Patrick Lawrence Morse

Person

Tucson, AZ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Systems and methods for casting sputtering targets
- Patent number 12,134,125
- Issue date Nov 5, 2024
- Junora LTD
- Dean Plaisted
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Thermally controlled magnetic fields optimization system for sputte...
- Patent number 11,908,669
- Issue date Feb 20, 2024
- Arizona Thin Film Research, LLC
- Patrick Morse
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for additive manufacturing for the deposition o...
- Patent number 11,603,589
- Issue date Mar 14, 2023
- Arizona Thin Film Research, LLC
- Patrick Morse
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetic force release for sputtering sources with magnetic target...
- Patent number 10,727,034
- Issue date Jul 28, 2020
- Sputtering Components, Inc.
- Patrick Lawrence Morse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual power feed rotary sputtering cathode
- Patent number 10,699,885
- Issue date Jun 30, 2020
- Buhler AG
- Daniel Theodore Crowley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rotary magnetron magnet bar and apparatus containing the same for h...
- Patent number 10,273,570
- Issue date Apr 30, 2019
- General Plasma, Inc.
- John E. Madocks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering apparatus
- Patent number 9,758,862
- Issue date Sep 12, 2017
- Sputtering Components, Inc.
- Patrick Lawrence Morse
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering apparatus
- Patent number 9,418,823
- Issue date Aug 16, 2016
- Sputtering Components, Inc.
- Daniel Theodore Crowley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma enhanced chemical vapor deposition (PECVD) source
- Patent number 9,406,487
- Issue date Aug 2, 2016
- Sputtering Components, Inc.
- Daniel Theodore Crowley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rotary magnetron magnet bar and apparatus containing the same for h...
- Patent number 9,388,490
- Issue date Jul 12, 2016
- General Plasma, Inc.
- John E. Madocks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma enhanced chemical vapor deposition (PECVD) source
- Patent number 9,362,093
- Issue date Jun 7, 2016
- Sputtering Components, Inc.
- Daniel Theodore Crowley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering apparatus
- Patent number 9,312,108
- Issue date Apr 12, 2016
- Sputtering Components, Inc.
- Daniel Theodore Crowley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion control for a plasma source
- Patent number 9,198,274
- Issue date Nov 24, 2015
- Sputtering Components, Inc.
- Patrick Lawrence Morse
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Rotatable magnetron sputtering with axially movable target electrod...
- Patent number 8,535,490
- Issue date Sep 17, 2013
- General Plasma, Inc.
- John Madocks
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ACTIVELY COOLED ANODE FOR SPUTTERING PROCESSES
- Publication number 20250029820
- Publication date Jan 23, 2025
- INTEVAC, INC.
- Patrick Morse
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LASER INDUCED IONIZATION OF INERT AND REACTIVE GASSES FOR MAGNETRON...
- Publication number 20240263297
- Publication date Aug 8, 2024
- Arizona Thin Film Research, LLC
- Patrick Morse
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS FOR CASTING SPUTTERING TARGETS
- Publication number 20230075617
- Publication date Mar 9, 2023
- Junora LTD
- Dean Plaisted
- B22 - CASTING POWDER METALLURGY
Information Patent Application
THERMALLY CONTROLLED MAGNETIC FIELDS OPTIMIZATION SYSTEM FOR SPUTTE...
- Publication number 20220223392
- Publication date Jul 14, 2022
- Arizona Thin Film Research, LLC
- Patrick Morse
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS FOR ADDITIVE MANUFACTURING FOR THE DEPOSITION O...
- Publication number 20210180179
- Publication date Jun 17, 2021
- Arizona Thin Film Research, LLC
- Patrick Morse
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DUAL POWER FEED ROTARY SPUTTERING CATHODE
- Publication number 20200266038
- Publication date Aug 20, 2020
- Buhler AG
- Daniel Theodore Crowley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETIC FORCE RELEASE FOR SPUTTERING SOURCES WITH MAGNETIC TARGET...
- Publication number 20190057848
- Publication date Feb 21, 2019
- SPUTTERING COMPONENTS, INC.
- Patrick Lawrence Morse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL POWER FEED ROTARY SPUTTERING CATHODE
- Publication number 20170278685
- Publication date Sep 28, 2017
- SPUTTERING COMPONENTS, INC.
- Daniel Theodore Crowley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ROTARY MAGNETRON MAGNET BAR AND APPARATUS CONTAINING THE SAME FOR H...
- Publication number 20160289820
- Publication date Oct 6, 2016
- General Plasma INc.
- JOHN E. MADOCKS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTERING APPARATUS
- Publication number 20160225591
- Publication date Aug 4, 2016
- SPUTTERING COMPONENTS, INC.
- Daniel Theodore Crowley
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ION CONTROL FOR A PLASMA SOURCE
- Publication number 20160064191
- Publication date Mar 3, 2016
- SPUTTERING COMPONENTS, INC.
- Patrick Lawrence Morse
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DECENTRALIZED PROCESS CONTROLLER
- Publication number 20150120001
- Publication date Apr 30, 2015
- SPUTTERING COMPONENTS, INC.
- John Robert German
- G05 - CONTROLLING REGULATING
Information Patent Application
SPUTTERING APPARATUS
- Publication number 20140246310
- Publication date Sep 4, 2014
- SPUTTERING COMPONENTS, INC.
- Daniel Theodore Crowley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPUTTERING APPARATUS
- Publication number 20140246312
- Publication date Sep 4, 2014
- SPUTTERING COMPONENTS, INC.
- Daniel Theodore Crowley
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD) SOURCE
- Publication number 20140184073
- Publication date Jul 3, 2014
- SPUTTERING COMPONENTS, INC.
- Daniel Theodore Crowley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPUTTERING APPARATUS
- Publication number 20140061029
- Publication date Mar 6, 2014
- SPUTTERING COMPONENTS, INC.
- Patrick Lawrence Morse
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ION CONTROL FOR A PLASMA SOURCE
- Publication number 20140007813
- Publication date Jan 9, 2014
- Patrick Lawrence Morse
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ROTARY MAGNETRON MAGNET BAR AND APPARATUS CONTAINING THE SAME FOR H...
- Publication number 20120261253
- Publication date Oct 18, 2012
- John E. Madocks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ROTATABLE MAGNETRON SPUTTERING WITH AXIALLY MOVABLE TARGET ELECTROD...
- Publication number 20100155226
- Publication date Jun 24, 2010
- John Madocks
- H01 - BASIC ELECTRIC ELEMENTS

