Omid Zandi

Person

Austin, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
Processing systems and platforms for roughness reduction of materia...
- Patent number 12,112,959
- Issue date Oct 8, 2024
- Tokyo Electron Limited
- Omid Zandi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for area-selective deposition of polymer films using sequen...
- Patent number 11,691,175
- Issue date Jul 4, 2023
- Tokyo Electron Limited
- Omid Zandi
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Roughness reduction methods for materials using illuminated etch so...
- Patent number 10,896,824
- Issue date Jan 19, 2021
- Tokyo Electron Limited
- Omid Zandi
- B24 - GRINDING POLISHING
Information Patent Grant
Photonically tuned etchant reactivity for wet etching
- Patent number 10,867,815
- Issue date Dec 15, 2020
- Tokyo Electron Limited
- Paul Abel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photo-assisted chemical vapor etch for selective removal of ruthenium
- Patent number 10,818,512
- Issue date Oct 27, 2020
- Tokyo Electron Limited
- Omid Zandi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Methods For Stabilization Of Self-Assembled Monolayers (SAMs) Using...
- Publication number 20240017290
- Publication date Jan 18, 2024
- TOKYO ELECTRON LIMITED
- Omid Zandi
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
Methods For Selective Removal Of Surface Oxides On Metal Films
- Publication number 20230402276
- Publication date Dec 14, 2023
- TOKYO ELECTRON LIMITED
- Omid Zandi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REMOVAL OF STRAY RUTHENIUM METAL NUCLEI FOR SELECTIVE RUTHENIUM MET...
- Publication number 20220254683
- Publication date Aug 11, 2022
- TOKYO ELECTRON LIMITED
- Omid Zandi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FILLING RECESSED FEATURES IN SEMICONDUCTOR DEVICES WITH...
- Publication number 20220139776
- Publication date May 5, 2022
- TOKYO ELECTRON LIMITED
- Kai-Hung Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR USING ULTRA-THIN ETCH STOP LAYERS IN SELECTIVE ATOMIC LA...
- Publication number 20210242031
- Publication date Aug 5, 2021
- TOKYO ELECTRON LIMITED
- Omid Zandi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTO-ASSISTED CHEMICAL VAPOR ETCH FOR SELECTIVE REMOVAL OF RUTHENIUM
- Publication number 20200243346
- Publication date Jul 30, 2020
- TOKYO ELECTRON LIMITED
- Omid Zandi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ROUGHNESS REDUCTION METHODS FOR MATERIALS USING ILLUMINATED ETCH SO...
- Publication number 20200194278
- Publication date Jun 18, 2020
- TOKYO ELECTRON LIMITED
- Omid Zandi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SYSTEMS AND PLATFORMS FOR ROUGHNESS REDUCTION OF MATERIA...
- Publication number 20200075351
- Publication date Mar 5, 2020
- TOKYO ELECTRON LIMITED
- Omid Zandi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTONICALLY TUNED ETCHANT REACTIVITY FOR WET ETCHING
- Publication number 20200075358
- Publication date Mar 5, 2020
- TOKYO ELECTRON LIMITED
- Paul ABEL
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Processing systems and platforms for roughness reduction of materia...

Methods for area-selective deposition of polymer films using sequen...

Roughness reduction methods for materials using illuminated etch so...

Photonically tuned etchant reactivity for wet etching

Photo-assisted chemical vapor etch for selective removal of ruthenium

Patents Applicationslast 30 patents

Methods For Stabilization Of Self-Assembled Monolayers (SAMs) Using...

Methods For Selective Removal Of Surface Oxides On Metal Films

REMOVAL OF STRAY RUTHENIUM METAL NUCLEI FOR SELECTIVE RUTHENIUM MET...

METHOD FOR FILLING RECESSED FEATURES IN SEMICONDUCTOR DEVICES WITH...

METHOD FOR USING ULTRA-THIN ETCH STOP LAYERS IN SELECTIVE ATOMIC LA...

PHOTO-ASSISTED CHEMICAL VAPOR ETCH FOR SELECTIVE REMOVAL OF RUTHENIUM

ROUGHNESS REDUCTION METHODS FOR MATERIALS USING ILLUMINATED ETCH SO...

PROCESSING SYSTEMS AND PLATFORMS FOR ROUGHNESS REDUCTION OF MATERIA...

PHOTONICALLY TUNED ETCHANT REACTIVITY FOR WET ETCHING