Noriaki Kandaka

Person

Tsukuba, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Optical element, projection optical system, exposure apparatus, and...
- Patent number 10,353,120
- Issue date Jul 16, 2019
- Nikon Corporation
- Noriaki Kandaka
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Multilayer film reflector, method of manufacturing multilayer film...
- Patent number 10,126,660
- Issue date Nov 13, 2018
- Nikon Corporation
- Noriaki Kandaka
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Multilayer mirror, method for manufacturing the same, and exposure...
- Patent number 7,706,058
- Issue date Apr 27, 2010
- Nikon Corporation
- Noriaki Kandaka
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Multilayer mirror, method for manufacturing the same, and exposure...
- Patent number 7,440,182
- Issue date Oct 21, 2008
- Nikon Corporation
- Noriaki Kandaka
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
EUV multilayer mirror with phase shifting layer
- Patent number 7,382,527
- Issue date Jun 3, 2008
- Nikon Corporation
- Noriaki Kandaka
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Multi-layered film reflector manufacturing method
- Patent number 6,898,011
- Issue date May 24, 2005
- Nikon Corporation
- Noriaki Kandaka
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
High-intensity sources of short-wavelength electromagnetic radiatio...
- Patent number 6,590,959
- Issue date Jul 8, 2003
- Nikon Corporation
- Noriaki Kandaka
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Laser-excited plasma light source, exposure apparatus and its makin...
- Patent number 6,504,903
- Issue date Jan 7, 2003
- Nikon Corporation
- Hiroyuki Kondo
- B82 - NANO-TECHNOLOGY
Information Patent Grant
X-ray apparatus
- Patent number 6,385,290
- Issue date May 7, 2002
- Nikon Corporation
- Hiroyuki Kondo
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Soft x-ray light source device
- Patent number 6,339,634
- Issue date Jan 15, 2002
- Nikon Corporation
- Noriaki Kandaka
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photoelectron spectroscopy apparatus
- Patent number 6,326,617
- Issue date Dec 4, 2001
- Synaptic Pharmaceutical Corporation
- Toshihisa Tomie
- G01 - MEASURING TESTING
Information Patent Grant
X-ray irradiation apparatus and x-ray exposure apparatus
- Patent number 6,324,255
- Issue date Nov 27, 2001
- Nikon Technologies, Inc.
- Hiroyuki Kondo
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and apparatus for soft X-ray generation
- Patent number 6,285,743
- Issue date Sep 4, 2001
- Nikon Corporation
- Hiroyuki Kondo
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
MULTILAYER FILM REFLECTOR, METHOD OF MANUFACTURING MULTILAYER FILM...
- Publication number 20160246178
- Publication date Aug 25, 2016
- Nikon Corporation
- Noriaki KANDAKA
- G02 - OPTICS
Information Patent Application
OPTICAL ELEMENT, PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND...
- Publication number 20160054488
- Publication date Feb 25, 2016
- NIKON CORPORATION
- Noriaki KANDAKA
- G02 - OPTICS
Information Patent Application
Multilayer mirror, method for manufacturing the same, and exposure...
- Publication number 20090097104
- Publication date Apr 16, 2009
- Nikon Corporation
- Noriaki Kandaka
- G02 - OPTICS
Information Patent Application
Multilayer mirror, method for manufacturing the same, and exposure...
- Publication number 20060192147
- Publication date Aug 31, 2006
- Nikon Corporation
- Noriaki Kandaka
- G02 - OPTICS
Information Patent Application
Multilayer reflective mirrors for EUV, wavefront-aberration-correct...
- Publication number 20050157384
- Publication date Jul 21, 2005
- NIKON CORPORATION
- Masayuki Shiraishi
- G02 - OPTICS
Information Patent Application
Extreme ultraviolet light generating device, exposure apparatus usi...
- Publication number 20040219728
- Publication date Nov 4, 2004
- Noriaki Kandaka
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Multi-layered film reflector manufacturing method
- Publication number 20030147139
- Publication date Aug 7, 2003
- Noriaki Kandaka
- G02 - OPTICS
Information Patent Application
Film forming method,multilayer film reflector manufacturing method,...
- Publication number 20030129325
- Publication date Jul 10, 2003
- Noriaki Kandaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Multilayer-film mirrors for use in extreme UV optical systems, and...
- Publication number 20030081722
- Publication date May 1, 2003
- NIKON CORPORATION
- Noriaki Kandaka
- G02 - OPTICS
Information Patent Application
Multilayer reflective mirrors for EUV, wavefront-aberration-correct...
- Publication number 20020171922
- Publication date Nov 21, 2002
- NIKON CORPORATION
- Masayuki Shiraishi
- G02 - OPTICS
Information Patent Application
High-intensity sources of short-wavelength electromagnetic radiatio...
- Publication number 20010055364
- Publication date Dec 27, 2001
- NIKON CORPORATION
- Noriaki Kandaka
- B82 - NANO-TECHNOLOGY

Noriaki Kandaka

Person

Patents Grantslast 30 patents

Optical element, projection optical system, exposure apparatus, and...

Multilayer film reflector, method of manufacturing multilayer film...

Multilayer mirror, method for manufacturing the same, and exposure...

Multilayer mirror, method for manufacturing the same, and exposure...

EUV multilayer mirror with phase shifting layer

Multi-layered film reflector manufacturing method

High-intensity sources of short-wavelength electromagnetic radiatio...

Laser-excited plasma light source, exposure apparatus and its makin...

X-ray apparatus

Soft x-ray light source device

Photoelectron spectroscopy apparatus

X-ray irradiation apparatus and x-ray exposure apparatus

Method and apparatus for soft X-ray generation

Patents Applicationslast 30 patents

MULTILAYER FILM REFLECTOR, METHOD OF MANUFACTURING MULTILAYER FILM...

OPTICAL ELEMENT, PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND...

Multilayer mirror, method for manufacturing the same, and exposure...

Multilayer mirror, method for manufacturing the same, and exposure...

Multilayer reflective mirrors for EUV, wavefront-aberration-correct...

Extreme ultraviolet light generating device, exposure apparatus usi...

Multi-layered film reflector manufacturing method

Film forming method,multilayer film reflector manufacturing method,...

Multilayer-film mirrors for use in extreme UV optical systems, and...

Multilayer reflective mirrors for EUV, wavefront-aberration-correct...

High-intensity sources of short-wavelength electromagnetic radiatio...