Olov Karlsson

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Aqua regia and hydrogen peroxide HCL combination to remove Ni and N...
- Patent number 9,399,753
- Issue date Jul 26, 2016
- Intermolecular, Inc.
- Anh Duong
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Gate structures for transistor devices for CMOS applications and pr...
- Patent number 9,362,283
- Issue date Jun 7, 2016
- GLOBALFOUNDRIES Inc.
- Zhendong Hong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for fabricating integrated circuits including fluorine inco...
- Patent number 9,196,475
- Issue date Nov 24, 2015
- GLOBALFOUNDRIES, INC.
- Bongki Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming gate structures for transistor devices for CMOS...
- Patent number 9,105,497
- Issue date Aug 11, 2015
- GLOBALFOUNDRIES Inc.
- Zhendong Hong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming an erbium silicide metal gate stack FinFET device...
- Patent number 9,059,156
- Issue date Jun 16, 2015
- Intermolecular, Inc.
- Zhendong Hong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aqua regia and hydrogen peroxide HCI combination to remove Ni and N...
- Patent number 8,946,015
- Issue date Feb 3, 2015
- Intermolecular, Inc.
- Anh Duong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process to remove Ni and Pt residues for NiPtSi application using c...
- Patent number 8,859,431
- Issue date Oct 14, 2014
- Intermolecular, Inc.
- Anh Duong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Circular transmission line methods compatible with combinatorial pr...
- Patent number 8,854,067
- Issue date Oct 7, 2014
- Intermolecular, Inc.
- Amol Joshi
- G01 - MEASURING TESTING
Information Patent Grant
High dose ion-implanted photoresist removal using organic solvent a...
- Patent number 8,853,081
- Issue date Oct 7, 2014
- Intermolecular, Inc.
- Anh Duong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aqua regia and hydrogen peroxide HCl combination to remove Ni and N...
- Patent number 8,809,140
- Issue date Aug 19, 2014
- Intermolecular, Inc.
- Anh Duong
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Method for cleaning platinum residues on a semiconductor substrate
- Patent number 8,784,572
- Issue date Jul 22, 2014
- Intermolecular, Inc.
- Anh Duong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High productivity combinatorial oxide terracing and PVD/ALD metal d...
- Patent number 8,735,302
- Issue date May 27, 2014
- Intermolecular, Inc.
- Amol Joshi
- G01 - MEASURING TESTING
Information Patent Grant
Process to remove Ni and Pt residues for NiPtSi applications using...
- Patent number 8,697,573
- Issue date Apr 15, 2014
- Intermolecular, Inc.
- Anh Duong
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Aqua regia and hydrogen peroxide HCl combination to remove Ni and N...
- Patent number 8,518,765
- Issue date Aug 27, 2013
- Intermolecular, Inc.
- Anh Duong
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Process to remove Ni and Pt residues for NiPtSi applications
- Patent number 8,513,117
- Issue date Aug 20, 2013
- Intermolecular, Inc.
- Anh Duong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process to remove Ni and Pt residues for NiPtSi applications using...
- Patent number 8,466,058
- Issue date Jun 18, 2013
- Intermolecular, Inc.
- Anh Duong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming an electronic device including forming a charge s...
- Patent number 8,409,952
- Issue date Apr 2, 2013
- Spansion LLC
- Suketu Arun Parikh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shallow trench isolation (STI) region with high-K liner and method...
- Patent number 6,984,569
- Issue date Jan 10, 2006
- Advanced Micro Devices, Inc.
- Olov B. Karlsson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with silicide source/drain and high-K dielectric
- Patent number 6,894,355
- Issue date May 17, 2005
- Advanced Micro Devices, Inc.
- Bin Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced silicidation of polysilicon gate electrodes
- Patent number 6,867,130
- Issue date Mar 15, 2005
- Advanced Micro Devices, Inc.
- Olov B. Karlsson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-K dielectric having barrier layer for P-doped devices and meth...
- Patent number 6,660,578
- Issue date Dec 9, 2003
- Advanced Micro Devices, Inc.
- Olov Karlsson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and fabrication technique using a high-K liner...
- Patent number 6,657,267
- Issue date Dec 2, 2003
- Advanced Micro Devices, Inc.
- Qi Xiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shallow trench isolation (STI) region with high-K liner and method...
- Patent number 6,657,276
- Issue date Dec 2, 2003
- Advanced Micro Devices, Inc.
- Olov B. Karlsson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shallow trench isolation formation with ion implantation
- Patent number 6,599,810
- Issue date Jul 29, 2003
- Advanced Micro Devices, Inc.
- Nick Kepler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
MOSFETs with differing gate dielectrics and method of formation
- Patent number 6,528,858
- Issue date Mar 4, 2003
- Advanced Micro Devices, Inc.
- Bin Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having uniform spacers
- Patent number 6,380,588
