Nelson M. Felix

Person

Hopewell Junction, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Self aligned pattern formation post spacer etchback in tight pitch...
- Patent number 12,106,963
- Issue date Oct 1, 2024
- TESSERA LLC
- Sean D. Burns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polymer brush adhesion promoter with UV cleavable linker
- Patent number 12,019,376
- Issue date Jun 25, 2024
- International Business Machines Corporation
- Jing Guo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Bottom source/drain etch with fin-cut-last-VTFET
- Patent number 12,021,135
- Issue date Jun 25, 2024
- International Business Machines Corporation
- Tao Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spacer-defined process for lithography-etch double patterning for i...
- Patent number 11,804,401
- Issue date Oct 31, 2023
- International Business Machines Corporation
- Nelson Felix
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inverse tone pillar printing method using organic planarizing layer...
- Patent number 11,699,592
- Issue date Jul 11, 2023
- International Business Machines Corporation
- Nelson Felix
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bottom source/drain etch with fin-cut-last-VTFET
- Patent number 11,695,059
- Issue date Jul 4, 2023
- International Business Machines Corporation
- Tao Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
EUV pattern transfer using graded hardmask
- Patent number 11,681,213
- Issue date Jun 20, 2023
- International Business Machines Corporation
- Nelson Felix
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabrication of back-end-of-line interconnects
- Patent number 11,682,558
- Issue date Jun 20, 2023
- International Business Machines Corporation
- Chi-Chun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self aligned pattern formation post spacer etchback in tight pitch...
- Patent number 11,670,510
- Issue date Jun 6, 2023
- TESSERA LLC
- Sean D. Burns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned pattern formation for a semiconductor device
- Patent number 11,646,221
- Issue date May 9, 2023
- International Business Machines Corporation
- Sean D. Burns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alternating hardmasks for tight-pitch line formation
- Patent number 11,610,780
- Issue date Mar 21, 2023
- TESSERA LLC
- Sean D. Burns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organic photoresist adhesion to metal oxide hardmasks
- Patent number 11,543,751
- Issue date Jan 3, 2023
- International Business Machines Corporation
- Abraham Arceo de la Pena
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enabling residue free gap fill between nanosheets
- Patent number 11,515,431
- Issue date Nov 29, 2022
- International Business Machines Corporation
- Indira Seshadri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Patterning material film stack with hard mask layer configured to s...
- Patent number 11,500,293
- Issue date Nov 15, 2022
- International Business Machines Corporation
- Ekmini Anuja De Silva
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure with fully aligned vias
- Patent number 11,302,573
- Issue date Apr 12, 2022
- International Business Machines Corporation
- Ekmini Anuja De Silva
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Line break repairing layer for extreme ultraviolet patterning stacks
- Patent number 11,300,881
- Issue date Apr 12, 2022
- International Business Machines Corporation
- Luciana Meli Thompson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bottom source/drain etch with fin-cut-last-VTFET
- Patent number 11,245,027
- Issue date Feb 8, 2022
- International Business Machines Corporation
- Tao Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Litho-etch-litho-etch with self-aligned blocks
- Patent number 11,239,077
- Issue date Feb 1, 2022
- International Business Machines Corporation
- Chi-Chun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-priming resist for generic inorganic hardmasks
- Patent number 11,226,561
- Issue date Jan 18, 2022
- International Business Machines Corporation
- Chi-Chun Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Self-aligned pattern formation for a semiconductor device
- Patent number 11,227,793
- Issue date Jan 18, 2022
- International Business Machines Corporation
- Sean D. Burns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polymer brush adhesion promoter with UV cleavable linker
