Nobuyuki Yoshioka

Person

Ibaraki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Phase shifter film and process for the same
- Patent number 7,282,308
- Issue date Oct 16, 2007
- Ulvac Coating Corporation
- Susumu Kawada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Phase shifter film and process for the same
- Patent number 7,090,947
- Issue date Aug 15, 2006
- Ulvac Coating Corporation
- Susumu Kawada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of and apparatus for washing photomask and washing solution...
- Patent number 7,077,915
- Issue date Jul 18, 2006
- Renesas Technology Corp.
- Yoshikazu Nagamura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Phase-shifting photomask blank, phase-shifting photomask, method fo...
- Patent number 6,689,515
- Issue date Feb 10, 2004
- Ulvac Coating Corporation
- Nobuyuki Yoshioka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Phase-shift photo mask blank, phase-shift photo mask and method for...
- Patent number 6,569,577
- Issue date May 27, 2003
- Ulvac Coating Corporation
- Akihiko Isao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask, manufacturing method thereof, and semiconductor device
- Patent number 6,340,543
- Issue date Jan 22, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Yoshikazu Nagamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Registration accuracy measurement mark, method of repairing defect...
- Patent number 6,323,560
- Issue date Nov 27, 2001
- Mitsubishi Denki Kabushiki Kaisha
- Koichiro Narimatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for cleaning photomask
- Patent number 6,277,205
- Issue date Aug 21, 2001
- Mitsubishi Denki Kabushiki Kaisha
- Yoshikazu Nagamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase-shifting photomask blank, phase-shifting photomask, method fo...
- Patent number 6,228,541
- Issue date May 8, 2001
- Ulvac Coating Corporation
- Akihiko Isao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of and apparatus for washing photomask and washing solution...
- Patent number 6,209,553
- Issue date Apr 3, 2001
- MitsubishiDenki Kabushiki Kaisha
- Yoshikazu Nagamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for cleaning photomask
- Patent number 6,071,376
- Issue date Jun 6, 2000
- Mitsubishi Denki Kabushiki Kaisha
- Yoshikazu Nagamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Registration accuracy measurement mark, method of repairing defect...
- Patent number 6,068,952
- Issue date May 30, 2000
- Mitsubishi Denki Kabushiki Kaisha
- Koichiro Narimatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask of attenuation type and manufacturing method thereof
- Patent number 6,048,647
- Issue date Apr 11, 2000
- Mitsubishi Denki Kabushiki Kaisha
- Junji Miyazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase-shifting photomask blank and method of manufacturing the same...
- Patent number 5,952,128
- Issue date Sep 14, 1999
- Ulvac Coating Corporation
- Akihiko Isao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing phase-shifting photomask blank
- Patent number 5,938,897
- Issue date Aug 17, 1999
- Ulcoat (Ulvac Coating Corporation)
- Akihiko Isao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Registration accuracy measurement mark
- Patent number 5,892,291
- Issue date Apr 6, 1999
- Mitsubishi Denki Kabushiki Kaisha
- Koichiro Narimatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask and manufacturing method thereof and exposure meth...
- Patent number 5,830,607
- Issue date Nov 3, 1998
- ULVAC Coating Corporation
- Akihiko Isao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask and manufacturing method thereof and exposure meth...
- Patent number 5,691,090
- Issue date Nov 25, 1997
- ULVAC Coating Corporation
- Akihiko Isao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask and manufacturing method thereof and exposure meth...
- Patent number 5,674,647
- Issue date Oct 7, 1997
- ULVAC Coating Corporation
- Akihiko Isao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of exposure employing phase shift mask of attenuation type
- Patent number 5,644,381
- Issue date Jul 1, 1997
- Mitsubishi Denki Kabushiki Kaisha
- Junji Miyazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask and manufacturing method thereof and exposure meth...
- Patent number 5,629,114
- Issue date May 13, 1997
- ULVAC Coating Corporation
- Akihiko Isao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase-shifting photomask blank, phase-shifting photomask, and metho...
- Patent number 5,605,776
- Issue date Feb 25, 1997
- Ulvac Coating Corporation
- Akihiko Isao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Attenuating type phase shifting mask, method of manufacturing there...
- Patent number 5,593,801
- Issue date Jan 14, 1997
- Mitsubishi Denki Kabushiki Kaisha
- Nobuyuki Yoshioka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device having diffusion regions formed with an ion be...
- Patent number 5,585,658
- Issue date Dec 17, 1996
- Mitsubishi Denki Kabushiki Kaisha
- Takao Mukai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of ion implantation
- Patent number 5,543,342
- Issue date Aug 6, 1996
- Mitsubishi Denki Kabushiki Kaisha
- Takao Mukai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
X-ray mask and its fabrication method
- Patent number 5,496,667
- Issue date Mar 5, 1996
- Mitsubishi Denki Kabushiki Kaisha
- Hideki Yabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask and manufacturing method thereof
- Patent number 5,482,799
- Issue date Jan 9, 1996
- Mitsubishi Denki Kabushiki Kaisha
- Akihiko Isao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask and manufacturing method thereof and exposure meth...
- Patent number 5,474,864
- Issue date Dec 12, 1995
- ULVAC Coating Corporation
- Akihiko Isao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask and method for repairing a defect of a phase shift...
- Patent number 5,464,713
- Issue date Nov 7, 1995
- Mitsubishi Denki Kabushiki Kaisha
- Nobuyuki Yoshioka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Attenuating type phase shifting mask and method of manufacturing th...
- Patent number 5,429,897
- Issue date Jul 4, 1995
- Mitsubishi Denki Kabushiki Kaisha
- Nobuyuki Yoshioka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Mask Pattern Designing Method Using Optical Proximity Correction in...
- Publication number 20080276215
- Publication date Nov 6, 2008
- National Inst. of Adv. Indust. Science and Tech.
- Tetsuya Higuchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method for designing mask pattern and method for manufacturing semi...
- Publication number 20080250383
- Publication date Oct 9, 2008
- Toshihiko Tanaka
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Phase shifter film and process for the same
- Publication number 20070009810
- Publication date Jan 11, 2007
- ULVAC COATING CORPORATION
- Susumu Kawada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of and apparatus for washing photomask and washing solution...
- Publication number 20040079386
- Publication date Apr 29, 2004
- Mitsubishi Denki Kabushiki Kaisha
- Yoshikazu Nagamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase shifter film and process for the same
- Publication number 20020009653
- Publication date Jan 24, 2002
- ULVAC COATING CORPORATION and MITSUBISHI DENKI KABUSHIKI KAISHA
- Susumu Kawada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Phase-shifting photomask blank, phase-shifting photomask, method fo...
- Publication number 20010018154
- Publication date Aug 30, 2001
- Ulvac Coating Corporation
- Nobuyuki Yoshioka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of and apparatus for washing photomask and washing solution...
- Publication number 20010008137
- Publication date Jul 19, 2001
- Mitsubishi Denki Kabushiki Kaisha
- Yoshikazu Nagamura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Nobuyuki Yoshioka

