Peter A. Burke

Person

Avondale, PA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Polishing pads for chemical mechanical planarization
- Patent number 6,860,802
- Issue date Mar 1, 2005
- Rohm and Haas Electric Materials CMP Holdings, Inc.
- Arun Vishwanathan
- B24 - GRINDING POLISHING
Information Patent Grant
Hydrolytically stable grooved polishing pads for chemical mechanica...
- Patent number 6,749,485
- Issue date Jun 15, 2004
- Rodel Holdings, Inc.
- David B. James
- B24 - GRINDING POLISHING
Information Patent Grant
Grooved polishing pads for chemical mechanical planarization
- Patent number 6,736,709
- Issue date May 18, 2004
- Rodel Holdings, Inc.
- David B. James
- B24 - GRINDING POLISHING
Information Patent Grant
Composition and method for polishing in metal CMP
- Patent number 6,699,299
- Issue date Mar 2, 2004
- Rodel Holdings, Inc.
- Vikas Sachan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods to control film removal rates for improved polishing in met...
- Patent number 6,693,035
- Issue date Feb 17, 2004
- Rodel Holdings, Inc.
- Vikas Sachan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition and method for polishing in metal CMP
- Patent number 6,616,717
- Issue date Sep 9, 2003
- Rodel Holdings, Inc.
- Vikas Sachan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dissolution of metal particles produced by polishing
- Patent number 6,602,112
- Issue date Aug 5, 2003
- Rodel Holdings, Inc.
- Tony Quan Tran
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pads for chemical mechanical planarization
- Patent number 6,582,283
- Issue date Jun 24, 2003
- Rodel Holdings, Inc.
- David B. James
- B24 - GRINDING POLISHING
Information Patent Grant
Control of removal rates in CMP
- Patent number 6,475,069
- Issue date Nov 5, 2002
- Rodel Holdings, Inc.
- Terence M. Thomas
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pads for chemical mechanical planarization
- Patent number 6,454,634
- Issue date Sep 24, 2002
- Rodel Holdings Inc.
- David B. James
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing slurries for metal
- Patent number 6,447,373
- Issue date Sep 10, 2002
- Rodel Holdings Inc.
- Craig D. Lack
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Methods for break-in and conditioning a fixed abrasive polishing pad
- Patent number 6,419,553
- Issue date Jul 16, 2002
- Rodel Holdings, Inc.
- Vilas N. Koinkar
- B24 - GRINDING POLISHING
Information Patent Grant
Composition and method for polishing in metal CMP
- Patent number 6,331,134
- Issue date Dec 18, 2001
- Rodel Holdings Inc.
- Vikas Sachan
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Apparatus and method for cleaning semiconductor wafer
- Patent number 6,110,294
- Issue date Aug 29, 2000
- Advanced Micro Devices, Inc.
- Kevin D. Shipley
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
Polishing pads for chemical mechanical planarization
- Publication number 20050020082
- Publication date Jan 27, 2005
- Arun Vishwanathan
- B24 - GRINDING POLISHING
Information Patent Application
Composition and method for polishing in metal CMP
- Publication number 20030181046
- Publication date Sep 25, 2003
- Vikas Sachan
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Polishing pads for chemical mechanical planarization
- Publication number 20030027500
- Publication date Feb 6, 2003
- David B. James
- B24 - GRINDING POLISHING
Information Patent Application
Methods for break-in and conditioning a fixed abrasive polishing pad
- Publication number 20020173235
- Publication date Nov 21, 2002
- Vilas N. Koinkar
- B24 - GRINDING POLISHING
Information Patent Application
Control of removal rates in CMP
- Publication number 20020019202
- Publication date Feb 14, 2002
- Terence M. Thomas
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Methods for break-in and conditioning a fixed abrasive polishing pad
- Publication number 20010053660
- Publication date Dec 20, 2001
- Vilas N. Koinkar
- B24 - GRINDING POLISHING
Information Patent Application
Dissolution of metal particles produced by polishing
- Publication number 20010039166
- Publication date Nov 8, 2001
- Tony Quan Tran
- B24 - GRINDING POLISHING
Information Patent Application
Composition and method for polishing in metal CMP
- Publication number 20010024933
- Publication date Sep 27, 2001
- Vikas Sachan
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Peter A. Burke

Person

Patents Grantslast 30 patents

Polishing pads for chemical mechanical planarization

Hydrolytically stable grooved polishing pads for chemical mechanica...

Grooved polishing pads for chemical mechanical planarization

Composition and method for polishing in metal CMP

Methods to control film removal rates for improved polishing in met...

Composition and method for polishing in metal CMP

Dissolution of metal particles produced by polishing

Polishing pads for chemical mechanical planarization

Control of removal rates in CMP

Polishing pads for chemical mechanical planarization

Chemical mechanical polishing slurries for metal

Methods for break-in and conditioning a fixed abrasive polishing pad

Composition and method for polishing in metal CMP

Apparatus and method for cleaning semiconductor wafer

Patents Applicationslast 30 patents

Polishing pads for chemical mechanical planarization

Composition and method for polishing in metal CMP

Polishing pads for chemical mechanical planarization

Methods for break-in and conditioning a fixed abrasive polishing pad

Control of removal rates in CMP

Methods for break-in and conditioning a fixed abrasive polishing pad

Dissolution of metal particles produced by polishing

Composition and method for polishing in metal CMP