- Patent number 11,199,778
- Issue date Dec 14, 2021
- International Business Machines Corporation
- Jing Guo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to create multilayer microfluidic chips using spin-on carbon...
- Patent number 11,192,101
- Issue date Dec 7, 2021
- International Business Machines Corporation
- Chi-Chun Liu
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Back-end-of-line compatible processing for forming an array of pillars
- Patent number 11,195,995
- Issue date Dec 7, 2021
- International Business Machines Corporation
- Chi-Chun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Patterning material film stack with metal-containing top coat for e...
- Patent number 11,177,130
- Issue date Nov 16, 2021
- International Business Machines Corporation
- Ekmini Anuja De Silva
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alternating hardmasks for tight-pitch line formation
- Patent number 11,171,002
- Issue date Nov 9, 2021
- Tessera, Inc.
- John C. Arnold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spacer-defined process for lithography-etch double patterning for i...
- Patent number 11,164,772
- Issue date Nov 2, 2021
- International Business Machines Corporation
- Nelson Felix
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme ultraviolet (EUV) mask stack processing
- Patent number 11,131,919
- Issue date Sep 28, 2021
- International Business Machines Corporation
- Yongan Xu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inverse tone pillar printing method using polymer brush grafts
- Patent number 11,133,195
- Issue date Sep 28, 2021
- International Business Machines Corporation
- Nelson Felix
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned top via
- Patent number 11,133,260
- Issue date Sep 28, 2021
- International Business Machines Corporation
- Chi-Chun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tunable hardmask for overlayer metrology contrast
- Patent number 11,121,024
- Issue date Sep 14, 2021
- International Business Machines Corporation
- Ekmini A. De Silva
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
FABRICATION OF EUV MASKS USING A COMBINATION OF MONOLAYER LITHOGRAP...
- Publication number 20240280899
- Publication date Aug 22, 2024
- International Business Machines Corporation
- Rudy J. Wojtecki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIDDLE OF THE LINE ARCHITECTURE WITH SUBTRACTIVE SOURCE/DRAIN CONTACT
- Publication number 20240222448
- Publication date Jul 4, 2024
- International Business Machines Corporation
- Eric Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF ALIGNED PATTERN FORMATION POST SPACER ETCHBACK IN TIGHT PITCH...
- Publication number 20240096627
- Publication date Mar 21, 2024
- TESSERA LLC
- Sean D. Burns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALTERNATING HARDMASKS FOR TIGHT-PITCH LINE FORMATION
- Publication number 20240030036
- Publication date Jan 25, 2024
- TESSERA LLC
- Sean D. Burns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-LAYER HARDMASK FOR DEFECT REDUCTION IN EUV PATTERNING
- Publication number 20230343593
- Publication date Oct 26, 2023
- LAM RESEARCH CORPORATION
- Bhaskar NAGABHIRAVA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BOTTOM SOURCE/DRAIN ETCH WITH FIN-CUT-LAST-VTFET
- Publication number 20230275141
- Publication date Aug 31, 2023
- International Business Machines Corporation
- Tao Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATING GATE-CUTS AND SINGLE DIFFUSION BREAK ISOLATION POST-RMG...
- Publication number 20230178437
- Publication date Jun 8, 2023
- International Business Machines Corporation
- Ruilong Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC REFLOW FOR BOUNDARY CONTROL
- Publication number 20230170348
- Publication date Jun 1, 2023
- International Business Machines Corporation
- Jing Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FABRICATION OF BACK-END-OF-LINE INTERCONNECTS
- Publication number 20230096938
- Publication date Mar 30, 2023
- International Business Machines Corporation
- Chi-Chun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MACHINE LEARNING SYSTEM DESIGNS FOR PATTERNING MODELS WITH ONLINE A...
- Publication number 20230087777
- Publication date Mar 23, 2023
- International Business Machines Corporation
- Jing Sha
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
