Osamu Takaoka

Person

Chiba, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photomask defect correcting method and device
- Patent number 8,815,474
- Issue date Aug 26, 2014
- Hitachi High-Tech Science Corporation
- Osamu Takaoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask defect correcting method and device
- Patent number 8,257,887
- Issue date Sep 4, 2012
- SII NanoTechnology Inc.
- Osamu Takaoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Micro-machining dust removing device, micro-machining apparatus, an...
- Patent number 8,062,494
- Issue date Nov 22, 2011
- National University Corporation Shizuoka University
- Futoshi Iwata
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for fabricating EUVL mask
- Patent number 7,927,769
- Issue date Apr 19, 2011
- SII NanoTechnology Inc.
- Ryoji Hagiwara
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of observing and method of working diamond stylus for workin...
- Patent number 7,804,067
- Issue date Sep 28, 2010
- SII NanoTechnology Inc.
- Osamu Takaoka
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of correcting opaque defect of photomask using atomic force...
- Patent number 7,571,639
- Issue date Aug 11, 2009
- SII NanoTechnology Inc.
- Toshio Doi
- G01 - MEASURING TESTING
Information Patent Grant
Working method using scanning probe
- Patent number 7,442,925
- Issue date Oct 28, 2008
- SII NanoTechnology Inc.
- Masatoshi Yasutake
- G01 - MEASURING TESTING
Information Patent Grant
Processing probe
- Patent number 7,378,654
- Issue date May 27, 2008
- SII NanoTechnology Inc.
- Shigeru Wakiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask defect correction method employing a combined device of a...
- Patent number 7,375,352
- Issue date May 20, 2008
- SII NanoTechnology Inc.
- Osamu Takaoka
- G01 - MEASURING TESTING
Information Patent Grant
Ion beam processing method
- Patent number 7,323,685
- Issue date Jan 29, 2008
- SII Nano Technology Inc.
- Kazuo Aita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scratch repairing processing method and scanning probe microscope (...
- Patent number 7,285,792
- Issue date Oct 23, 2007
- SII NanoTechnology Inc.
- Naoya Watanabe
- G01 - MEASURING TESTING
Information Patent Grant
Method of processing vertical cross-section using atomic force micr...
- Patent number 7,278,299
- Issue date Oct 9, 2007
- SII NanoTechnology Inc.
- Osamu Takaoka
- G01 - MEASURING TESTING
Information Patent Grant
Processing method using probe of scanning probe microscope
- Patent number 7,259,372
- Issue date Aug 21, 2007
- SII NanoTechnology Inc.
- Osamu Takaoka
- G01 - MEASURING TESTING
Information Patent Grant
Method of removing particle of photomask using atomic force microscope
- Patent number 7,232,995
- Issue date Jun 19, 2007
- SII NanoTechnology Inc.
- Osamu Takaoka
- G01 - MEASURING TESTING
Information Patent Grant
Method of correcting amplitude defect in multilayer film of EUVL mask
- Patent number 7,189,655
- Issue date Mar 13, 2007
- Sii Nano Technology Inc.
- Osamu Takaoka
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Scanning probe device and processing method by scanning probe
- Patent number 7,107,826
- Issue date Sep 19, 2006
- SII NanoTechnology Inc.
- Naoya Watanabe
- G01 - MEASURING TESTING
Information Patent Grant
Electron beam processing method
- Patent number 7,018,683
- Issue date Mar 28, 2006
- SII NanoTechnology Inc.
- Osamu Takaoka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mask defect repair method
- Patent number 6,703,626
- Issue date Mar 9, 2004
- Seiko Instruments Inc.
- Osamu Takaoka
- G01 - MEASURING TESTING
Information Patent Grant
Black defect correction method and black defect correction device f...
- Patent number 6,544,692
- Issue date Apr 8, 2003
- Seiko Instruments Inc.
- Osamu Takaoka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photomask correction device
- Patent number 6,467,426
- Issue date Oct 22, 2002
- Seiko Instruments Inc.
- Osamu Takaoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Objective lens for scanning electron microscope
- Patent number 6,335,530
- Issue date Jan 1, 2002
- Seiko Instruments Inc.
- Osamu Takaoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam device
- Patent number 6,037,589
- Issue date Mar 14, 2000
- Seiko Instruments Inc.
- Akira Yonezawa
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PHOTOMASK DEFECT CORRECTING METHOD AND DEVICE
- Publication number 20120328974
- Publication date Dec 27, 2012
- Osamu TAKAOKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK DEFECT CORRECTING METHOD AND DEVICE
- Publication number 20100178601
- Publication date Jul 15, 2010
- Osamu Takaoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for fabricating EUVL mask
- Publication number 20090226825
- Publication date Sep 10, 2009
- Ryoji Hagiwara
- B82 - NANO-TECHNOLOGY
Information Patent Application
PHOTOMASK DEFECT CORRECTION DEVICE AND PHOTOMASK DEFECT CORRECTION...
- Publication number 20090092905
- Publication date Apr 9, 2009
- Takuya Nakaue
