Paul GRAEUPNER

Person

Aalen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Projection exposure methods and systems
- Patent number 9,885,958
- Issue date Feb 6, 2018
- Carl Zeiss SMT GmbH
- Paul Graeupner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for adjusting an illumination setting
- Patent number 9,690,203
- Issue date Jun 27, 2017
- Carl Zeiss SMT GmbH
- Joerg Zimmermann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure methods and systems
- Patent number 8,917,379
- Issue date Dec 23, 2014
- Carl Zeiss SMT GmbH
- Paul Graeupner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 8,711,330
- Issue date Apr 29, 2014
- ASML Netherlands B.V.
- Bob Streefkerk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection system with compensation of intensity variations and com...
- Patent number 8,605,257
- Issue date Dec 10, 2013
- Carl Zeiss SMT GmbH
- Patrick Scheible
- G02 - OPTICS
Information Patent Grant
Illumination system for illuminating a mask in a microlithographic...
- Patent number 8,416,390
- Issue date Apr 9, 2013
- Carl Zeiss SMT GmbH
- Markus Deguenther
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for correcting optical proximity effects
- Patent number 8,405,907
- Issue date Mar 26, 2013
- Carl Zeiss SMT GmbH
- Paul Graeupner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for improving an optical imaging property of a projection ob...
- Patent number 8,237,915
- Issue date Aug 7, 2012
- Carl Zeiss SMT GmbH
- Paul Graeupner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for correcting optical proximity effects
- Patent number 8,027,091
- Issue date Sep 27, 2011
- Carl Zeiss SMT GmbH
- Paul Graeupner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,961,293
- Issue date Jun 14, 2011
- ASML Netherlands B.V.
- Bob Streefkerk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure method and projection exposure apparatus for mi...
- Patent number 7,800,732
- Issue date Sep 21, 2010
- Carl Zeiss SMT AG
- Joerg Zimmermann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Immersion lithography objective
- Patent number 7,649,702
- Issue date Jan 19, 2010
- Carl Zeiss SMT AG
- Bernhard Gellrich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of optimizing imaging performance
- Patent number 7,570,345
- Issue date Aug 4, 2009
- Carl Zeiss SMT AG
- Gerd Reisinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,352,435
- Issue date Apr 1, 2008
- ASML Netherlands B.V.
- Bob Streefkerk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection objective, especially for microlithography, and method f...
- Patent number 7,310,187
- Issue date Dec 18, 2007
- Carl Zeiss SMT AG
- Alexander Epple
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of optimizing imaging performance
- Patent number 7,233,386
- Issue date Jun 19, 2007
- Carl Zeiss SMT AG
- Gerd Reisinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for improving an optical imaging property of a projection ob...
- Patent number 7,227,616
- Issue date Jun 5, 2007
- Carl Zeiss SMT AG
- Paul Graeupner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining wavefront aberrations
- Patent number 7,209,241
- Issue date Apr 24, 2007
- Carl Zeiss SMT AG
- Wolfgang Emer
- G01 - MEASURING TESTING
Information Patent Grant
Projection objective, especially for microlithography, and method f...
- Patent number 7,209,292
- Issue date Apr 24, 2007
- Carl Zeiss SMT AG
- Alexander Epple
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining wavefront aberrations
- Patent number 7,019,846
- Issue date Mar 28, 2006
- Carl Zeiss SMT AG
- Wolfgang Emer
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
PROJECTION EXPOSURE METHODS AND SYSTEMS
- Publication number 20180164691
- Publication date Jun 14, 2018
- Carl Zeiss SMT GMBH
- Paul GRAEUPNER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE METHODS AND SYSTEMS
- Publication number 20150160565
- Publication date Jun 11, 2015
- Carl Zeiss SMT GMBH
- Paul GRAEUPNER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR ADJUSTING AN ILLUMINATION SETTING
- Publication number 20150153652
- Publication date Jun 4, 2015
- Carl Zeiss SMT GMBH
- Joerg Zimmermann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR IMPROVING AN OPTICAL IMAGING PROPERTY OF A PROJECTION OB...
- Publication number 20130114056
- Publication date May 9, 2013
- Carl Zeiss SMT GMBH
- Paul GRAEUPNER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CORRECTING OPTICAL PROXIMITY EFFECTS
- Publication number 20120013985
- Publication date Jan 19, 2012
- Carl Zeiss SMT GMBH
- Paul GRAEUPNER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20110211181
- Publication date Sep 1, 2011
- ASML NETHERLANDS B.V.
- Bob STREEFKERK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS FOR MI...
- Publication number 20100157266
- Publication date Jun 24, 2010
- Carl Zeiss SMT AG
- Joerg Zimmermann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION SYSTEM FOR ILLUMINATING A MASK IN A MICROLITHOGRAPHIC...
- Publication number 20100060873
- Publication date Mar 11, 2010
- Carl Zeiss SMT AG
- Markus Deguenther
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE METHODS AND SYSTEMS
- Publication number 20090280437
- Publication date Nov 12, 2009
- Carl Zeiss SMT AG
- Paul Graeupner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR IMPROVING AN OPTICAL IMAGING PROPERTY OF A PROJECTION OB...
- Publication number 20090002661
- Publication date Jan 1, 2009
- Carl Zeiss SMT AG
- Paul Graeupner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMMERSION LITHOGRAPHY OBJECTIVE
- Publication number 20080212211
- Publication date Sep 4, 2008
- Carl Zeiss SMT AG
- Bernhard Gellrich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20080170215
- Publication date Jul 17, 2008
- ASML NETHERLANDS B.V.
- Bob Streefkerk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Projection System with Compensation of Intensity Variations and Com...
- Publication number 20080094599
- Publication date Apr 24, 2008
- Carl Zeiss SMT AG
- Patrick Scheible
- G02 - OPTICS
Information Patent Application
Method For Structuring A Substrate Using Multiple Exposure
- Publication number 20080036982
- Publication date Feb 14, 2008
- Carl Zeiss SMT AG
- Ulrich Wegmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CORRECTING OPTICAL PROXIMITY EFFECTS
- Publication number 20080032207
- Publication date Feb 7, 2008
- Carl Zeiss SMT AG
- Paul Graeupner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of optimizing imaging performance
- Publication number 20080007706
- Publication date Jan 10, 2008
- Carl Zeiss SMT AG
- Gerd Reisinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for improving an Optical Imaging Property of a Projection Ob...
- Publication number 20070195299
- Publication date Aug 23, 2007
- Carl Zeiss SMT AG
- Paul Graeupner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Projection objective, especially for microlithography, and method f...
- Publication number 20070188881
- Publication date Aug 16, 2007
- Carl Zeiss SMT AG
- Alexander Epple
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for determining wavefront aberrations
- Publication number 20060164655
- Publication date Jul 27, 2006
- Carl Zeiss SMT AG
- Wolfgang Emer
- G02 - OPTICS
Information Patent Application
Method for improving an optical imaging property of a projection ob...
- Publication number 20050264780
- Publication date Dec 1, 2005
- Carl Zeiss SMT AG
- Paul Graeupner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of optimizing imaging performance
- Publication number 20050237506
- Publication date Oct 27, 2005
- Carl Zeiss SMT AG
- Gerd Reisinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20050174550
- Publication date Aug 11, 2005
- ASML NETHERLANDS B.V.
- Bob Streefkerk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Projection objective, especially for microlithography, and method f...
- Publication number 20040109237
- Publication date Jun 10, 2004
- Carl Zeiss SMT AG
- Alexander Epple
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for determining wavefront aberrations
- Publication number 20040032579
- Publication date Feb 19, 2004
- Carl Zeiss SMT AG
- Wolfgang Emer
- G02 - OPTICS

