Noam Sapiens

Person

Bat Yam, IL

People

Patents Grantslast 30 patents

Information Patent Grant
Method and system for providing a quality metric for improved proce...
- Patent number 11,372,340
- Issue date Jun 28, 2022
- KLA Corporation
- Daniel Kandel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Symmetric target design in scatterometry overlay metrology
- Patent number 10,591,406
- Issue date Mar 17, 2020
- KLA-Tencor Corporation
- Barak Bringoltz
- G01 - MEASURING TESTING
Information Patent Grant
Overlay metrology using multiple parameter configurations
- Patent number 10,401,738
- Issue date Sep 3, 2019
- KLA-Tencor Corporation
- Andrew V. Hill
- G02 - OPTICS
Information Patent Grant
Structured illumination for contrast enhancement in overlay metrology
- Patent number 10,274,425
- Issue date Apr 30, 2019
- KLA-Tencor Corporation
- Joel Seligson
- G01 - MEASURING TESTING
Information Patent Grant
Near field metrology
- Patent number 10,261,014
- Issue date Apr 16, 2019
- KLA-Tencor Corporation
- Noam Sapiens
- G02 - OPTICS
Information Patent Grant
Symmetric target design in scatterometry overlay metrology
- Patent number 9,739,702
- Issue date Aug 22, 2017
- KLA-Tencor Corporation
- Barak Bringoltz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Structured illumination for contrast enhancement in overlay metrology
- Patent number 9,645,079
- Issue date May 9, 2017
- KLA-Tencor Corporation
- Joel Seligson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase characterization of targets
- Patent number 9,581,430
- Issue date Feb 28, 2017
- KLA-Tencor Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Grant
Angle-resolved antisymmetric scatterometry
- Patent number 9,255,895
- Issue date Feb 9, 2016
- KLA-Tencor Corporation
- Daniel Kandel
- G01 - MEASURING TESTING
Information Patent Grant
Optics symmetrization for metrology
- Patent number 9,164,397
- Issue date Oct 20, 2015
- KLA-Tencor Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Grant
Structured illumination for contrast enhancement in overlay metrology
- Patent number 9,104,120
- Issue date Aug 11, 2015
- KLA-Tencor Corporation
- Joel Seligson
- G01 - MEASURING TESTING
Information Patent Grant
Angle-resolved antisymmetric scatterometry
- Patent number 8,848,186
- Issue date Sep 30, 2014
- KLA-Tencor Corporation
- Daniel Kandel
- G01 - MEASURING TESTING
Information Patent Grant
Illumination control
- Patent number 8,681,413
- Issue date Mar 25, 2014
- KLA-Tencor Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Grant
Overlay metrology by pupil phase analysis
- Patent number 8,582,114
- Issue date Nov 12, 2013
- KLA-Tencor Corporation
- Amnon Manassen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Method and System for Providing a Quality Metric for Improved Proce...
- Publication number 20230051705
- Publication date Feb 16, 2023
- KLA Corporation
- Daniel Kandel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Overlay Metrology Using Multiple Parameter Configurations
- Publication number 20190041329
- Publication date Feb 7, 2019
- KLA-Tencor Corporation
- Andrew V. Hill
- G01 - MEASURING TESTING
Information Patent Application
Structured Illumination for Contrast Enhancement in Overlay Metrology
- Publication number 20170307523
- Publication date Oct 26, 2017
- KLA-Tencor Corporation
- Joel Seligson
- G01 - MEASURING TESTING
Information Patent Application
SYMMETRIC TARGET DESIGN IN SCATTEROMETRY OVERLAY METROLOGY
- Publication number 20160216197
- Publication date Jul 28, 2016
- KLA-Tencor Corporation
- Barak Bringoltz
- G02 - OPTICS
Information Patent Application
Structured Illumination for Contrast Enhancement in Overlay Metrology
- Publication number 20160003735
- Publication date Jan 7, 2016
- KLA-Tencor Corporation
- Joel Seligson
- G01 - MEASURING TESTING
Information Patent Application
SYMMETRIC TARGET DESIGN IN SCATTEROMETRY OVERLAY METROLOGY
- Publication number 20150204664
- Publication date Jul 23, 2015
- KLA-Tencor Corporation
- Barak Bringoltz
- G01 - MEASURING TESTING
Information Patent Application
NEAR FIELD METROLOGY
- Publication number 20150198524
- Publication date Jul 16, 2015
- KLA-Tencor Corporation
- Noam Sapiens
- G01 - MEASURING TESTING
Information Patent Application
Angle-Resolved Antisymmetric Scatterometry
- Publication number 20150177162
- Publication date Jun 25, 2015
- KLA-Tencor Corporation
- Daniel Kandel
- G01 - MEASURING TESTING
Information Patent Application
PHASE CHARACTERIZATION OF TARGETS
- Publication number 20140111791
- Publication date Apr 24, 2014
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Application
OVERLAY METROLOGY BY PUPIL PHASE ANALYSIS
- Publication number 20130044331
- Publication date Feb 21, 2013
- KLA-Tencor Corporation
- Amnon Manassen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR PROVIDING A QUALITY METRIC FOR IMPROVED PROCE...
- Publication number 20130035888
- Publication date Feb 7, 2013
- KLA-Tencor Corporation
- Daniel Kandel
- G01 - MEASURING TESTING
Information Patent Application
ILLUMINATION CONTROL
- Publication number 20120327503
- Publication date Dec 27, 2012
- KLA-Tencor Corporation
- Amnon Manassen
- G02 - OPTICS
Information Patent Application
STRUCTURED ILLUMINATION FOR CONTRAST ENHANCEMENT IN OVERLAY METROLOGY
- Publication number 20120206729
- Publication date Aug 16, 2012
- KLA-Tencor Corporation
- Joel Seligson
- G01 - MEASURING TESTING
Information Patent Application
ANGLE-RESOLVED ANTISYMMETRIC SCATTEROMETRY
- Publication number 20120120396
- Publication date May 17, 2012
- KLA-Tencor Corporation
- Daniel Kandel
- G01 - MEASURING TESTING
Information Patent Application
OPTICS SYMMETRIZATION FOR METROLOGY
- Publication number 20120033226
- Publication date Feb 9, 2012
- KLA-Tencor Corporation
- Amnon Manassen
- G01 - MEASURING TESTING