- G01 - MEASURING TESTING
Information Patent Application
PHOTOMASK DEFECT CORRECTION DEVICE AND PHOTOMASK DEFECT CORRECTION...
- Publication number 20090038383
- Publication date Feb 12, 2009
- Takuya Nakaue
- G01 - MEASURING TESTING
Information Patent Application
PHOTOMASK DEFECT-SHAPE RECOGNITION APPARATUS, PHOTOMASK DEFECT-SHAP...
- Publication number 20090028420
- Publication date Jan 29, 2009
- Takuya Nakaue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MOLD INSPECTING METHOD AND RESIN RESIDUE REMOVING METHOD OF NANOIMP...
- Publication number 20080191372
- Publication date Aug 14, 2008
- Osamu Takaoka
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
METHOD OF OBSERVING AND METHOD OF WORKING DIAMOND STYLUS FOR WORKIN...
- Publication number 20080141764
- Publication date Jun 19, 2008
- Osamu Takaoka
- G01 - MEASURING TESTING
Information Patent Application
Method of Correcting Photomask Defect
- Publication number 20080131792
- Publication date Jun 5, 2008
- Osamu Takaoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Micro-machining dust removing device, micro-machining apparatus, an...
- Publication number 20080132151
- Publication date Jun 5, 2008
- National University Corporation Shizuoka University
- Futoshi Iwata
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method of Correcting Photomask Defect
- Publication number 20080107975
- Publication date May 8, 2008
- Osamu Takaoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of correcting opaque defect of chrome mask, in which atomic...
- Publication number 20080073522
- Publication date Mar 27, 2008
- Osamu Takaoka
- G01 - MEASURING TESTING
Information Patent Application
Method of correcting opaque defect of photomask using atomic force...
- Publication number 20070281222
- Publication date Dec 6, 2007
- Toshio Doi
- G01 - MEASURING TESTING
Information Patent Application
Processing method using atomic force microscope microfabrication de...
- Publication number 20070278177
- Publication date Dec 6, 2007
- Kazushige Kondo
- G01 - MEASURING TESTING
Information Patent Application
Scanning probe device and processing method by scanning probe
- Publication number 20060254347
- Publication date Nov 16, 2006
- Naoya Watanabe
- G01 - MEASURING TESTING
Information Patent Application
Scanning probe device and processing method of scanning probe
- Publication number 20060254348
- Publication date Nov 16, 2006
- Naoya Watanabe
- G01 - MEASURING TESTING
Information Patent Application
Working method using scanning probe
- Publication number 20060219901
- Publication date Oct 5, 2006
- Masatoshi Yasutake
- G01 - MEASURING TESTING
Information Patent Application
Ion beam processing method
- Publication number 20060097194
- Publication date May 11, 2006
- Kazuo Aita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of correcting amplitude defect in multilayer film of EUVL mask
- Publication number 20060040418
- Publication date Feb 23, 2006
- Osamu Takaoka
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method of removing particle of photomask using atomic force microscope
- Publication number 20060022134
- Publication date Feb 2, 2006
- Osamu Takaoka
- G01 - MEASURING TESTING
Information Patent Application
Photomask defect correction method employing a combined device of a...
- Publication number 20050285033
- Publication date Dec 29, 2005
- Osamu Takaoka
- G01 - MEASURING TESTING
Information Patent Application
Electron beam processing method
- Publication number 20050276932
- Publication date Dec 15, 2005
- Osamu Takaoka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Processing method using probe of scanning probe microscope
- Publication number 20050263700
- Publication date Dec 1, 2005
- Osamu Takaoka
- G01 - MEASURING TESTING
Information Patent Application
Method of processing vertical cross-section using atomic force micr...
- Publication number 20050262685
- Publication date Dec 1, 2005
- Osamu Takaoka
- G01 - MEASURING TESTING
Information Patent Application
Scanning probe device and processing method by scanning probe
- Publication number 20050223785
- Publication date Oct 13, 2005
- Naoya Watanabe
- G01 - MEASURING TESTING
Information Patent Application
Scratch repairing processing method and scanning probe microscope (...
- Publication number 20050205805
- Publication date Sep 22, 2005
- Naoya Watanabe
- G01 - MEASURING TESTING
Information Patent Application
Processing probe
- Publication number 20050199809
- Publication date Sep 15, 2005
- Shigeru Wakiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Defect correction method for a photomask
- Publication number 20040209172
- Publication date Oct 21, 2004
- Osamu Takaoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and system for surface or cross-sectional processing and obs...
- Publication number 20040154744
- Publication date Aug 12, 2004
- Takashi Kaito
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Mask defect repair method
- Publication number 20020096635
- Publication date Jul 25, 2002
- Osamu Takaoka
- B82 - NANO-TECHNOLOGY

