No-Hyun Huh

Person

Yongin-si, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Etching apparatus and etching method
- Patent number 8,361,274
- Issue date Jan 29, 2013
- Samsung Electronics Co., Ltd.
- Kwang-Myung Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter with etch prevention member(s)
- Patent number 7,560,712
- Issue date Jul 14, 2009
- Samsung Electronics Co., Ltd.
- Il-Kyoung Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method
- Patent number 7,497,963
- Issue date Mar 3, 2009
- Samsung Electronics Co., Ltd.
- Kwang-Myung Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Window for allowing end point of etching process to be detected and...
- Patent number 6,835,276
- Issue date Dec 28, 2004
- Samsung Electronics Co., Ltd.
- Jung-Hyun Hwang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming contacts for a semiconductor device
- Patent number 6,114,237
- Issue date Sep 5, 2000
- Samsung Electronics Co., Ltd.
- No-Hyun Huh
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MULTI INDUCTIVELY COUPLED PLASMA REACTOR AND METHOD THEREOF
- Publication number 20110204023
- Publication date Aug 25, 2011
- No-Hyun Huh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gas supply device and apparatus for processing a substrate
- Publication number 20100319853
- Publication date Dec 23, 2010
- Woo-Seok Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WAFER CLEANING APPARATUS
- Publication number 20080072925
- Publication date Mar 27, 2008
- Samsung Electronics Co., Ltd.
- Mi-Seok PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTER WITH ETCH PREVENTION MEMBER(S)
- Publication number 20080054194
- Publication date Mar 6, 2008
- Samsung Electronics Co., Ltd.
- Il-Kyoung KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR EVAPORATING LIQUID PRECURSORS AND METHODS...
- Publication number 20080044585
- Publication date Feb 21, 2008
- SAMSUNG ELECTRONICS CO., LTD.
- Jeong-Soo Suh
- C30 - CRYSTAL GROWTH
Information Patent Application
SUBSTRATE TREATMENT APPARATUS AND CLEANING METHOD
- Publication number 20080041308
- Publication date Feb 21, 2008
- Samsung Electronics Co., Ltd.
- Hyung-Sik HONG
- B08 - CLEANING
Information Patent Application
Method of ashing an object and apparatus for performing the same
- Publication number 20080038930
- Publication date Feb 14, 2008
- Jae-Kyung Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING APPARATUS INCLUDING TEMPERATURE...
- Publication number 20070181062
- Publication date Aug 9, 2007
- Il-Kyoung Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Filament member, ion source, and ion implantation apparatus
- Publication number 20070114436
- Publication date May 24, 2007
- SAMSUNG ELECTRONICS CO., LTD.
- Gyeong-Su Keum
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma doping method and plasma doping apparatus for performing the...
- Publication number 20070087584
- Publication date Apr 19, 2007
- SAMSUNG ELECTRONICS CO., LTD.
- Gyeong-Su Keum
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gas supply device and apparatus for processing a substrate
- Publication number 20070087296
- Publication date Apr 19, 2007
- SAMSUNG ELECTRONICS CO., LTD.
- Woo-Seok Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma doping method and plasma doping apparatus for performing the...
- Publication number 20070077366
- Publication date Apr 5, 2007
- Gyeong-Su Keum
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of cleaning plasma applicator in situ and plasma applicator...
- Publication number 20070051387
- Publication date Mar 8, 2007
- Wan-goo Hwang
- B08 - CLEANING
Information Patent Application
Etching method
- Publication number 20050153553
- Publication date Jul 14, 2005
- Kwang-Myung Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching apparatus and etching method
- Publication number 20050150861
- Publication date Jul 14, 2005
- Kwang-Myung Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Endpoint detector for a substrate manufacturing process
- Publication number 20050127192
- Publication date Jun 16, 2005
- Hyun-Kyu Kang
- G05 - CONTROLLING REGULATING
Information Patent Application
Window for allowing end point of etching process to be detected and...
- Publication number 20030057182
- Publication date Mar 27, 2003
- Jung-Hyun Hwang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Induction magnet for use in producing high-density plasma and metho...
- Publication number 20030008419
- Publication date Jan 9, 2003
- Jung-hyun Hwang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gas injector comprising block of ceramic material having gas inject...
- Publication number 20020088545
- Publication date Jul 11, 2002
- Doo Won Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

No-Hyun Huh

Person

Patents Grantslast 30 patents

Etching apparatus and etching method

Ion implanter with etch prevention member(s)

Etching method

Window for allowing end point of etching process to be detected and...

Method of forming contacts for a semiconductor device

Patents Applicationslast 30 patents

MULTI INDUCTIVELY COUPLED PLASMA REACTOR AND METHOD THEREOF

Gas supply device and apparatus for processing a substrate

WAFER CLEANING APPARATUS

ION IMPLANTER WITH ETCH PREVENTION MEMBER(S)

METHODS AND APPARATUS FOR EVAPORATING LIQUID PRECURSORS AND METHODS...

SUBSTRATE TREATMENT APPARATUS AND CLEANING METHOD

Method of ashing an object and apparatus for performing the same

SEMICONDUCTOR DEVICE MANUFACTURING APPARATUS INCLUDING TEMPERATURE...

Filament member, ion source, and ion implantation apparatus

Plasma doping method and plasma doping apparatus for performing the...

Gas supply device and apparatus for processing a substrate

Plasma doping method and plasma doping apparatus for performing the...

Method of cleaning plasma applicator in situ and plasma applicator...

Etching method

Etching apparatus and etching method

Endpoint detector for a substrate manufacturing process

Window for allowing end point of etching process to be detected and...

Induction magnet for use in producing high-density plasma and metho...

Gas injector comprising block of ceramic material having gas inject...