BOTTOM SOURCE/DRAIN ETCH WITH FIN-CUT-LAST-VTFET
- Publication number 20220069106
- Publication date Mar 3, 2022
- International Business Machines Corporation
- Tao Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLYMER BRUSH ADHESION PROMOTER WITH UV CLEAVABLE LINKER
- Publication number 20220043353
- Publication date Feb 10, 2022
- International Business Machines Corporation
- Jing Guo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SPACER-DEFINED PROCESS FOR LITHOGRAPHY-ETCH DOUBLE PATTERNING FOR I...
- Publication number 20220013405
- Publication date Jan 13, 2022
- International Business Machines Corporation
- Nelson Felix
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INVERSE TONE PILLAR PRINTING
- Publication number 20210398816
- Publication date Dec 23, 2021
- International Business Machines Corporation
- Nelson Felix
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALTERNATING HARDMASKS FOR TIGHT-PITCH LINE FORMATION
- Publication number 20210335619
- Publication date Oct 28, 2021
- Tessera, Inc.
- Sean D. Burns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ORGANIC PHOTORESIST ADHESION TO METAL OXIDE HARDMASKS
- Publication number 20210325784
- Publication date Oct 21, 2021
- International Business Machines Corporation
- Abraham Arceo de la Pena
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BOTTOM SOURCE/DRAIN ETCH WITH FIN-CUT-LAST-VTFET
- Publication number 20210288164
- Publication date Sep 16, 2021
- International Business Machines Corporation
- Tao Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF ALIGNED PATTERN FORMATION POST SPACER ETCHBACK IN TIGHT PITCH...
- Publication number 20210280422
- Publication date Sep 9, 2021
- Tessera, Inc.
- Sean D. Burns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BACK-END-OF-LINE COMPATIBLE PROCESSING FOR FORMING AN ARRAY OF PILLARS
- Publication number 20210210679
- Publication date Jul 8, 2021
- International Business Machines Corporation
- Chi-Chun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED TOP VIA
- Publication number 20210151377
- Publication date May 20, 2021
- International Business Machines Corporation
- Chi-Chun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHO-ETCH-LITHO-ETCH WITH SELF-ALIGNED BLOCKS
- Publication number 20210143013
- Publication date May 13, 2021
- International Business Machines Corporation
- Chi-Chun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSES FOR FORMING FULLY ALIGNED VIAS
- Publication number 20210104432
- Publication date Apr 8, 2021
- International Business Machines Corporation
- Ekmini Anuja De Silva
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEQUENTIAL INFILTRATION SYNTHESIS EXTREME ULTRAVIOLET SINGLE EXPOSE...
- Publication number 20210082697
- Publication date Mar 18, 2021
- International Business Machines Corporation
- Ekmini Anuja De Silva
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process Optimization by Clamped Monte Carlo Distribution
- Publication number 20210049242
- Publication date Feb 18, 2021
- International Business Machines Corporation
- Scott Halle
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DYNAMIC ADJUSTMENT OF POST EXPOSURE BAKE DURING LITHOGRAPHY UTILIZI...
- Publication number 20200379354
- Publication date Dec 3, 2020
- International Business Machines Corporation
- Cody John MURRAY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INVERSE TONE PILLAR PRINTING
- Publication number 20200350177
- Publication date Nov 5, 2020
- International Business Machines Corporation
- Nelson Felix
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLYMER BRUSH ADHESION PROMOTER WITH UV CLEAVABLE LINKER
- Publication number 20200292942
- Publication date Sep 17, 2020
- International Business Machines Corporation
- Jing Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENABLING RESIDUE FREE GAP FILL BETWEEN NANOSHEETS
- Publication number 20200279956
- Publication date Sep 3, 2020
- International Business Machines Corporation
- Indira SESHADRI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EUV Pattern Transfer Using Graded Hardmask
- Publication number 20200272045
- Publication date Aug 27, 2020
- International Business Machines Corporation
- Nelson Felix
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALTERNATING HARDMASKS FOR TIGHT-PITCH LINE FORMATION
- Publication number 20200266066
- Publication date Aug 20, 2020
- Tessera, Inc.
- John C. Arnold
- H01 - BASIC ELECTRIC ELEMENTS

