Norio Komine

Person

Kanagawa-ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Illumination optical system, exposure apparatus, and exposure metho...
- Patent number 7,515,247
- Issue date Apr 7, 2009
- Nikon Corporation
- Osamu Tanitsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical system, exposure apparatus, and exposure metho...
- Patent number 7,515,248
- Issue date Apr 7, 2009
- Nikon Corporation
- Osamu Tanitsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical system, exposure apparatus, and exposure metho...
- Patent number 7,423,731
- Issue date Sep 9, 2008
- Nikon Corporation
- Osamu Tanitsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and optical component for the same
- Patent number 7,072,026
- Issue date Jul 4, 2006
- Nikon Corporation
- Masafumi Mizuguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Quartz glass member and projection aligner
- Patent number 6,835,683
- Issue date Dec 28, 2004
- Nikon Corporation
- Norio Komine
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Synthetic silica glass member, photolithography apparatus and proce...
- Patent number 6,656,860
- Issue date Dec 2, 2003
- Nikon Corporation
- Akiko Yoshida
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Optical member made of silica glass, method for manufacturing silic...
- Patent number 6,649,268
- Issue date Nov 18, 2003
- Nikon Corporation
- Norio Komine
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
UV synthetic silica glass optical member and reduction projection e...
- Patent number 6,587,262
- Issue date Jul 1, 2003
- Nikon Corporation
- Seishi Fujiwara
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Exposure apparatus including silica glass and method for producing...
- Patent number 6,518,210
- Issue date Feb 11, 2003
- Nikon Corporation
- Hiroki Jinbo
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Forming method of silica glass and forming apparatus thereof
- Patent number 6,505,484
- Issue date Jan 14, 2003
- Nikon Corporation
- Seishi Fujiwara
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Synthetic silica glass and its manufacturing method
- Patent number 6,442,973
- Issue date Sep 3, 2002
- Nikon Corporation
- Norio Komine
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Manufacturing method of synthetic silica glass
- Patent number 6,378,340
- Issue date Apr 30, 2002
- Nikon Corporation
- Seishi Fujiwara
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Silica glass and its manufacturing method
- Patent number 6,374,639
- Issue date Apr 23, 2002
- Nikon Corporation
- Norio Komine
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Silica glass having superior durability against excimer laser beams...
- Patent number 6,339,033
- Issue date Jan 15, 2002
- Nikon Corporation
- Hiroki Jinbo
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Method for measuring transmittance of optical members for ultraviol...
- Patent number 6,320,661
- Issue date Nov 20, 2001
- Nikon Corporation
- Akiko Yoshida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silica glass and its manufacturing method
- Patent number 6,291,377
- Issue date Sep 18, 2001
- Nikon Corporation
- Norio Komine
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Method for manufacturing optical components for use in the ultravio...
- Patent number 6,269,661
- Issue date Aug 7, 2001
- Nikon Corporation
- Hiroki Jinbo
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Silica glass having superior durability against excimer laser beams...
- Patent number 6,174,830
- Issue date Jan 16, 2001
- Nikon Corporation
- Hiroki Jinbo
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Manufacturing method of synthetic silica glass
- Patent number 6,094,940
- Issue date Aug 1, 2000
- Nikon Corporation
- Seishi Fujiwara
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Silica glass for photolithography
- Patent number 6,087,283
- Issue date Jul 11, 2000
- Nikon Corporation
- Hiroki Jinbo
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Method for estimating durability of optical member against excimer...
- Patent number 6,075,607
- Issue date Jun 13, 2000
- Nikon Corporation
- Hiroki Jinbo
- G01 - MEASURING TESTING
Information Patent Grant
Image-focusing optical system for ultraviolet laser
- Patent number 6,061,174
- Issue date May 9, 2000
- Nikon Corporation
- Masaki Shiozawa
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method for manufacturing optical components for use in the ultravio...
- Patent number 5,983,672
- Issue date Nov 16, 1999
- Nikon Corporation
- Hiroki Jinbo
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Fluorine-containing silica glass
- Patent number 5,958,809
- Issue date Sep 28, 1999
- Nikon Corporation
- Seishi Fujiwara
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Method for producing a silica glass
- Patent number 5,908,482
- Issue date Jun 1, 1999
- Nikon Corporation
- Norio Komine
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Silica glass
- Patent number 5,707,908
- Issue date Jan 13, 1998
- Nikon Corporation
- Norio Komine
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Silica glass member for UV-lithography, method for silica glass pro...
- Patent number 5,703,712
- Issue date Dec 30, 1997
- Nikon Corporation
- Norio Komine
- G02 - OPTICS
Information Patent Grant
Silica glass member for UV-lithography, method for silica glass pro...
- Patent number 5,699,183
- Issue date Dec 16, 1997
- Nikon Corporation
- Hiroyuki Hiraiwa
- G02 - OPTICS
Information Patent Grant
Silica glass member for UV-lithography, method for silica glass pro...
- Patent number 5,696,624
- Issue date Dec 9, 1997
- Nikon Corporation
- Norio Komine
- G02 - OPTICS
Information Patent Grant
Method for producing silica glass for use with light in a vacuum ul...
- Patent number 5,679,125
- Issue date Oct 21, 1997
- Nikon Corporation
- Hiroyuki Hiraiwa
- C03 - GLASS MINERAL OR SLAG WOOL

