Paul B. Mirkarimi

Person

Sunol, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Planarization of optical substrates
- Patent number 10,901,121
- Issue date Jan 26, 2021
- Lawrence Livermore National Security, LLC
- Christopher J. Stolz
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Planarization of optical substrates
- Patent number 10,175,391
- Issue date Jan 8, 2019
- Lawrence Livermore National Security, LLC
- Christopher Stolz
- G02 - OPTICS
Information Patent Grant
EUV lithography reticles fabricated without the use of a patterned...
- Patent number 7,049,033
- Issue date May 23, 2006
- The EUV LLC
- Daniel G. Stearns
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for the manufacture of phase shifting masks for EUV lithography
- Patent number 7,022,435
- Issue date Apr 4, 2006
- EUV Limited Liability Corporation
- Daniel G. Stearns
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method to repair localized amplitude defects in a EUV lithography m...
- Patent number 6,967,168
- Issue date Nov 22, 2005
- The EUV Limited Liability Corporation
- Daniel G. Stearns
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Repair of localized defects in multilayer-coated reticle blanks for...
- Patent number 6,821,682
- Issue date Nov 23, 2004
- The EUV LLC
- Daniel G. Stearns
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method for fabricating reticles for EUV lithography without the use...
- Patent number 6,635,391
- Issue date Oct 21, 2003
- The Regents of the University of California
- Daniel G. Stearns
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mitigation of substrate defects in reticles using multilayer buffer...
- Patent number 6,319,635
- Issue date Nov 20, 2001
- The Regents of the University of California
- Paul B. Mirkarimi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Process for fabricating high reflectance-low stress Mo—Si m...
- Patent number 6,309,705
- Issue date Oct 30, 2001
- The Regents of the University of California
- Claude Montcalm
- G02 - OPTICS
Information Patent Grant
Method to adjust multilayer film stress induced deformation of optics
- Patent number 6,134,049
- Issue date Oct 17, 2000
- The Regents of the University of California
- Eberhard A. Spiller
- G02 - OPTICS
Information Patent Grant
High reflectance-low stress Mo-Si multilayer reflective coatings
- Patent number 6,110,607
- Issue date Aug 29, 2000
- The Regents of the University of California
- Claude Montcalm
- G02 - OPTICS
Information Patent Grant
Method to adjust multilayer film stress induced deformation of optics
- Patent number 6,011,646
- Issue date Jan 4, 2000
- The Regents of the Unviersity of California
- Paul B. Mirkarimi
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
PLANARIZATION OF OPTICAL SUBSTRATES
- Publication number 20190162879
- Publication date May 30, 2019
- LAWRENCE LIVERMORE NATIONAL SECURITY, LLC
- Christopher J. Stolz
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLANARIZATION OF OPTICAL SUBSTRATES
- Publication number 20150276993
- Publication date Oct 1, 2015
- Christopher J. Stolz
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for repairing mask-blank defects using repair-zone compensation
- Publication number 20060234135
- Publication date Oct 19, 2006
- The Regents of the University of CA
- Stefan P. Hau-Riege
- B82 - NANO-TECHNOLOGY
Information Patent Application
Planarization of substrate pits and scratches
- Publication number 20050118533
- Publication date Jun 2, 2005
- Paul B. Mirkarimi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EUV lithography reticles fabricated without the use of a patterned...
- Publication number 20040142250
- Publication date Jul 22, 2004
- The Regents of the University of California.
- Daniel G. Stearns
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method for the manufacture of phase shifting masks for EUV lithography
- Publication number 20040062999
- Publication date Apr 1, 2004
- The Regents of the University of California.
- Daniel G. Stearns
- B82 - NANO-TECHNOLOGY
Information Patent Application
Ion-assisted deposition techniques for the planarization of topolog...
- Publication number 20030164998
- Publication date Sep 4, 2003
- The Regents of the University of California.
- Paul B. Mirkarimi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method to repair localized amplitude defects in a EUV lithography m...
- Publication number 20030006214
- Publication date Jan 9, 2003
- The Regents of the University of California.
- Daniel G. Stearns
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method for fabricating reticles for EUV lithography without the use...
- Publication number 20020122989
- Publication date Sep 5, 2002
- Daniel G. Stearns
- B82 - NANO-TECHNOLOGY

Paul B. Mirkarimi

Person

Patents Grantslast 30 patents

Planarization of optical substrates

Planarization of optical substrates

EUV lithography reticles fabricated without the use of a patterned...

Method for the manufacture of phase shifting masks for EUV lithography

Method to repair localized amplitude defects in a EUV lithography m...

Repair of localized defects in multilayer-coated reticle blanks for...

Method for fabricating reticles for EUV lithography without the use...

Mitigation of substrate defects in reticles using multilayer buffer...

Process for fabricating high reflectance-low stress Mo&#x02014;Si m...

Method to adjust multilayer film stress induced deformation of optics

High reflectance-low stress Mo-Si multilayer reflective coatings

Method to adjust multilayer film stress induced deformation of optics

Patents Applicationslast 30 patents

PLANARIZATION OF OPTICAL SUBSTRATES

PLANARIZATION OF OPTICAL SUBSTRATES

Method for repairing mask-blank defects using repair-zone compensation

Planarization of substrate pits and scratches

EUV lithography reticles fabricated without the use of a patterned...

Method for the manufacture of phase shifting masks for EUV lithography

Ion-assisted deposition techniques for the planarization of topolog...

Method to repair localized amplitude defects in a EUV lithography m...

Method for fabricating reticles for EUV lithography without the use...

Process for fabricating high reflectance-low stress Mo—Si m...