Person

Patents Grantslast 30 patents

Phase shifter film and process for the same

Phase shifter film and process for the same

Method of and apparatus for washing photomask and washing solution...

Phase-shifting photomask blank, phase-shifting photomask, method fo...

Phase-shift photo mask blank, phase-shift photo mask and method for...

Photomask, manufacturing method thereof, and semiconductor device

Registration accuracy measurement mark, method of repairing defect...

Method and apparatus for cleaning photomask

Phase-shifting photomask blank, phase-shifting photomask, method fo...

Method of and apparatus for washing photomask and washing solution...

Method and apparatus for cleaning photomask

Registration accuracy measurement mark, method of repairing defect...

Phase shift mask of attenuation type and manufacturing method thereof

Phase-shifting photomask blank and method of manufacturing the same...

Method of manufacturing phase-shifting photomask blank

Registration accuracy measurement mark

Phase shift mask and manufacturing method thereof and exposure meth...

Phase shift mask and manufacturing method thereof and exposure meth...

Phase shift mask and manufacturing method thereof and exposure meth...

Method of exposure employing phase shift mask of attenuation type

Phase shift mask and manufacturing method thereof and exposure meth...

Phase-shifting photomask blank, phase-shifting photomask, and metho...

Attenuating type phase shifting mask, method of manufacturing there...

Semiconductor device having diffusion regions formed with an ion be...

Method of ion implantation

X-ray mask and its fabrication method

Phase shift mask and manufacturing method thereof

Phase shift mask and manufacturing method thereof and exposure meth...

Phase shift mask and method for repairing a defect of a phase shift...

Attenuating type phase shifting mask and method of manufacturing th...

Patents Applicationslast 30 patents

Mask Pattern Designing Method Using Optical Proximity Correction in...

Method for designing mask pattern and method for manufacturing semi...

Phase shifter film and process for the same

Method of and apparatus for washing photomask and washing solution...

Phase shifter film and process for the same

Phase-shifting photomask blank, phase-shifting photomask, method fo...

Method of and apparatus for washing photomask and washing solution...