Patents Applicationslast 30 patents

Information Patent Application
ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD
- Publication number 20120236285
- Publication date Sep 20, 2012
- Nikon Corporation
- Osamu Tanitsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Illumination optical system, exposure apparatus, and exposure method
- Publication number 20100225895
- Publication date Sep 9, 2010
- Nikon Corporation
- Osamu Tanitsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Illumination optical system, exposure apparatus, and exposure method
- Publication number 20100149511
- Publication date Jun 17, 2010
- Nikon Corporation
- Osamu Tanitsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Illumination optical system, exposure apparatus, and exposure method
- Publication number 20080239274
- Publication date Oct 2, 2008
- Nikon Corporation
- Osamu Tanitsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Illumination optical system, exposure apparatus, and exposure method
- Publication number 20080094602
- Publication date Apr 24, 2008
- Nikon Corporation
- Osamu Tanitsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Illumination optical system, exposure apparatus, and exposure method
- Publication number 20080074632
- Publication date Mar 27, 2008
- Nikon Corporation
- Osamu Tanitsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Illuminating optical system, exposure system and exposure method
- Publication number 20060171138
- Publication date Aug 3, 2006
- Kenichi Muramatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure apparatus and optical component for the same
- Publication number 20060164620
- Publication date Jul 27, 2006
- Nikon Corporation
- Masafumi Mizuguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure apparatus and optical component for the same
- Publication number 20060158636
- Publication date Jul 20, 2006
- Nikon Corporation
- Masafumi Mizuguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Synthetic quartz member, exposure apparatus, and method of manufact...
- Publication number 20060110604
- Publication date May 25, 2006
- Nikon Corporation
- Masafumi Mizuguchi
- G02 - OPTICS
Information Patent Application
Illumination optical system, exposure apparatus, and exposure method
- Publication number 20060055834
- Publication date Mar 16, 2006
- Nikon Corporation
- Osamu Tanitsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure apparatus and optical component for the same
- Publication number 20060012768
- Publication date Jan 19, 2006
- Nikon Corporation
- Masafumi Mizuguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical member made of silica glass, method for manufacturing silic...
- Publication number 20050284177
- Publication date Dec 29, 2005
- Nikon Corporation
- Norio Komine
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
Synthetic quartz glass member and method for producing the same
- Publication number 20050047986
- Publication date Mar 3, 2005
- Nikon Corporation
- Masafumi Mizuguchi
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
Optical member made of silica glass, method for manufacturing silic...
- Publication number 20040095566
- Publication date May 20, 2004
- Norio Komine
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
Optical member and projection optical system for photolithography u...
- Publication number 20040047029
- Publication date Mar 11, 2004
- NIKON CORPORATION
- Norio Komine
- G02 - OPTICS
Information Patent Application
Quartz glass member and projection aligner
- Publication number 20030171203
- Publication date Sep 11, 2003
- Norio Komine
- G02 - OPTICS
Information Patent Application
Exposure apparatus including silica glass for photolithography
- Publication number 20030119649
- Publication date Jun 26, 2003
- NIKON CORPORATION
- Hiroki Jinbo
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
Fluorine-containing silica glass and its method of manufacture
- Publication number 20030037568
- Publication date Feb 27, 2003
- NIKON CORPORATION
- Seishi Fujiwara
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
Synthetic silica glass optical member and method of manufacturing t...
- Publication number 20020144517
- Publication date Oct 10, 2002
- Nikon Corporation
- Seishi Fujiwara
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
Synthetic silica glass member, photolithography apparatus and proce...
- Publication number 20020082157
- Publication date Jun 27, 2002
- Nikon Corporation
- Akiko Yoshida
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
Synthetic silica glass molding method, synthetic silica glass moldi...
- Publication number 20020050152
- Publication date May 2, 2002
- Seishi Fujiwara
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
Silica glass and its manufacturing method
- Publication number 20020013208
- Publication date Jan 31, 2002
- NIKON CORPORATION
- Norio Komine
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
Manufacturing method of synthetic silica glass
- Publication number 20020007649
- Publication date Jan 24, 2002
- Seishi Fujiwara
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
Silica glass having superior durability against excimer laser beams...
- Publication number 20010000508
- Publication date Apr 26, 2001
- NIKON CORPORATION
- Hiroki Jinbo
- C03 - GLASS MINERAL OR SLAG WOOL

