Paul E. Luscher

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Double slit-valve doors for plasma processing
- Patent number 7,147,719
- Issue date Dec 12, 2006
- Applied Materials, Inc.
- Michael D. Welch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature controlled window with a fluid supply system
- Patent number 6,916,399
- Issue date Jul 12, 2005
- Yan Rozenzon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Configurable single substrate wet-dry integrated cluster cleaner
- Patent number 6,899,111
- Issue date May 31, 2005
- Applied Materials, Inc.
- Paul E. Luscher
- B08 - CLEANING
Information Patent Grant
Magnetic barrier for plasma in chamber exhaust
- Patent number 6,863,835
- Issue date Mar 8, 2005
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Temperature controlled dome-coil system for high power inductively...
- Patent number 6,822,185
- Issue date Nov 23, 2004
- Applied Materials, Inc.
- Michael Welch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Endpoint detection in substrate fabrication processes
- Patent number 6,813,534
- Issue date Nov 2, 2004
- Zhifeng Sui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric etch chamber with expanded process window
- Patent number 6,797,639
- Issue date Sep 28, 2004
- Applied Materials Inc.
- James D Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetic barrier for plasma in chamber exhaust
- Patent number 6,773,544
- Issue date Aug 10, 2004
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dielectric etch chamber with expanded process window
- Patent number 6,716,302
- Issue date Apr 6, 2004
- Applied Materials Inc.
- James D Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Double slit-valve doors for plasma processing
- Patent number 6,647,918
- Issue date Nov 18, 2003
- Applied Materials, Inc.
- Michael D. Welch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Configurable single substrate wet-dry integrated cluster cleaner
- Patent number 6,589,361
- Issue date Jul 8, 2003
- Applied Materials Inc.
- Paul E Luscher
- B08 - CLEANING
Information Patent Grant
Correction of wafer temperature drift in a plasma reactor based upo...
- Patent number 6,575,622
- Issue date Jun 10, 2003
- Applied Materials Inc.
- Hamid Norrbakhsh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for endpoint control and plasma monitoring
- Patent number 6,535,779
- Issue date Mar 18, 2003
- Applied Materials, Inc.
- Manush Birang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjusting DC bias voltage in plasma chamber
- Patent number 6,513,452
- Issue date Feb 4, 2003
- Applied Materials Inc.
- Hongching Shan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for measuring pedestal and substrate temperature in a sem...
- Patent number 6,481,886
- Issue date Nov 19, 2002
- Applied Materials Inc.
- Kadthala R. Narendrnath
- G01 - MEASURING TESTING
Information Patent Grant
Plasma reactor cooled ceiling with an array of thermally isolated p...
- Patent number 6,432,259
- Issue date Aug 13, 2002
- Applied Materials, Inc.
- Hamid Noorbakhsh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Correction of wafer temperature drift in a plasma reactor based upo...
- Patent number 6,353,210
- Issue date Mar 5, 2002
- Applied Materials Inc.
- Hamid Norrbakhsh
- C30 - CRYSTAL GROWTH
Information Patent Grant
Apparatus and method for controlling plasma uniformity in a semicon...
- Patent number 6,232,236
- Issue date May 15, 2001
- Applied Materials, Inc.
- Hongqing Shan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjusting DC bias voltage in plasma chamber
- Patent number 6,221,782
- Issue date Apr 24, 2001
- Applied Materials, Inc.
- Hongching Shan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Double slit-valve doors for plasma processing
- Patent number 6,192,827
- Issue date Feb 27, 2001
- Applied Materials, Inc.
- Michael D. Welch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin film processing plasma reactor chamber with radially upward sl...
- Patent number 6,076,482
- Issue date Jun 20, 2000
- Applied Materials, Inc.
- Ji Ding
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bandpass photon detector
- Patent number 5,995,235
- Issue date Nov 30, 1999
- Applied Materials, Inc.
- Zhifeng Sui
- G02 - OPTICS
Information Patent Grant
Adjusting DC bias voltage in plasma chambers
- Patent number 5,891,350
- Issue date Apr 6, 1999
- Applied Materials, Inc.
- Hong Ching Shan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for actively controlling the DC potential of a...
- Patent number 5,737,177
- Issue date Apr 7, 1998
- Applied Materials, Inc.
- Richard Raymond Mett
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
MBE effusion source with asymmetrical heaters
- Patent number 5,253,266
- Issue date Oct 12, 1993
- Intevac, Inc.
- Walter S. Knodle
- C30 - CRYSTAL GROWTH
Information Patent Grant
Molecular beam converters for vacuum coating systems
- Patent number 4,392,453
- Issue date Jul 12, 1983
- Varian Associates, Inc.
- Paul E. Luscher
- C30 - CRYSTAL GROWTH
Information Patent Grant
Transfer and temperature monitoring apparatus
- Patent number 4,201,152
- Issue date May 6, 1980
- Varian Associates, Inc.
- Paul E. Luscher
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
TEMPERATURE CONTROLLED SEMICONDUCTOR PROCESSING CHAMBER LINER
- Publication number 20070091535
- Publication date Apr 26, 2007
- APPLIED MATERIALS, INC.
- Hamid Noorbakhsh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Dielectric etch chamber with expanded process window
- Publication number 20050003675
- Publication date Jan 6, 2005
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Double slit-valve doors for plasma processing
- Publication number 20040083978
- Publication date May 6, 2004
- APPLIED MATERIALS, INC.
- Michael D. Welch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Temperature controlled dome-coil system for high power inductively...
- Publication number 20040065645
- Publication date Apr 8, 2004
- Applied Materials, Inc.
- Michael Welch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dielectric etch chamber with expanded process window
- Publication number 20030037880
- Publication date Feb 27, 2003
- APPLIED MATERIALS, INC.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dielectric etch chamber with expanded process window
- Publication number 20030038111
- Publication date Feb 27, 2003
- APPLIED MATERIALS, INC.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Configurable single substrate wet-dry integrated cluster cleaner
- Publication number 20020189638
- Publication date Dec 19, 2002
- Paul E. Luscher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Endpoint detection in substrate fabrication processes
- Publication number 20020183977
- Publication date Dec 5, 2002
- APPLIED MATERIALS, INC.
- Zhifeng Sui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Temperature controlled semiconductor processing chamber liner
- Publication number 20020069970
- Publication date Jun 13, 2002
- APPLIED MATERIALS, INC.
- Hamid Noorbakhsh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Configurable single substrate wet-dry integrated cluster cleaner
- Publication number 20020062848
- Publication date May 30, 2002
- Paul E. Luscher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Correction of wafer temperature drift in a plasma reactor based upo...
- Publication number 20020048311
- Publication date Apr 25, 2002
- APPLIED MATERIALS, INC.
- Hamid Norrbakhsh
- C30 - CRYSTAL GROWTH
Information Patent Application
Magnetic barrier for plasma in chamber exhaust
- Publication number 20010032590
- Publication date Oct 25, 2001
- APPLIED MATERIALS, INC.
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Magnetic barrier for plasma in chamber exhaust
- Publication number 20010032591
- Publication date Oct 25, 2001
- APPLIED MATERIALS, INC.
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Adjusting DC bias voltage in plasma chamber
- Publication number 20010014540
- Publication date Aug 16, 2001
- APPLIED MATERIALS, INC.
- Hongching Shan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and method for controlling plasma uniformity in a semicon...
- Publication number 20010009139
- Publication date Jul 26, 2001
- Hongqing Shan
- H01 - BASIC ELECTRIC ELEMENTS