Noam Sapiens

Person

Patents Grantslast 30 patents

Method and system for providing a quality metric for improved proce...

Symmetric target design in scatterometry overlay metrology

Overlay metrology using multiple parameter configurations

Structured illumination for contrast enhancement in overlay metrology

Near field metrology

Symmetric target design in scatterometry overlay metrology

Structured illumination for contrast enhancement in overlay metrology

Phase characterization of targets

Angle-resolved antisymmetric scatterometry

Optics symmetrization for metrology

Structured illumination for contrast enhancement in overlay metrology

Angle-resolved antisymmetric scatterometry

Illumination control

Overlay metrology by pupil phase analysis

Patents Applicationslast 30 patents

Method and System for Providing a Quality Metric for Improved Proce...

Overlay Metrology Using Multiple Parameter Configurations

Structured Illumination for Contrast Enhancement in Overlay Metrology

SYMMETRIC TARGET DESIGN IN SCATTEROMETRY OVERLAY METROLOGY

Structured Illumination for Contrast Enhancement in Overlay Metrology

SYMMETRIC TARGET DESIGN IN SCATTEROMETRY OVERLAY METROLOGY

NEAR FIELD METROLOGY

Angle-Resolved Antisymmetric Scatterometry

PHASE CHARACTERIZATION OF TARGETS

OVERLAY METROLOGY BY PUPIL PHASE ANALYSIS

METHOD AND SYSTEM FOR PROVIDING A QUALITY METRIC FOR IMPROVED PROCE...

ILLUMINATION CONTROL

STRUCTURED ILLUMINATION FOR CONTRAST ENHANCEMENT IN OVERLAY METROLOGY

ANGLE-RESOLVED ANTISYMMETRIC SCATTEROMETRY

OPTICS SYMMETRIZATION FOR METROLOGY