Osamu Takaoka

Person

Patents Grantslast 30 patents

Photomask defect correcting method and device

Photomask defect correcting method and device

Micro-machining dust removing device, micro-machining apparatus, an...

Method for fabricating EUVL mask

Method of observing and method of working diamond stylus for workin...

Method of correcting opaque defect of photomask using atomic force...

Working method using scanning probe

Processing probe

Photomask defect correction method employing a combined device of a...

Ion beam processing method

Scratch repairing processing method and scanning probe microscope (...

Method of processing vertical cross-section using atomic force micr...

Processing method using probe of scanning probe microscope

Method of removing particle of photomask using atomic force microscope

Method of correcting amplitude defect in multilayer film of EUVL mask

Scanning probe device and processing method by scanning probe

Electron beam processing method

Mask defect repair method

Black defect correction method and black defect correction device f...

Photomask correction device

Objective lens for scanning electron microscope

Electron beam device

Patents Applicationslast 30 patents

PHOTOMASK DEFECT CORRECTING METHOD AND DEVICE

PHOTOMASK DEFECT CORRECTING METHOD AND DEVICE

Method for fabricating EUVL mask

PHOTOMASK DEFECT CORRECTION DEVICE AND PHOTOMASK DEFECT CORRECTION...

PHOTOMASK DEFECT CORRECTION DEVICE AND PHOTOMASK DEFECT CORRECTION...

PHOTOMASK DEFECT-SHAPE RECOGNITION APPARATUS, PHOTOMASK DEFECT-SHAP...

MOLD INSPECTING METHOD AND RESIN RESIDUE REMOVING METHOD OF NANOIMP...

METHOD OF OBSERVING AND METHOD OF WORKING DIAMOND STYLUS FOR WORKIN...

Method of Correcting Photomask Defect

Micro-machining dust removing device, micro-machining apparatus, an...

Method of Correcting Photomask Defect

Method of correcting opaque defect of chrome mask, in which atomic...

Method of correcting opaque defect of photomask using atomic force...

Processing method using atomic force microscope microfabrication de...

Scanning probe device and processing method by scanning probe

Scanning probe device and processing method of scanning probe

Working method using scanning probe

Ion beam processing method

Method of correcting amplitude defect in multilayer film of EUVL mask

Method of removing particle of photomask using atomic force microscope

Photomask defect correction method employing a combined device of a...

Electron beam processing method

Processing method using probe of scanning probe microscope

Method of processing vertical cross-section using atomic force micr...

Scanning probe device and processing method by scanning probe

Scratch repairing processing method and scanning probe microscope (...

Processing probe

Defect correction method for a photomask

Method and system for surface or cross-sectional processing and obs...

Mask defect repair method