- Issue date Apr 30, 2002
- Advanced Micro Devices, Inc.
- William G. En
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shallow trench isolation formation with two source/drain masks and...
- Patent number 6,380,047
- Issue date Apr 30, 2002
- Advanced Micro Devices, Inc.
- Basab Bandyopadhyay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabrication of a gate structures having a longer length toward the...
- Patent number 6,306,710
- Issue date Oct 23, 2001
- Advanced Micro Devices, Inc.
- Wei Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stepper alignment mark structure for maintaining alignment integrity
- Patent number 6,239,031
- Issue date May 29, 2001
- Advanced Micro Devices, Inc.
- Nick Kepler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Shallow trench isolation formation without planarization mask
- Patent number 6,171,962
- Issue date Jan 9, 2001
- Advanced Micro Devices, Inc.
- Olov Karlsson
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Tantalum carbide metal gate stack for mid-gap work function applica...
- Publication number 20160093711
- Publication date Mar 31, 2016
- INTERMOLECULAR INC.
- Zhendong Hong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING GATE STRUCTURES FOR TRANSISTOR DEVICES FOR CMOS...
- Publication number 20150311206
- Publication date Oct 29, 2015
- GLOBAL FOUNDRIES Inc.
- Zhendong Hong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FABRICATING INTEGRATED CIRCUITS INCLUDING FLUORINE INCO...
- Publication number 20150303057
- Publication date Oct 22, 2015
- GLOBALFOUNDRIES, Inc.
- Bongki Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Aqua Regia and Hydrogen Peroxide HCl Combination to Remove Ni and N...
- Publication number 20150105308
- Publication date Apr 16, 2015
- INTERMOLECULAR INC.
- Anh Duong
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
CONTINUOUS TUNING OF ERBIUM SILICIDE METAL GATE EFFECTIVE WORK FUNC...
- Publication number 20150091105
- Publication date Apr 2, 2015
- INTERMOLECULAR INC.
- Zhendong Hong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING GATE STRUCTURES FOR TRANSISTOR DEVICES FOR CMOS...
- Publication number 20150061027
- Publication date Mar 5, 2015
- GLOBALFOUNDRIES INC.
- Zhendong Hong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Aqua Regia and Hydrogen Peroxide HCl Combination to Remove Ni and N...
- Publication number 20140363944
- Publication date Dec 11, 2014
- Anh Duong
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
Methods of Plasma Surface Treatment in a PVD Chamber
- Publication number 20140262749
- Publication date Sep 18, 2014
- Intermolecular, Inc.
- Ashish Bodke
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
High Dose Ion-Implanted Photoresist Removal Using Organic Solvent a...
- Publication number 20140187041
- Publication date Jul 3, 2014
- INTERMOLECULAR INC.
- Anh Duong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CIRCULAR TRANSMISSION LINE METHODS COMPATIBLE WITH COMBINATORIAL PR...
- Publication number 20140055152
- Publication date Feb 27, 2014
- GLOBALFOUNDRIES, INC.
- Amol Joshi
- G01 - MEASURING TESTING
Information Patent Application
Aqua Regia and Hydrogen Peroxide HCl Combination to Remove Ni and N...
- Publication number 20130323890
- Publication date Dec 5, 2013
- GLOBALFOUNDRIES, INC.
- Anh Duong
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
HIGH PRODUCTIVITY COMBINATORIAL OXIDE TERRACING AND PVD/ALD METAL D...
- Publication number 20130316472
- Publication date Nov 28, 2013
- Intermolecular, Inc.
- Amol Joshi
- G01 - MEASURING TESTING
Information Patent Application
Process to remove Ni and Pt residues for NiPtSi application using C...
- Publication number 20130267091
- Publication date Oct 10, 2013
- Anh Duong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CLEANING PLATINUM RESIDUES ON A SEMICONDUCTOR SUBSTRATE
- Publication number 20130125923
- Publication date May 23, 2013
- INTERMOLECULAR INC.
- Anh Duong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS TO REMOVE Ni AND Pt RESIDUES FOR NiPtSi APPLICATIONS
- Publication number 20130122671
- Publication date May 16, 2013
- GLOBALFOUNDRIES
- Anh Duong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS TO REMOVE Ni AND Pt RESIDUES FOR NiPtSi APPLICATIONS USING...
- Publication number 20130122670
- Publication date May 16, 2013
- Intermolecular, Inc.
- Anh Duong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS TO REMOVE Ni AND Pt RESIDUES FOR NiPtSi APPLICATIONS USING...
- Publication number 20130115741
- Publication date May 9, 2013
- Intermolecular, Inc.
- Anh Duong
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
Method for Cleaning Platinum Residues on a Semiconductor Substrate
- Publication number 20130098393
- Publication date Apr 25, 2013
- Intermolecular, Inc.
- Anh Duong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING AN ELECTRONIC DEVICE INCLUDING FORMING A CHARGE S...
- Publication number 20090256242
- Publication date Oct 15, 2009
- SPANSION LLC
- Suketu Arun Parikh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Shallow trench isolation (STI) region with high-K liner and method...
- Publication number 20050073022
- Publication date Apr 7, 2005
- Olov B. Karlsson
- H01 - BASIC ELECTRIC ELEMENTS

