
- FUJIFILM Corporation
- Shuhei Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
- Patent number 9,904,168
- Issue date Feb 27, 2018
- Fujifilm Corporation
- Natsumi Yokokawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin composition, resist film using same, resist-coated mask blank...
- Patent number 9,798,234
- Issue date Oct 24, 2017
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, actinic ray-sensitive or radiation-sensitiv...
- Patent number 9,766,547
- Issue date Sep 19, 2017
- FUJIFILM Corporation
- Hiroo Takizawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, active light sensitive or radiation sensiti...
- Patent number 9,651,863
- Issue date May 16, 2017
- FUJIFILM Corporation
- Hiroo Takizawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 9,551,933
- Issue date Jan 24, 2017
- FUJIFILM Corporation
- Hiroo Takizawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, actinic ray-sensitive or radiation-sensitive resin compos...
- Patent number 9,527,809
- Issue date Dec 27, 2016
- FUJIFILM Corporation
- Natsumi Yokokawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive composition, resist fi...
- Patent number 9,500,951
- Issue date Nov 22, 2016
- FUJIFILM Corporation
- Natsumi Yokokawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive composition, resist fi...
- Patent number 9,459,531
- Issue date Oct 4, 2016
- FUJIFILM Corporation
- Natsumi Yokokawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern forming method, electron beam-sensitive or extreme ultravio...
- Patent number 9,423,690
- Issue date Aug 23, 2016
- FUJIFILM Corporation
- Hiroo Takizawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern forming method, actinic ray-sensitive or radiation-sensitiv...
- Patent number 9,291,897
- Issue date Mar 22, 2016
- FUJIFILM Corporation
- Shuji Hirano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 9,291,898
- Issue date Mar 22, 2016
- FUJIFILM Corporation
- Natsumi Yokokawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 9,291,896
- Issue date Mar 22, 2016
- FUJIFILM Corporation
- Shuji Hirano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive composition, actinic r...
- Patent number 9,223,215
- Issue date Dec 29, 2015
- FUJIFILM Corporation
- Natsumi Yokokawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive composition, resist fi...
- Patent number 9,188,865
- Issue date Nov 17, 2015
- FUJIFILM Corporation
- Natsumi Yokokawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
ON-MACHINE DEVELOPMENT TYPE PLANOGRAPHIC PRINTING PLATE PRECURSOR,...
- Publication number 20220111629
- Publication date Apr 14, 2022
- FUJIFILM CORPORATION
- Kazuaki Enomoto
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PREPARING LITHOGRA...
- Publication number 20210362529
- Publication date Nov 25, 2021
- FUJIFILM CORPORATION
- Natsumi YOKOKAWA
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
PLANOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PREPARING PLANOGRA...
- Publication number 20210356879
- Publication date Nov 18, 2021
- FUJIFILM CORPORATION
- Natsumi Yokokawa
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
DENTURE BASE COATING COMPOSITION, COATING FILM-BEARING DENTURE BASE...
- Publication number 20190290551
- Publication date Sep 26, 2019
- FUJIFILM CORPORATION
- Yosuke Yamamoto
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
RESIN COMPOSITION, RESIST FILM USING SAME, RESIST-COATED MASK BLANK...
- Publication number 20160327862
- Publication date Nov 10, 2016
- FUJIFILM CORPORATION
- Tomotaka TSUCHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20160320700
- Publication date Nov 3, 2016
- FUJIFILM CORPORATION
- Natsumi YOKOKAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20160282720
- Publication date Sep 29, 2016
- FUJIFILM CORPORATION
- Koutarou TAKAHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20160280621
- Publication date Sep 29, 2016
- FUJIFILM CORPORATION
- Natsumi YOKOKAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20160280675
- Publication date Sep 29, 2016
- FUJIFILM CORPORATION
- Shuhei YAMAGUCHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, AC...
- Publication number 20160209746
- Publication date Jul 21, 2016
- FUJIFILM CORPORATION
- Shuhei YAMAGUCHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERN FORMATION METHOD, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSI...
- Publication number 20160147154
- Publication date May 26, 2016
- FUJIFILM CORPORATION
- Hiroo TAKIZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITI...
- Publication number 20160041465
- Publication date Feb 11, 2016
- FUJIFILM CORPORATION
- Hiroo TAKIZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOS...
- Publication number 20160024005
- Publication date Jan 28, 2016
- FUJIFILM CORPORATION
- NATSUMI YOKOKAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...
- Publication number 20160011517
- Publication date Jan 14, 2016
- FUJIFILM CORPORATION
- HIROO TAKIZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FI...
- Publication number 20150293446
- Publication date Oct 15, 2015
- FUJIFILM CORPORATION
- Natsumi YOKOKAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FI...
- Publication number 20150284492
- Publication date Oct 8, 2015
- FUJIFILM CORPORATION
- Natsumi YOKOKAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...
- Publication number 20150185610
- Publication date Jul 2, 2015
- FUJIFILM CORPORATION
- Shuji HIRANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIO...
- Publication number 20150168834
- Publication date Jun 18, 2015
- FUJIFILM CORPORATION
- Hiroo TAKIZAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...
- Publication number 20150147688
- Publication date May 28, 2015
- FUJIFILM CORPORATION
- Natsumi YOKOKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20150140484
- Publication date May 21, 2015
- FUJIFILM CORPORATION
- Hiroo TAKIZAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20150132688
- Publication date May 14, 2015
- FUJIFILM CORPORATION
- Natsumi YOKOKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20150132687
- Publication date May 14, 2015
- FUJIFILM CORPORATION
- Shuji HIRANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-...
- Publication number 20150118628
- Publication date Apr 30, 2015
- FUJIFILM CORPORATION
- Takeshi KAWABATA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20150086912
- Publication date Mar 26, 2015
- FUJIFILM CORPORATION
- Takeshi KAWABATA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FI...
- Publication number 20150010857
- Publication date Jan 8, 2015
- FUJIFILM CORPORATION
- Natsumi YOKOKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, ACTINIC R...
- Publication number 20140272692
- Publication date Sep 18, 2014
- FUJIFILM CORPORATION
- Natsumi YOKOKAWA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Natsumi YOKOKAWA