Paul GRAEUPNER

Person

Patents Grantslast 30 patents

Projection exposure methods and systems

Method for adjusting an illumination setting

Projection exposure methods and systems

Lithographic apparatus and device manufacturing method

Projection system with compensation of intensity variations and com...

Illumination system for illuminating a mask in a microlithographic...

Method for correcting optical proximity effects

Method for improving an optical imaging property of a projection ob...

Method for correcting optical proximity effects

Lithographic apparatus and device manufacturing method

Projection exposure method and projection exposure apparatus for mi...

Immersion lithography objective

Method of optimizing imaging performance

Lithographic apparatus and device manufacturing method

Projection objective, especially for microlithography, and method f...

Method of optimizing imaging performance

Method for improving an optical imaging property of a projection ob...

Method for determining wavefront aberrations

Projection objective, especially for microlithography, and method f...

Method for determining wavefront aberrations

Patents Applicationslast 30 patents

PROJECTION EXPOSURE METHODS AND SYSTEMS

PROJECTION EXPOSURE METHODS AND SYSTEMS

METHOD FOR ADJUSTING AN ILLUMINATION SETTING

METHOD FOR IMPROVING AN OPTICAL IMAGING PROPERTY OF A PROJECTION OB...

METHOD FOR CORRECTING OPTICAL PROXIMITY EFFECTS

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS FOR MI...

ILLUMINATION SYSTEM FOR ILLUMINATING A MASK IN A MICROLITHOGRAPHIC...

PROJECTION EXPOSURE METHODS AND SYSTEMS

METHOD FOR IMPROVING AN OPTICAL IMAGING PROPERTY OF A PROJECTION OB...

IMMERSION LITHOGRAPHY OBJECTIVE

Lithographic apparatus and device manufacturing method

Projection System with Compensation of Intensity Variations and Com...

Method For Structuring A Substrate Using Multiple Exposure

METHOD FOR CORRECTING OPTICAL PROXIMITY EFFECTS

Method of optimizing imaging performance

Method for improving an Optical Imaging Property of a Projection Ob...

Projection objective, especially for microlithography, and method f...

Method for determining wavefront aberrations

Method for improving an optical imaging property of a projection ob...

Method of optimizing imaging performance

Lithographic apparatus and device manufacturing method

Projection objective, especially for microlithography, and method f...

Method for determining wavefront aberrations