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Paul J. LaBeaume

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  • Auburn, MA, US
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Patents Grantslast 30 patents

Patents Applicationslast 30 patents

  • Information Patent Application

    PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME,...
    • Publication number 20240027904
    • Publication date Jan 25, 2024
    • Rohm and Haas Electronic Materials L.L.C.
    • Emad Aqad
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATI...
    • Publication number 20240027905
    • Publication date Jan 25, 2024
    • Rohm and Haas Electronic Materials L.L.C.
    • Tomas Marangoni
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    PHOTORESIST UNDERLAYER COMPOSITIONS AND PATTERNING METHODS
    • Publication number 20220197142
    • Publication date Jun 23, 2022
    • Rohm and Haas Electronic Materials L.L.C.
    • Joshua Kaitz
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    PHOTORESIST UNDERLAYER COMPOSITIONS AND PATTERNING METHODS
    • Publication number 20220197141
    • Publication date Jun 23, 2022
    • Rohm and Haas Electronic Materials L.L.C.
    • Joshua Kaitz
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    SILICON-CONTAINING UNDERLAYERS
    • Publication number 20210397093
    • Publication date Dec 23, 2021
    • Rohm and Haas Electronic Materials L.L.C.
    • Charlotte A Cutler
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    COATING COMPOSITIONS AND METHODS OF FORMING ELECTRONIC DEVICES
    • Publication number 20210341840
    • Publication date Nov 4, 2021
    • Rohm and Haas Electronic Materials L.L.C.
    • Sheng Liu
    • C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
  • Information Patent Application

    AROMATIC UNDERLAYER
    • Publication number 20210247695
    • Publication date Aug 12, 2021
    • Rohm and Haas Electronic Materials L.L.C.
    • Sheng Liu
    • C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
  • Information Patent Application

    RESIST UNDERLAYER COMPOSITIONS AND PATTERN FORMATION METHODS USING...
    • Publication number 20200379347
    • Publication date Dec 3, 2020
    • Rohm and Haas Electronic Materials L.L.C.
    • Li Cui
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    RESIST UNDERLAYER COMPOSITIONS AND METHODS OF FORMING PATTERNS WITH...
    • Publication number 20200348592
    • Publication date Nov 5, 2020
    • Rohm and Haas Electronic Materials L.L.C.
    • Joshua Kaitz
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    AROMATIC UNDERLAYER
    • Publication number 20200142309
    • Publication date May 7, 2020
    • Rohm and Haas Electronic Materials L.L.C.
    • Sheng LIU
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    ACID GENERATORS AND PHOTORESISTS COMPRISING SAME
    • Publication number 20190227433
    • Publication date Jul 25, 2019
    • Rohm and Haas Electronic Materials L.L.C.
    • James W. THACKERAY
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    SILICON-CONTAINING UNDERLAYERS
    • Publication number 20190146343
    • Publication date May 16, 2019
    • Rohm and Haas Electronic Materials L.L.C.
    • Charlotte A Cutler
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    SILICON-BASED HARDMASK
    • Publication number 20190115209
    • Publication date Apr 18, 2019
    • Rohm and Haas Electronic Materials L.L.C.
    • Suzanne M. Coley
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    SILICON-CONTAINING UNDERLAYERS
    • Publication number 20190041751
    • Publication date Feb 7, 2019
    • Rohm and Haas Electronic Materials L.L.C.
    • Li Cui
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    SILICON-BASED HARDMASK
    • Publication number 20180366319
    • Publication date Dec 20, 2018
    • Rohm and Haas Electronic Materials L.L.C.
    • Suzanne M. Coley
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    SILICON-CONTAINING UNDERLAYERS
    • Publication number 20180253006
    • Publication date Sep 6, 2018
    • Rohm and Haas Electronic Materials L.L.C.
    • Li Cui
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    METHOD USING SILICON-CONTAINING UNDERLAYERS
    • Publication number 20180164685
    • Publication date Jun 14, 2018
    • Rohm and Haas Electronic Materials L.L.C.
    • Li Cui
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    METHOD USING SILICON-CONTAINING UNDERLAYERS
    • Publication number 20180164686
    • Publication date Jun 14, 2018
    • Rohm and Haas Electronic Materials L.L.C.
    • Li Cui
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    ZWITTERIONIC PHOTO-DESTROYABLE QUENCHERS
    • Publication number 20180095364
    • Publication date Apr 5, 2018
    • Rohm and Haas Electronic Materials L.L.C.
    • Paul J. LaBeaume
    • C07 - ORGANIC CHEMISTRY
  • Information Patent Application

