Nicolas Gani

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Internal plasma grid applications for semiconductor fabrication
- Patent number 9,633,846
- Issue date Apr 25, 2017
- Lam Research Corporation
- Alex Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for in-situ chamber clean utilized in an etching processing...
- Patent number 9,533,332
- Issue date Jan 3, 2017
- Applied Materials, Inc.
- Noel Sun
- B08 - CLEANING
Information Patent Grant
Polysilicon over-etch using hydrogen diluted plasma for three-dimen...
- Patent number 9,305,797
- Issue date Apr 5, 2016
- Applied Materials, Inc.
- Radhika C. Mani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Internal plasma grid applications for semiconductor fabrication in...
- Patent number 9,230,819
- Issue date Jan 5, 2016
- Lam Research Corporation
- Alex Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching high K dielectrics with high selectivity to oxide containin...
- Patent number 8,722,547
- Issue date May 13, 2014
- Applied Materials, Inc.
- Radhika Mani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shallow trench isolation etch process
- Patent number 8,133,817
- Issue date Mar 13, 2012
- Applied Materials, Inc.
- Hiroki Sasano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a semiconductor device having a lanthanum-fa...
- Patent number 8,101,525
- Issue date Jan 24, 2012
- Applied Materials, Inc.
- Meihua Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alternative method for advanced CMOS logic gate etch applications
- Patent number 7,910,488
- Issue date Mar 22, 2011
- Applied Materials, Inc.
- Nicolas Gani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching having a controlled distribution of process results
- Patent number 7,648,914
- Issue date Jan 19, 2010
- Applied Materials, Inc.
- Thomas J. Kropewnicki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for controlling temperature of a substrate
- Patent number 7,436,645
- Issue date Oct 14, 2008
- Applied Materials, Inc.
- John Holland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High selectivity and residue free process for metal on thin dielect...
- Patent number 6,933,243
- Issue date Aug 23, 2005
- Applied Materials, Inc.
- Meihua Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for tuning an RF matching network in a plasma...
- Patent number 6,818,562
- Issue date Nov 16, 2004
- Valentin Todorow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching organic antireflection coating (ARC) layers
- Patent number 6,599,437
- Issue date Jul 29, 2003
- Applied Materials Inc.
- Oranna Yauw
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ETCH RATE AND CRITICAL DIMENSION UNIFORMITY BY SELECTION OF FOCUS R...
- Publication number 20170011891
- Publication date Jan 12, 2017
- Applied Materials, Inc.
- Edward P. HAMMOND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERNAL PLASMA GRID APPLICATIONS FOR SEMICONDUCTOR FABRICATION
- Publication number 20160086795
- Publication date Mar 24, 2016
- LAM RESEARCH CORPORATION
- Alex Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERNAL PLASMA GRID APPLICATIONS FOR SEMICONDUCTOR FABRICATION
- Publication number 20140302678
- Publication date Oct 9, 2014
- Alex Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLYSILICON OVER-ETCH USING HYDROGEN DILUTED PLASMA FOR THREE-DIMEN...
- Publication number 20140199849
- Publication date Jul 17, 2014
- Applied Materials, Inc.
- Radhika C. Mani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR IN-SITU CHAMBER CLEAN UTILIZED IN AN ETCHING PROCESSING...
- Publication number 20130087174
- Publication date Apr 11, 2013
- Applied Materials, Inc.
- Noel Sun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR ETCHING SUBSTRATES USING PULSED DC VOLTAGE
- Publication number 20120088371
- Publication date Apr 12, 2012
- Applied Materials, Inc.
- ALOK RANJAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE HAVING A LANTHANUM-FA...
- Publication number 20100210112
- Publication date Aug 19, 2010
- Applied Materials, Inc.
- Meihua Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCH RATE AND CRITICAL DIMENSION UNIFORMITY BY SELECTION OF FOCUS R...
- Publication number 20090221150
- Publication date Sep 3, 2009
- Applied Materials, Inc.
- Edward P. Hammond, IV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE PORT GAS INJECTION SYSTEM UTILIZED IN A SEMICONDUCTOR PROC...
- Publication number 20090221149
- Publication date Sep 3, 2009
- Edward P. Hammond, IV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHALLOW TRENCH ISOLATION ETCH PROCESS
- Publication number 20090170333
- Publication date Jul 2, 2009
- APPLIED MATERIALS, INC.
- Hiroki Sasano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALTERNATIVE METHOD FOR ADVANCED CMOS LOGIC GATE ETCH APPLICATIONS
- Publication number 20090017633
- Publication date Jan 15, 2009
- Applied Materials, Inc.
- NICOLAS GANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING AND PASSIVATING FOR HIGH ASPECT RATIO FEATURES
- Publication number 20080286978
- Publication date Nov 20, 2008
- Rong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING OF SiO2 WITH HIGH SELECTIVITY TO Si3N4 AND ETCHING METAL OX...
- Publication number 20070249182
- Publication date Oct 25, 2007
- Applied Materials, Inc.
- Radhika Mani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR CONTROLLING TEMPERATURE OF A SUBSTRATE
- Publication number 20070139856
- Publication date Jun 21, 2007
- APPLIED MATERIALS, INC.
- John Holland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for etching having a controlled distribution of process results
- Publication number 20070042603
- Publication date Feb 22, 2007
- Thomas J. Kropewnicki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process for etching polysilicon gates with good mask selectivity, c...
- Publication number 20040152331
- Publication date Aug 5, 2004
- APPLIED MATERIALS, INC.
- Songlin Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for etching using building blocks
- Publication number 20040018739
- Publication date Jan 29, 2004
- APPLIED MATERIALS, INC.
- Farid Abooameri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for tuning an RF matching network in a plasma...
- Publication number 20030196757
- Publication date Oct 23, 2003
- APPLIED MATERIALS, INC.
- Valentin Todorow
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
High selectivity and residue free process for metal on thin dielect...
- Publication number 20030148622
- Publication date Aug 7, 2003
- APPLIED MATERIALS, INC.
- Meihua Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of etching organic antireflection coating (ARC) layers
- Publication number 20030029835
- Publication date Feb 13, 2003
- Oranna Yauw
- H01 - BASIC ELECTRIC ELEMENTS