Nelson M. Felix

Person

Patents Grantslast 30 patents

Self aligned pattern formation post spacer etchback in tight pitch...

Polymer brush adhesion promoter with UV cleavable linker

Bottom source/drain etch with fin-cut-last-VTFET

Spacer-defined process for lithography-etch double patterning for i...

Inverse tone pillar printing method using organic planarizing layer...

Bottom source/drain etch with fin-cut-last-VTFET

EUV pattern transfer using graded hardmask

Fabrication of back-end-of-line interconnects

Self aligned pattern formation post spacer etchback in tight pitch...

Self-aligned pattern formation for a semiconductor device

Alternating hardmasks for tight-pitch line formation

Organic photoresist adhesion to metal oxide hardmasks

Enabling residue free gap fill between nanosheets

Patterning material film stack with hard mask layer configured to s...

Semiconductor structure with fully aligned vias

Line break repairing layer for extreme ultraviolet patterning stacks

Bottom source/drain etch with fin-cut-last-VTFET

Litho-etch-litho-etch with self-aligned blocks

Self-priming resist for generic inorganic hardmasks

Self-aligned pattern formation for a semiconductor device

Polymer brush adhesion promoter with UV cleavable linker

Method to create multilayer microfluidic chips using spin-on carbon...

Back-end-of-line compatible processing for forming an array of pillars

Patterning material film stack with metal-containing top coat for e...

Alternating hardmasks for tight-pitch line formation

Spacer-defined process for lithography-etch double patterning for i...

Extreme ultraviolet (EUV) mask stack processing

Inverse tone pillar printing method using polymer brush grafts

Self-aligned top via

Tunable hardmask for overlayer metrology contrast

Patents Applicationslast 30 patents

FABRICATION OF EUV MASKS USING A COMBINATION OF MONOLAYER LITHOGRAP...

MIDDLE OF THE LINE ARCHITECTURE WITH SUBTRACTIVE SOURCE/DRAIN CONTACT

SELF ALIGNED PATTERN FORMATION POST SPACER ETCHBACK IN TIGHT PITCH...

ALTERNATING HARDMASKS FOR TIGHT-PITCH LINE FORMATION

MULTI-LAYER HARDMASK FOR DEFECT REDUCTION IN EUV PATTERNING

BOTTOM SOURCE/DRAIN ETCH WITH FIN-CUT-LAST-VTFET

INTEGRATING GATE-CUTS AND SINGLE DIFFUSION BREAK ISOLATION POST-RMG...

DIELECTRIC REFLOW FOR BOUNDARY CONTROL

FABRICATION OF BACK-END-OF-LINE INTERCONNECTS

MACHINE LEARNING SYSTEM DESIGNS FOR PATTERNING MODELS WITH ONLINE A...

BOTTOM SOURCE/DRAIN ETCH WITH FIN-CUT-LAST-VTFET

POLYMER BRUSH ADHESION PROMOTER WITH UV CLEAVABLE LINKER

SPACER-DEFINED PROCESS FOR LITHOGRAPHY-ETCH DOUBLE PATTERNING FOR I...

INVERSE TONE PILLAR PRINTING

ALTERNATING HARDMASKS FOR TIGHT-PITCH LINE FORMATION

ORGANIC PHOTORESIST ADHESION TO METAL OXIDE HARDMASKS

BOTTOM SOURCE/DRAIN ETCH WITH FIN-CUT-LAST-VTFET

SELF ALIGNED PATTERN FORMATION POST SPACER ETCHBACK IN TIGHT PITCH...

BACK-END-OF-LINE COMPATIBLE PROCESSING FOR FORMING AN ARRAY OF PILLARS

SELF-ALIGNED TOP VIA

LITHO-ETCH-LITHO-ETCH WITH SELF-ALIGNED BLOCKS

PROCESSES FOR FORMING FULLY ALIGNED VIAS

SEQUENTIAL INFILTRATION SYNTHESIS EXTREME ULTRAVIOLET SINGLE EXPOSE...

Process Optimization by Clamped Monte Carlo Distribution

DYNAMIC ADJUSTMENT OF POST EXPOSURE BAKE DURING LITHOGRAPHY UTILIZI...

INVERSE TONE PILLAR PRINTING

POLYMER BRUSH ADHESION PROMOTER WITH UV CLEAVABLE LINKER

ENABLING RESIDUE FREE GAP FILL BETWEEN NANOSHEETS

EUV Pattern Transfer Using Graded Hardmask

ALTERNATING HARDMASKS FOR TIGHT-PITCH LINE FORMATION