Norio Saitou

Person

Tokorozawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Charged particle beam exposure method and apparatus and device manu...
- Patent number 6,946,665
- Issue date Sep 20, 2005
- Canon Kabushiki Kaisha
- Masato Muraki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam monitoring sensor and electron beam monitoring method
- Patent number 6,768,118
- Issue date Jul 27, 2004
- Hitachi, Ltd.
- Yoshinori Nakayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam lithography apparatus
- Patent number 6,730,916
- Issue date May 4, 2004
- Canon Kabushiki Kaisha
- Hiroshi Tsuji
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Electron beam exposure method, electron beam exposure apparatus and...
- Patent number 6,667,486
- Issue date Dec 23, 2003
- Hitachi, Ltd.
- Hiroya Ohta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam lithography apparatus and pattern forming method
- Patent number 6,511,048
- Issue date Jan 28, 2003
- Hitachi, Ltd.
- Yasunari Sohda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating semiconductor circuit devices utilizing multi...
- Patent number 6,159,644
- Issue date Dec 12, 2000
- Hitachi, Ltd.
- Hidetoshi Satoh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electron beam writing method and apparatus for carrying out the same
- Patent number 5,759,423
- Issue date Jun 2, 1998
- Hitachi, Ltd.
- Yasunari Sohda
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Exposure method and pattern data preparation system therefor, patte...
- Patent number 5,757,409
- Issue date May 26, 1998
- Hitachi, Ltd.
- Yoshihiko Okamoto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam writing system
- Patent number 5,650,631
- Issue date Jul 22, 1997
- Hitachi, Ltd.
- Yasunari Sohda
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Exposure method and pattern data preparation system therefor, patte...
- Patent number 5,557,314
- Issue date Sep 17, 1996
- Hitachi, Ltd.
- Yoshihiko Okamoto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Methods for measuring optical system, and method and apparatus for...
- Patent number 5,420,436
- Issue date May 30, 1995
- Hitachi, Ltd.
- Eiichi Seya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle beam lithography system and method therefor
- Patent number 5,311,026
- Issue date May 10, 1994
- Hitachi, Ltd.
- Norio Saitou
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam writing system used in a cell projection method
- Patent number 5,283,440
- Issue date Feb 1, 1994
- Hitachi, Ltd.
- Yasunari Sohda
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and apparatus of fabricating electric circuit pattern on thi...
- Patent number 5,162,240
- Issue date Nov 10, 1992
- Hitachi, Ltd.
- Norio Saitou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam lithography system
- Patent number 4,943,729
- Issue date Jul 24, 1990
- Hitachi, Ltd.
- Kimiaki Ando
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam lithography system
- Patent number 4,829,444
- Issue date May 9, 1989
- Hitachi, Ltd.
- Norio Saitou
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithography apparatus
- Patent number 4,820,928
- Issue date Apr 11, 1989
- Hitachi, Ltd.
- Mitsuo Ooyama
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Hybrid charged particle apparatus
- Patent number 4,740,698
- Issue date Apr 26, 1988
- Hitachi, Ltd.
- Hifumi Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam exposure apparatus
- Patent number 4,701,620
- Issue date Oct 20, 1987
- Hitachi, Ltd.
- Masahide Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam lithography apparatus
- Patent number 4,692,579
- Issue date Sep 8, 1987
- Hitachi, Ltd.
- Norio Saitou
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Apparatus for electron beam lithography
- Patent number 4,577,111
- Issue date Mar 18, 1986
- Hitachi, Ltd.
- Norio Saitou
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Exposure method with electron beam exposure apparatus
- Patent number 4,489,241
- Issue date Dec 18, 1984
- Hitachi, Ltd.
- Tadahito Matsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shaping aperture for a charged particle forming system
- Patent number 4,445,040
- Issue date Apr 24, 1984
- Hitachi, Ltd.
- Teruo Iwasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus of deflection calibration for a charged partic...
- Patent number 4,443,703
- Issue date Apr 17, 1984
- Nippon Telegraph & Telephone Public Corporation
- Nobuo Shimazu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for correcting deflection distortion in an apparatus for cha...
- Patent number 4,396,901
- Issue date Aug 2, 1983
- Hitachi, Ltd.
- Norio Saitou
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Charged particle beam exposure method and apparatus and device manu...
- Publication number 20050029473
- Publication date Feb 10, 2005
- Canon Kabushiki Kaisha
- Masato Muraki
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron beam monitoring sensor and electron beam monitoring method
- Publication number 20040026627
- Publication date Feb 12, 2004
- Yoshinori Nakayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM EXPOSURE METHOD, ELECTRON BEAM EXPOSURE APPARATUS AND...
- Publication number 20030189181
- Publication date Oct 9, 2003
- Hiroya Ohta
- B82 - NANO-TECHNOLOGY

Norio Saitou

Person

Patents Grantslast 30 patents

Charged particle beam exposure method and apparatus and device manu...

Electron beam monitoring sensor and electron beam monitoring method

Electron beam lithography apparatus

Electron beam exposure method, electron beam exposure apparatus and...

Electron beam lithography apparatus and pattern forming method

Method of fabricating semiconductor circuit devices utilizing multi...

Electron beam writing method and apparatus for carrying out the same

Exposure method and pattern data preparation system therefor, patte...

Electron beam writing system

Exposure method and pattern data preparation system therefor, patte...

Methods for measuring optical system, and method and apparatus for...

Charged particle beam lithography system and method therefor

Electron beam writing system used in a cell projection method

Method and apparatus of fabricating electric circuit pattern on thi...

Electron beam lithography system

Charged particle beam lithography system

Lithography apparatus

Hybrid charged particle apparatus

Electron beam exposure apparatus

Electron beam lithography apparatus

Apparatus for electron beam lithography

Exposure method with electron beam exposure apparatus

Shaping aperture for a charged particle forming system

Method and apparatus of deflection calibration for a charged partic...

Method for correcting deflection distortion in an apparatus for cha...

Patents Applicationslast 30 patents

Charged particle beam exposure method and apparatus and device manu...

Electron beam monitoring sensor and electron beam monitoring method

ELECTRON BEAM EXPOSURE METHOD, ELECTRON BEAM EXPOSURE APPARATUS AND...