Norio Komine

Person

Patents Grantslast 30 patents

Illumination optical system, exposure apparatus, and exposure metho...

Illumination optical system, exposure apparatus, and exposure metho...

Illumination optical system, exposure apparatus, and exposure metho...

Exposure apparatus and optical component for the same

Quartz glass member and projection aligner

Synthetic silica glass member, photolithography apparatus and proce...

Optical member made of silica glass, method for manufacturing silic...

UV synthetic silica glass optical member and reduction projection e...

Exposure apparatus including silica glass and method for producing...

Forming method of silica glass and forming apparatus thereof

Synthetic silica glass and its manufacturing method

Manufacturing method of synthetic silica glass

Silica glass and its manufacturing method

Silica glass having superior durability against excimer laser beams...

Method for measuring transmittance of optical members for ultraviol...

Silica glass and its manufacturing method

Method for manufacturing optical components for use in the ultravio...

Silica glass having superior durability against excimer laser beams...

Manufacturing method of synthetic silica glass

Silica glass for photolithography

Method for estimating durability of optical member against excimer...

Image-focusing optical system for ultraviolet laser

Method for manufacturing optical components for use in the ultravio...

Fluorine-containing silica glass

Method for producing a silica glass

Silica glass

Silica glass member for UV-lithography, method for silica glass pro...

Silica glass member for UV-lithography, method for silica glass pro...

Silica glass member for UV-lithography, method for silica glass pro...

Method for producing silica glass for use with light in a vacuum ul...

Patents Applicationslast 30 patents

ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD

Illumination optical system, exposure apparatus, and exposure method

Illumination optical system, exposure apparatus, and exposure method

Illumination optical system, exposure apparatus, and exposure method

Illumination optical system, exposure apparatus, and exposure method

Illumination optical system, exposure apparatus, and exposure method

Illuminating optical system, exposure system and exposure method

Exposure apparatus and optical component for the same

Exposure apparatus and optical component for the same

Synthetic quartz member, exposure apparatus, and method of manufact...

Illumination optical system, exposure apparatus, and exposure method

Exposure apparatus and optical component for the same

Optical member made of silica glass, method for manufacturing silic...

Synthetic quartz glass member and method for producing the same

Optical member made of silica glass, method for manufacturing silic...

Optical member and projection optical system for photolithography u...

Quartz glass member and projection aligner

Exposure apparatus including silica glass for photolithography

Fluorine-containing silica glass and its method of manufacture

Synthetic silica glass optical member and method of manufacturing t...

Synthetic silica glass member, photolithography apparatus and proce...

Synthetic silica glass molding method, synthetic silica glass moldi...

Silica glass and its manufacturing method

Manufacturing method of synthetic silica glass

Silica glass having superior durability against excimer laser beams...