Peter D'Elia

Person

Albany, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods to prevent surface charge induced cd-dependent etching of m...
- Patent number 12,148,625
- Issue date Nov 19, 2024
- Tokyo Electron Limited
- Shan Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wet etch process and method to control fin height and channel area...
- Patent number 12,148,624
- Issue date Nov 19, 2024
- Tokyo Electron Limited
- Shan Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and single wafer processing system for processing of semicon...
- Patent number 12,103,052
- Issue date Oct 1, 2024
- Tokyo Electron Limited
- Shan Hu
- B08 - CLEANING
Information Patent Grant
Methods for planarizing a substrate using a combined wet etch and c...
- Patent number 12,100,598
- Issue date Sep 24, 2024
- Tokyo Electron Limited
- Shan Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wet etch process and method to provide uniform etching of material...
- Patent number 12,100,599
- Issue date Sep 24, 2024
- Tokyo Electron Limited
- Shan Hu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND SINGLE WAFER PROCESSING SYSTEM FOR PROCESSING OF SEMICON...
- Publication number 20240399422
- Publication date Dec 5, 2024
- TOKYO ELECTRON LIMITED
- Shan Hu
- B08 - CLEANING
Information Patent Application
METHODS FOR RETAINING A PROCESSING LIQUID ON A SURFACE OF A SEMICON...
- Publication number 20240282597
- Publication date Aug 22, 2024
- TOKYO ELECTRON LIMITED
- Shan Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NORMAL-INCIDENCE IN-SITU PROCESS MONITOR SENSOR
- Publication number 20240222100
- Publication date Jul 4, 2024
- TOKYO ELECTRON LIMITED
- Shan HU
- G01 - MEASURING TESTING
Information Patent Application
METHODS TO PROVIDE UNIFORM WET ETCHING OF MATERIAL WITHIN HIGH ASPE...
- Publication number 20240105455
- Publication date Mar 28, 2024
- TOKYO ELECTRON LIMITED
- Shan Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS TO PREVENT SURFACE CHARGE INDUCED CD-DEPENDENT ETCHING OF M...
- Publication number 20240096638
- Publication date Mar 21, 2024
- TOKYO ELECTRON LIMITED
- Shan Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WET ETCH PROCESS AND METHOD TO PROVIDE UNIFORM ETCHING OF MATERIAL...
- Publication number 20240087908
- Publication date Mar 14, 2024
- TOKYO ELECTRON LIMITED
- Shan Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR PLANARIZING A SUBSTRATE USING A COMBINED WET ETCH AND C...
- Publication number 20240087907
- Publication date Mar 14, 2024
- TOKYO ELECTRON LIMITED
- Shan Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WET ETCH PROCESS AND METHOD TO CONTROL FIN HEIGHT AND CHANNEL AREA...
- Publication number 20240087909
- Publication date Mar 14, 2024
- TOKYO ELECTRON LIMITED
- Shan Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WET ETCH PROCESS AND METHODS TO FORM AIR GAPS BETWEEN METAL INTERCO...
- Publication number 20240087950
- Publication date Mar 14, 2024
- TOKYO ELECTRON LIMITED
- Shan Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SINGLE WAFER PROCESSING SYSTEM FOR PROCESSING OF SEMICON...
- Publication number 20230405642
- Publication date Dec 21, 2023
- TOKYO ELECTRON LIMITED
- Shan Hu
- B08 - CLEANING

Peter D'Elia

Person

Patents Grantslast 30 patents

Methods to prevent surface charge induced cd-dependent etching of m...

Wet etch process and method to control fin height and channel area...

Method and single wafer processing system for processing of semicon...

Methods for planarizing a substrate using a combined wet etch and c...

Wet etch process and method to provide uniform etching of material...

Patents Applicationslast 30 patents

METHOD AND SINGLE WAFER PROCESSING SYSTEM FOR PROCESSING OF SEMICON...

METHODS FOR RETAINING A PROCESSING LIQUID ON A SURFACE OF A SEMICON...

NORMAL-INCIDENCE IN-SITU PROCESS MONITOR SENSOR

METHODS TO PROVIDE UNIFORM WET ETCHING OF MATERIAL WITHIN HIGH ASPE...

METHODS TO PREVENT SURFACE CHARGE INDUCED CD-DEPENDENT ETCHING OF M...

WET ETCH PROCESS AND METHOD TO PROVIDE UNIFORM ETCHING OF MATERIAL...

METHODS FOR PLANARIZING A SUBSTRATE USING A COMBINED WET ETCH AND C...

WET ETCH PROCESS AND METHOD TO CONTROL FIN HEIGHT AND CHANNEL AREA...

WET ETCH PROCESS AND METHODS TO FORM AIR GAPS BETWEEN METAL INTERCO...

METHOD AND SINGLE WAFER PROCESSING SYSTEM FOR PROCESSING OF SEMICON...