Nicolas Gani

Person

Patents Grantslast 30 patents

Internal plasma grid applications for semiconductor fabrication

Methods for in-situ chamber clean utilized in an etching processing...

Polysilicon over-etch using hydrogen diluted plasma for three-dimen...

Internal plasma grid applications for semiconductor fabrication in...

Etching high K dielectrics with high selectivity to oxide containin...

Shallow trench isolation etch process

Method for fabricating a semiconductor device having a lanthanum-fa...

Alternative method for advanced CMOS logic gate etch applications

Method for etching having a controlled distribution of process results

Method and apparatus for controlling temperature of a substrate

High selectivity and residue free process for metal on thin dielect...

Method and apparatus for tuning an RF matching network in a plasma...

Method of etching organic antireflection coating (ARC) layers

Patents Applicationslast 30 patents

ETCH RATE AND CRITICAL DIMENSION UNIFORMITY BY SELECTION OF FOCUS R...

INTERNAL PLASMA GRID APPLICATIONS FOR SEMICONDUCTOR FABRICATION

INTERNAL PLASMA GRID APPLICATIONS FOR SEMICONDUCTOR FABRICATION

POLYSILICON OVER-ETCH USING HYDROGEN DILUTED PLASMA FOR THREE-DIMEN...

METHODS FOR IN-SITU CHAMBER CLEAN UTILIZED IN AN ETCHING PROCESSING...

METHODS FOR ETCHING SUBSTRATES USING PULSED DC VOLTAGE

METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE HAVING A LANTHANUM-FA...

ETCH RATE AND CRITICAL DIMENSION UNIFORMITY BY SELECTION OF FOCUS R...

MULTIPLE PORT GAS INJECTION SYSTEM UTILIZED IN A SEMICONDUCTOR PROC...

SHALLOW TRENCH ISOLATION ETCH PROCESS

ALTERNATIVE METHOD FOR ADVANCED CMOS LOGIC GATE ETCH APPLICATIONS

ETCHING AND PASSIVATING FOR HIGH ASPECT RATIO FEATURES

ETCHING OF SiO2 WITH HIGH SELECTIVITY TO Si3N4 AND ETCHING METAL OX...

METHOD AND APPARATUS FOR CONTROLLING TEMPERATURE OF A SUBSTRATE

Method for etching having a controlled distribution of process results

Process for etching polysilicon gates with good mask selectivity, c...

Methods for etching using building blocks

Method and apparatus for tuning an RF matching network in a plasma...

High selectivity and residue free process for metal on thin dielect...

Method of etching organic antireflection coating (ARC) layers