Nobuo Shimazu

Person

Machida-city, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Electron beam proximity exposure apparatus and mask unit therefor
- Patent number 6,894,295
- Issue date May 17, 2005
- Leepl Corporation
- Nobuo Shimazu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam proximity exposure apparatus and method
- Patent number 6,727,507
- Issue date Apr 27, 2004
- Leepl Corporation
- Nobuo Shimazu
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Electron beam proximity exposure apparatus
- Patent number 6,703,623
- Issue date Mar 9, 2004
- Leepl Corporation
- Nobuo Shimazu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of mask for electron beam proximity exposure a...
- Patent number 6,444,374
- Issue date Sep 3, 2002
- LEEPL Corporatin
- Nobuo Shimazu
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and apparatus for evaluating the capacitance of an integrate...
- Patent number 5,097,204
- Issue date Mar 17, 1992
- Nippon Telegraph & Telephone Public Corporation
- Masahiro Yoshizawa
- G01 - MEASURING TESTING
Information Patent Grant
Charged particle beam generating apparatus
- Patent number 5,041,732
- Issue date Aug 20, 1991
- Nippon Telegraph & Telephone Corporation
- Kenichi Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged beam radiation apparatus
- Patent number 5,006,795
- Issue date Apr 9, 1991
- Nippon Telephone and Telegraph Public Corporation
- Masahiro Yoshizawa
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for testing integrated electronic device
- Patent number 4,980,639
- Issue date Dec 25, 1990
- Nippon Telegraph and Telephone Public Corporation
- Masahiro Yoshizawa
- G01 - MEASURING TESTING
Information Patent Grant
Characteristic test apparatus for electronic device and method for...
- Patent number 4,851,768
- Issue date Jul 25, 1989
- Nippon Telegraph & Telephone Corporation
- Masahiro Yoshizawa
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus of deflection calibration for a charged partic...
- Patent number 4,443,703
- Issue date Apr 17, 1984
- Nippon Telegraph & Telephone Public Corporation
- Nobuo Shimazu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Electron beam proximity exposure apparatus and method
- Publication number 20020096646
- Publication date Jul 25, 2002
- Nobuo Shimazu
- B82 - NANO-TECHNOLOGY
Information Patent Application
Manufacturing method of mask for electron beam proximity exposure a...
- Publication number 20020070354
- Publication date Jun 13, 2002
- Nobuo Shimazu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Manufacturing method of mask for electron beam proximity exposure a...
- Publication number 20020071994
- Publication date Jun 13, 2002
- Nobuo Shimazu
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron beam proximity exposure apparatus and mask unit therefor
- Publication number 20020070356
- Publication date Jun 13, 2002
- Nobuo Shimazu
- B82 - NANO-TECHNOLOGY

Nobuo Shimazu

Person

Patents Grantslast 30 patents

Electron beam proximity exposure apparatus and mask unit therefor

Electron beam proximity exposure apparatus and method

Electron beam proximity exposure apparatus

Manufacturing method of mask for electron beam proximity exposure a...

Method and apparatus for evaluating the capacitance of an integrate...

Charged particle beam generating apparatus

Charged beam radiation apparatus

Method and apparatus for testing integrated electronic device

Characteristic test apparatus for electronic device and method for...

Method and apparatus of deflection calibration for a charged partic...

Patents Applicationslast 30 patents

Electron beam proximity exposure apparatus and method

Manufacturing method of mask for electron beam proximity exposure a...

Manufacturing method of mask for electron beam proximity exposure a...

Electron beam proximity exposure apparatus and mask unit therefor