Paul E. Luscher

Person

Patents Grantslast 30 patents

Double slit-valve doors for plasma processing

Temperature controlled window with a fluid supply system

Configurable single substrate wet-dry integrated cluster cleaner

Magnetic barrier for plasma in chamber exhaust

Temperature controlled dome-coil system for high power inductively...

Endpoint detection in substrate fabrication processes

Dielectric etch chamber with expanded process window

Magnetic barrier for plasma in chamber exhaust

Dielectric etch chamber with expanded process window

Double slit-valve doors for plasma processing

Configurable single substrate wet-dry integrated cluster cleaner

Correction of wafer temperature drift in a plasma reactor based upo...

Apparatus and method for endpoint control and plasma monitoring

Adjusting DC bias voltage in plasma chamber

Apparatus for measuring pedestal and substrate temperature in a sem...

Plasma reactor cooled ceiling with an array of thermally isolated p...

Correction of wafer temperature drift in a plasma reactor based upo...

Apparatus and method for controlling plasma uniformity in a semicon...

Adjusting DC bias voltage in plasma chamber

Double slit-valve doors for plasma processing

Thin film processing plasma reactor chamber with radially upward sl...

Bandpass photon detector

Adjusting DC bias voltage in plasma chambers

Apparatus and method for actively controlling the DC potential of a...

MBE effusion source with asymmetrical heaters

Molecular beam converters for vacuum coating systems

Transfer and temperature monitoring apparatus

Patents Applicationslast 30 patents

TEMPERATURE CONTROLLED SEMICONDUCTOR PROCESSING CHAMBER LINER

Dielectric etch chamber with expanded process window

Double slit-valve doors for plasma processing

Temperature controlled dome-coil system for high power inductively...

Dielectric etch chamber with expanded process window

Dielectric etch chamber with expanded process window

Configurable single substrate wet-dry integrated cluster cleaner

Endpoint detection in substrate fabrication processes

Temperature controlled semiconductor processing chamber liner

Configurable single substrate wet-dry integrated cluster cleaner

Correction of wafer temperature drift in a plasma reactor based upo...

Magnetic barrier for plasma in chamber exhaust

Magnetic barrier for plasma in chamber exhaust

Adjusting DC bias voltage in plasma chamber

Apparatus and method for controlling plasma uniformity in a semicon...