Patrick Martin

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Dallas, TX, US

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Patents Grantslast 30 patents

Information Patent Grant
Photomask having an internal substantially transparent etch stop layer
- Patent number 7,049,034
- Issue date May 23, 2006
- Photronics, Inc.
- Patrick M. Martin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Photomask having an internal substantially transparent etch stop layer
- Publication number 20050053847
- Publication date Mar 10, 2005
- Patrick M. Martin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask having an internal substantially transparent etch stop layer
- Publication number 20050026053
- Publication date Feb 3, 2005
- Patrick M. Martin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alternating aperture phase shift photomask having plasma etched iso...
- Publication number 20040086787
- Publication date May 6, 2004
- Nabila Lehachi Waheed
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY