Number | Date | Country | Kind |
---|---|---|---|
60-237498 | Oct 1985 | JPX |
Number | Name | Date | Kind |
---|---|---|---|
4390788 | Hayashi et al. | Jun 1983 | |
4390789 | Smith | Jun 1983 | |
4430571 | Smith | Feb 1984 | |
4433384 | Berrian et al. | Feb 1984 | |
4538232 | Koyama | Aug 1985 | |
4694178 | Harte | Sep 1987 |
Entry |
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Cleaver, et al.-"A Combined Electron and Ion beam Lithography System", Journal of Vacuum Science & Technology, vol. 3, No. 1, pp. 144-147, Jan./Feb. 1985. |
Roelofs, et al. "Feasibility of Multi-Beam Electron Lithography" Microelectronic Engineering, vol. 2, No. 4, pp. 259-279, Dec. 84. |