Paul Moroz

Person

Marblehead, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Electron beam enhanced surface wave plasma source
- Patent number 7,998,307
- Issue date Aug 16, 2011
- Tokyo Electron Limited
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radial line slot antenna having a conductive layer
- Patent number 7,938,081
- Issue date May 10, 2011
- Tokyo Electron Limited
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for arc suppression in a plasma processing system
- Patent number 7,199,327
- Issue date Apr 3, 2007
- Tokyo Electron Limited
- Paul Moroz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma chamber wall segment temperature control
- Patent number 7,186,313
- Issue date Mar 6, 2007
- Tokyo Electron Limited
- Andrej S Mitrovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for rapid temperature change and control
- Patent number 7,141,763
- Issue date Nov 28, 2006
- Tokyo Electron Limited
- Paul Moroz
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Method and apparatus for reducing substrate charging damage
- Patent number 7,109,122
- Issue date Sep 19, 2006
- Tokyo Electron Limited
- Paul Moroz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for determining clamping status of semiconduct...
- Patent number 7,073,383
- Issue date Jul 11, 2006
- Tokyo Electron Limited
- William Jones
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for efficient temperature control using a cont...
- Patent number 6,992,892
- Issue date Jan 31, 2006
- Tokyo Electron Limited
- Paul Moroz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus for spatial control of dissociation and...
- Patent number 6,887,341
- Issue date May 3, 2005
- Tokyo Electron Limited
- Eric J. Strang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Branching RF antennas and plasma processing apparatus
- Patent number 6,868,800
- Issue date Mar 22, 2005
- Tokyo Electron Limited
- Paul Moroz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method of controlling chemistry
- Patent number 6,674,241
- Issue date Jan 6, 2004
- Tokyo Electron Limited
- Eric J. Strang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20100307684
- Publication date Dec 9, 2010
- TOKYO ELECTRON LIMITED
- Ryosaku Ota
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Method and apparatus for temperature change and control
- Publication number 20090095451
- Publication date Apr 16, 2009
- TOKYO ELECTRON LIMITED
- Paul Moroz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Radial line slot antenna having a conductive layer
- Publication number 20080060760
- Publication date Mar 13, 2008
- TOKYO ELECTRON LIMITED
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron beam enhanced surface wave plasma source
- Publication number 20080060759
- Publication date Mar 13, 2008
- TOKYO ELECTRON LIMITED
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma chamber wall segment temperature control
- Publication number 20070131650
- Publication date Jun 14, 2007
- TOKYO ELECTRON LIMITED
- Andrej S. Mitrovic
- G05 - CONTROLLING REGULATING
Information Patent Application
Plasma chamber wall segment temperature control
- Publication number 20070113976
- Publication date May 24, 2007
- TOKYO ELECTRON LIMITED
- Andrej S. Mitrovic
- G05 - CONTROLLING REGULATING
Information Patent Application
Plasma chamber wall segment temperature control
- Publication number 20070114206
- Publication date May 24, 2007
- TOKYO ELECTRON LIMITED
- Andrej S. Mitrovic
- G05 - CONTROLLING REGULATING
Information Patent Application
Method and apparatus for measuring plasma density in processing rea...
- Publication number 20070074811
- Publication date Apr 5, 2007
- Paul Moroz
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Method and apparatus for measuring plasma density in processing rea...
- Publication number 20070075036
- Publication date Apr 5, 2007
- Paul Moroz
- G01 - MEASURING TESTING
Information Patent Application
Intelligent system for detection of process status, process fault a...
- Publication number 20060259198
- Publication date Nov 16, 2006
- TOKYO ELECTRON LIMITED
- Jozef Brcka
- G05 - CONTROLLING REGULATING
Information Patent Application
Method and system for arc suppression in a plasma processing system
- Publication number 20060081564
- Publication date Apr 20, 2006
- TOKYO ELECTRON LIMITED
- Paul Moroz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing system and method
- Publication number 20060060303
- Publication date Mar 23, 2006
- TOKYO ELECTRON LIMITED
- Steven T. Fink
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and system for substrate temperature profile control
- Publication number 20060027169
- Publication date Feb 9, 2006
- TOKYO ELECTRON LIMITED
- Yuji Tsukamoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for temperature change and control
- Publication number 20050229854
- Publication date Oct 20, 2005
- TOKYO ELECTRON LIMITED
- Paul Moroz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for rapid temperature change and control
- Publication number 20050211694
- Publication date Sep 29, 2005
- TOKYO ELECTRON LIMITED
- Paul Moroz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for efficient temperature control using a cont...
- Publication number 20050068736
- Publication date Mar 31, 2005
- TOKYO ELECTRON LIMITED
- Paul Moroz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma chamber wall segment temperature control
- Publication number 20040211660
- Publication date Oct 28, 2004
- TOKYO ELECTRON LIMITED
- Andrej S. Mitrovic
- G05 - CONTROLLING REGULATING
Information Patent Application
Hybrid plasma processing apparatus
- Publication number 20040194890
- Publication date Oct 7, 2004
- TOKYO ELECTRON LIMITED
- Paul Moroz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and method for determining clamping status of semiconduct...
- Publication number 20040149041
- Publication date Aug 5, 2004
- William Jones
- G01 - MEASURING TESTING
Information Patent Application
Method and apparatus for reducing substrate charging damage
- Publication number 20040104358
- Publication date Jun 3, 2004
- TOKYO ELECTRON LIMITED
- Paul Moroz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus for spatial control of dissociation and...
- Publication number 20030094238
- Publication date May 22, 2003
- Eric J. Strang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Branching RF antennas and plasma processing apparatus
- Publication number 20030062840
- Publication date Apr 3, 2003
- TOKYO ELECTRON LIMITED
- Paul Moroz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method of controlling chemistry
- Publication number 20030020411
- Publication date Jan 30, 2003
- TOKYO ELECTRON LIMITED
- Eric J. Strang
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Electron beam enhanced surface wave plasma source

Radial line slot antenna having a conductive layer

Method and system for arc suppression in a plasma processing system

Plasma chamber wall segment temperature control

Method and apparatus for rapid temperature change and control

Method and apparatus for reducing substrate charging damage

Apparatus and method for determining clamping status of semiconduct...

Method and apparatus for efficient temperature control using a cont...

Plasma processing apparatus for spatial control of dissociation and...

Branching RF antennas and plasma processing apparatus

Plasma processing apparatus and method of controlling chemistry

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS

Method and apparatus for temperature change and control

Radial line slot antenna having a conductive layer

Electron beam enhanced surface wave plasma source

Plasma chamber wall segment temperature control

Plasma chamber wall segment temperature control

Plasma chamber wall segment temperature control

Method and apparatus for measuring plasma density in processing rea...

Method and apparatus for measuring plasma density in processing rea...

Intelligent system for detection of process status, process fault a...

Method and system for arc suppression in a plasma processing system

Plasma processing system and method

Method and system for substrate temperature profile control

Method and apparatus for temperature change and control

Method and apparatus for rapid temperature change and control

Method and apparatus for efficient temperature control using a cont...

Plasma chamber wall segment temperature control

Hybrid plasma processing apparatus

Apparatus and method for determining clamping status of semiconduct...

Method and apparatus for reducing substrate charging damage

Plasma processing apparatus for spatial control of dissociation and...

Branching RF antennas and plasma processing apparatus

Plasma processing apparatus and method of controlling chemistry