Noriaki Toyoda

Person

Kobe-Shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Etching method, etching apparatus, and storage medium
- Patent number 9,449,844
- Issue date Sep 20, 2016
- Tokyo Electron Limited
- Kenichi Hara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Charged particle separation apparatus and charged particle bombardm...
- Patent number 8,168,946
- Issue date May 1, 2012
- Tokyo Electron Limited
- Masaki Narushima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultra precise polishing method and ultra precise polishing apparatus
- Patent number 7,420,189
- Issue date Sep 2, 2008
- Olympus Corporation
- Tomonori Imamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Production method of SiC monitor wafer
- Patent number 7,022,545
- Issue date Apr 4, 2006
- Mitsui Engineering & Shipbuilding Co., Ltd.
- Isao Yamada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Boron doping by decaborane
- Patent number 6,013,332
- Issue date Jan 11, 2000
- Fujitsu Limited
- Kenichi Goto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PLANARIZATION METHOD, SUBSTRATE TREATMENT SYSTEM, MRAM MANUFACTURIN...
- Publication number 20160035584
- Publication date Feb 4, 2016
- TOKYO ELECTRON LIMITED
- Kenichi HARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLUSTER BEAM GENERATING APPARATUS, SUBSTRATE PROCESSING APPARATUS,...
- Publication number 20140083976
- Publication date Mar 27, 2014
- TOKYO ELECTRON LIMITED
- Noriaki TOYODA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD, ETCHING APPARATUS, AND STORAGE MEDIUM
- Publication number 20130075248
- Publication date Mar 28, 2013
- Hyogo Prefecture
- Kenichi HARA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SURFACE PROCESSING METHOD AND SURFACE PROCESSING APPARATUS
- Publication number 20120128892
- Publication date May 24, 2012
- TOKYO ELECTRON LIMITED
- Noriaki TOYODA
- C30 - CRYSTAL GROWTH
Information Patent Application
CLUSTER BEAM GENERATING APPARATUS, SUBSTRATE PROCESSING APPARATUS,...
- Publication number 20120125889
- Publication date May 24, 2012
- TOKYO ELECTRON LIMITED
- Noriaki TOYODA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHARGED PARTICLE SEPARATION APPARATUS AND CHARGED PARTICLE BOMBARDM...
- Publication number 20100320380
- Publication date Dec 23, 2010
- TOKYO ELECTRON LIMITED
- MASAKI NARUSHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE SEPARATION APPARATUS AND CHARGED PARTICLE BOMBARDM...
- Publication number 20100319545
- Publication date Dec 23, 2010
- TOKYO ELECTRON LIMITED
- MASAKI NARUSHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ultra precise polishing method and ultra precise polishing apparatus
- Publication number 20070227879
- Publication date Oct 4, 2007
- Olympus Corporation
- Tomonori Imamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Production method of sic monitor wafer
- Publication number 20050042800
- Publication date Feb 24, 2005
- MITSUI ENGINEERING & SHIPPING CO LTD
- Isao Yamada
- C30 - CRYSTAL GROWTH

Noriaki Toyoda

Person

Patents Grantslast 30 patents

Etching method, etching apparatus, and storage medium

Charged particle separation apparatus and charged particle bombardm...

Ultra precise polishing method and ultra precise polishing apparatus

Production method of SiC monitor wafer

Boron doping by decaborane

Patents Applicationslast 30 patents

PLANARIZATION METHOD, SUBSTRATE TREATMENT SYSTEM, MRAM MANUFACTURIN...

CLUSTER BEAM GENERATING APPARATUS, SUBSTRATE PROCESSING APPARATUS,...

ETCHING METHOD, ETCHING APPARATUS, AND STORAGE MEDIUM

SURFACE PROCESSING METHOD AND SURFACE PROCESSING APPARATUS

CLUSTER BEAM GENERATING APPARATUS, SUBSTRATE PROCESSING APPARATUS,...

CHARGED PARTICLE SEPARATION APPARATUS AND CHARGED PARTICLE BOMBARDM...

CHARGED PARTICLE SEPARATION APPARATUS AND CHARGED PARTICLE BOMBARDM...

Ultra precise polishing method and ultra precise polishing apparatus

Production method of sic monitor wafer