Patrick Lawrence Morse

Person

Patents Grantslast 30 patents

Systems and methods for casting sputtering targets

Thermally controlled magnetic fields optimization system for sputte...

Systems and methods for additive manufacturing for the deposition o...

Magnetic force release for sputtering sources with magnetic target...

Dual power feed rotary sputtering cathode

Rotary magnetron magnet bar and apparatus containing the same for h...

Sputtering apparatus

Sputtering apparatus

Plasma enhanced chemical vapor deposition (PECVD) source

Rotary magnetron magnet bar and apparatus containing the same for h...

Plasma enhanced chemical vapor deposition (PECVD) source

Sputtering apparatus

Ion control for a plasma source

Rotatable magnetron sputtering with axially movable target electrod...

Patents Applicationslast 30 patents

ACTIVELY COOLED ANODE FOR SPUTTERING PROCESSES

LASER INDUCED IONIZATION OF INERT AND REACTIVE GASSES FOR MAGNETRON...

SYSTEMS AND METHODS FOR CASTING SPUTTERING TARGETS

THERMALLY CONTROLLED MAGNETIC FIELDS OPTIMIZATION SYSTEM FOR SPUTTE...

SYSTEMS AND METHODS FOR ADDITIVE MANUFACTURING FOR THE DEPOSITION O...

DUAL POWER FEED ROTARY SPUTTERING CATHODE

MAGNETIC FORCE RELEASE FOR SPUTTERING SOURCES WITH MAGNETIC TARGET...

DUAL POWER FEED ROTARY SPUTTERING CATHODE

ROTARY MAGNETRON MAGNET BAR AND APPARATUS CONTAINING THE SAME FOR H...

SPUTTERING APPARATUS

ION CONTROL FOR A PLASMA SOURCE

DECENTRALIZED PROCESS CONTROLLER

SPUTTERING APPARATUS

SPUTTERING APPARATUS

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD) SOURCE

SPUTTERING APPARATUS

ION CONTROL FOR A PLASMA SOURCE

ROTARY MAGNETRON MAGNET BAR AND APPARATUS CONTAINING THE SAME FOR H...

ROTATABLE MAGNETRON SPUTTERING WITH AXIALLY MOVABLE TARGET ELECTROD...