Olov Karlsson

Person

Patents Grantslast 30 patents

Aqua regia and hydrogen peroxide HCL combination to remove Ni and N...

Gate structures for transistor devices for CMOS applications and pr...

Methods for fabricating integrated circuits including fluorine inco...

Methods of forming gate structures for transistor devices for CMOS...

Method of forming an erbium silicide metal gate stack FinFET device...

Aqua regia and hydrogen peroxide HCI combination to remove Ni and N...

Process to remove Ni and Pt residues for NiPtSi application using c...

Circular transmission line methods compatible with combinatorial pr...

High dose ion-implanted photoresist removal using organic solvent a...

Aqua regia and hydrogen peroxide HCl combination to remove Ni and N...

Method for cleaning platinum residues on a semiconductor substrate

High productivity combinatorial oxide terracing and PVD/ALD metal d...

Process to remove Ni and Pt residues for NiPtSi applications using...

Aqua regia and hydrogen peroxide HCl combination to remove Ni and N...

Process to remove Ni and Pt residues for NiPtSi applications

Process to remove Ni and Pt residues for NiPtSi applications using...

Method of forming an electronic device including forming a charge s...

Shallow trench isolation (STI) region with high-K liner and method...

Semiconductor device with silicide source/drain and high-K dielectric

Enhanced silicidation of polysilicon gate electrodes

High-K dielectric having barrier layer for P-doped devices and meth...

Semiconductor device and fabrication technique using a high-K liner...

Shallow trench isolation (STI) region with high-K liner and method...

Shallow trench isolation formation with ion implantation

MOSFETs with differing gate dielectrics and method of formation

Semiconductor device having uniform spacers

Shallow trench isolation formation with two source/drain masks and...

Fabrication of a gate structures having a longer length toward the...

Stepper alignment mark structure for maintaining alignment integrity

Shallow trench isolation formation without planarization mask

Patents Applicationslast 30 patents

Tantalum carbide metal gate stack for mid-gap work function applica...

METHODS OF FORMING GATE STRUCTURES FOR TRANSISTOR DEVICES FOR CMOS...

METHODS FOR FABRICATING INTEGRATED CIRCUITS INCLUDING FLUORINE INCO...

Aqua Regia and Hydrogen Peroxide HCl Combination to Remove Ni and N...

CONTINUOUS TUNING OF ERBIUM SILICIDE METAL GATE EFFECTIVE WORK FUNC...

METHODS OF FORMING GATE STRUCTURES FOR TRANSISTOR DEVICES FOR CMOS...

Aqua Regia and Hydrogen Peroxide HCl Combination to Remove Ni and N...

Methods of Plasma Surface Treatment in a PVD Chamber

High Dose Ion-Implanted Photoresist Removal Using Organic Solvent a...

CIRCULAR TRANSMISSION LINE METHODS COMPATIBLE WITH COMBINATORIAL PR...

Aqua Regia and Hydrogen Peroxide HCl Combination to Remove Ni and N...

HIGH PRODUCTIVITY COMBINATORIAL OXIDE TERRACING AND PVD/ALD METAL D...

Process to remove Ni and Pt residues for NiPtSi application using C...

METHOD FOR CLEANING PLATINUM RESIDUES ON A SEMICONDUCTOR SUBSTRATE

PROCESS TO REMOVE Ni AND Pt RESIDUES FOR NiPtSi APPLICATIONS

PROCESS TO REMOVE Ni AND Pt RESIDUES FOR NiPtSi APPLICATIONS USING...

PROCESS TO REMOVE Ni AND Pt RESIDUES FOR NiPtSi APPLICATIONS USING...

Method for Cleaning Platinum Residues on a Semiconductor Substrate

METHOD OF FORMING AN ELECTRONIC DEVICE INCLUDING FORMING A CHARGE S...

Shallow trench isolation (STI) region with high-K liner and method...