Person

Patents Grantslast 30 patents

On-machine development type planographic printing plate precursor,...

Planographic printing plate precursor, method of preparing planogra...

Denture base coating composition, coating film-bearing denture base...

Actinic ray-sensitive or radiation-sensitive resin composition, act...

Pattern formation method, active light-sensitive or radiation-sensi...

Active light sensitive or radiation sensitive resin composition, ac...

Actinic ray-sensitive or radiation-sensitive resin composition, act...

Actinic ray-sensitive or radiation-sensitive resin composition, act...

Actinic ray-sensitive or radiation-sensitive resin composition, act...

Resin composition, resist film using same, resist-coated mask blank...

Pattern forming method, actinic ray-sensitive or radiation-sensitiv...

Pattern forming method, active light sensitive or radiation sensiti...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Compound, actinic ray-sensitive or radiation-sensitive resin compos...

Actinic ray-sensitive or radiation-sensitive composition, resist fi...

Actinic ray-sensitive or radiation-sensitive composition, resist fi...

Pattern forming method, electron beam-sensitive or extreme ultravio...

Pattern forming method, actinic ray-sensitive or radiation-sensitiv...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Actinic ray-sensitive or radiation-sensitive composition, actinic r...

Actinic ray-sensitive or radiation-sensitive composition, resist fi...

Patents Applicationslast 30 patents

ON-MACHINE DEVELOPMENT TYPE PLANOGRAPHIC PRINTING PLATE PRECURSOR,...

LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PREPARING LITHOGRA...

PLANOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PREPARING PLANOGRA...

DENTURE BASE COATING COMPOSITION, COATING FILM-BEARING DENTURE BASE...

RESIN COMPOSITION, RESIST FILM USING SAME, RESIST-COATED MASK BLANK...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, AC...

PATTERN FORMATION METHOD, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSI...

PATTERN FORMING METHOD, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITI...

COMPOUND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOS...

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FI...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FI...

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...

PATTERN FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIO...

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FI...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, ACTINIC R...