    SILICON-CONTAINING UNDERLAYERS
    • Publication number 20180059546
    • Publication date Mar 1, 2018
    • Rohm and Haas Electronic Materials L.L.C.
    • Li Cui
    • C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
  • Information Patent Application

    SILICON-CONTAINING UNDERLAYERS
    • Publication number 20180059547
    • Publication date Mar 1, 2018
    • Rohm and Haas Electronic Materials L.L.C.
    • Charlotte A. Cutler
    • C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
  • Information Patent Application

    ONIUM COMPOUNDS AND METHODS OF SYNTHESIS THEREOF
    • Publication number 20180052390
    • Publication date Feb 22, 2018
    • Rohm and Haas Electronic Materials L.L.C.
    • Paul J. Labeaume
    • C07 - ORGANIC CHEMISTRY
  • Information Patent Application

    ARYL ACETATE ONIUM MATERIALS
    • Publication number 20160168117
    • Publication date Jun 16, 2016
    • Rohm and Haas Electronic Materials, L.L.C.
    • Paul J. Labeaume
    • C07 - ORGANIC CHEMISTRY
  • Information Patent Application

    POLYMER COMPRISING REPEAT UNITS WITH PHOTOACID-GENERATING FUNCTIONA...
    • Publication number 20160102158
    • Publication date Apr 14, 2016
    • Rohm and Haas Electronic Materials L.L.C.
    • Paul J. LaBeaume
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    PHOTORESIST COMPOSITION AND ASSOCIATED METHOD OF FORMING AN ELECTRO...
    • Publication number 20160103392
    • Publication date Apr 14, 2016
    • Rohm and Haas Electronic Materials L.L.C.
    • Paul J. LaBeaume
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    POLYMER COMPRISING REPEAT UNITS WITH PHOTOACID-GENERATING FUNCTIONA...
    • Publication number 20160102157
    • Publication date Apr 14, 2016
    • Rohm and Haas Electronic Materials L.L.C.
    • Vipul Jain
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    PHOTORESIST COMPOSITION AND ASSOCIATED METHOD OF FORMING AN ELECTRO...
    • Publication number 20160103391
    • Publication date Apr 14, 2016
    • Rohm and Haas Electronic Materials L.L.C.
    • Paul J. LaBeaume
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    ACID GENERATORS AND PHOTORESISTS COMPRISING SAME
    • Publication number 20160002199
    • Publication date Jan 7, 2016
    • Rohm and Haas Electronic Materials, L.L.C.
    • James F. Cameron
    • C07 - ORGANIC CHEMISTRY
  • Information Patent Application

    PHOTO-DESTROYABLE QUENCHER AND ASSOCIATED PHOTORESIST COMPOSITION,...
    • Publication number 20150346599
    • Publication date Dec 3, 2015
    • Rohm and Haas Electronic Materials L.L.C.
    • Paul J. LaBEAUME
    • C07 - ORGANIC CHEMISTRY
  • Information Patent Application

    SUBSTITUTED ARYL ONIUM MATERIALS
    • Publication number 20150093708
    • Publication date Apr 2, 2015
    • Rohm and Haas Electronic Materials L.L.C.
    • Paul J. LaBEAUME
    • C07 - ORGANIC CHEMISTRY