Peter Hempenius

Person

Luyksgestel, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Charged particle beam apparatus, and systems and methods for operat...
- Patent number 11,798,777
- Issue date Oct 24, 2023
- ASML Netherlands B.V.
- Martinus Gerardus Maria Johannes Maassen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage apparatus suitable for electron beam inspection apparatus
- Patent number 11,764,030
- Issue date Sep 19, 2023
- ASML Netherlands B.V.
- Johannes Hubertus Antonius Van De Rijdt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate positioning device and electron beam inspection tool
- Patent number 11,621,142
- Issue date Apr 4, 2023
- ASML Netherlands B.V.
- Marcel Koenraad Marie Baggen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
E-beam apparatus
- Patent number 11,315,752
- Issue date Apr 26, 2022
- ASML Netherlands B.V.
- Peter Paul Hempenius
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam inspection apparatus stage positioning
- Patent number 11,302,512
- Issue date Apr 12, 2022
- ASML Netherlands B.V.
- Marcel Koenraad Marie Baggen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
E-beam apparatus
- Patent number 10,867,770
- Issue date Dec 15, 2020
- ASML Netherlands B.V.
- Peter Paul Hempenius
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage system and metrology tool
- Patent number 10,809,634
- Issue date Oct 20, 2020
- ASML Netherlands B.V.
- Peter Paul Hempenius
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic apparatus, object positioning system and device manufa...
- Patent number 10,191,396
- Issue date Jan 29, 2019
- ASML Netherlands B.V.
- Paul Corné Henri De Wit
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System for positioning an object in lithography
- Patent number 9,946,172
- Issue date Apr 17, 2018
- ASML Netherlands B.V.
- Peter Paul Hempenius
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus with actuator to compensate acoustic vibration
- Patent number 9,378,722
- Issue date Jun 28, 2016
- ASML Netherlands B.V.
- Hans Butler
- G10 - MUSICAL INSTRUMENTS ACOUSTICS
Information Patent Grant
Lithographic apparatus having a chuck with a visco-elastic damping...
- Patent number 8,928,860
- Issue date Jan 6, 2015
- ASML Netherlands B.V.
- Peter Paul Hempenius
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, method and device manufacturing method
- Patent number 8,310,651
- Issue date Nov 13, 2012
- ASML Netherlands B.V.
- Peter Paul Hempenius
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,969,550
- Issue date Jun 28, 2011
- ASML Netherlands B.V.
- Johan Hendrik Geerke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,884,919
- Issue date Feb 8, 2011
- ASML Netherlands B.V.
- Peter Hempenius
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stage system and lithographic apparatus comprising such a stage system
- Patent number 7,742,149
- Issue date Jun 22, 2010
- ASML Netherlands B.V.
- Youssef Karel Maria De Vos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PLATFORM FOR CHARGED PARTICLE APPARATUS AND COMPONENTS WITHIN A CHA...
- Publication number 20240312756
- Publication date Sep 19, 2024
- ASML NETHERLANDS B.V.
- Jasper Hendrik GRASMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE ASSESSMENT SYSTEM AND METHOD
- Publication number 20240288389
- Publication date Aug 29, 2024
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- B08 - CLEANING
Information Patent Application
DUAL FOCUS SOLUTON FOR SEM METROLOGY TOOLS
- Publication number 20240071713
- Publication date Feb 29, 2024
- ASML NETHERLANDS B.V.
- Niels Johannes Maria BOSCH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
E-BEAM APPARATUS
- Publication number 20210151282
- Publication date May 20, 2021
- Peter Paul HEMPENIUS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE POSITIONING DEVICE AND ELECTRON BEAM INSPECTION TOOL
- Publication number 20200373118
- Publication date Nov 26, 2020
- ASML NETHERLANDS B.V.
- Marcel Koenraad Marie BAGGEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM INSPECTION TOOL AND METHOD FOR POSITIONING AN OBJECT...
- Publication number 20200303158
- Publication date Sep 24, 2020
- ASML NETHERLANDS B.V.
- Niels Johannes Maria Bosch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS, AND SYSTEMS AND METHODS FOR OPERAT...
- Publication number 20200286707
- Publication date Sep 10, 2020
- ASML NETHERLANDS B.V.
- Martinus Gerardus, Maria, Johannes MAASSEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM INSPECTION APPARATUS STAGE POSITIONING
- Publication number 20200203118
- Publication date Jun 25, 2020
- ASML NETHERLANDS B.V.
- Marcel Koenraad Marie BAGGEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STAGE APPARATUS SUITABLE FOR ELECTRON BEAM INSPECTION APPARATUS
- Publication number 20200194222
- Publication date Jun 18, 2020
- ASML NETHERLANDS B.V.
- Johannes Hubertus Antonius VAN DE RIJDT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
E-BEAM APPARATUS
- Publication number 20190341224
- Publication date Nov 7, 2019
- ASML Netherlands B.V.
- Peter Paul HEMPENIUS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Stage System and Metrology Tool
- Publication number 20180267410
- Publication date Sep 20, 2018
- ASML NETHERLANDS B.V.
- Peter Paul HEMPENIUS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, OBJECT POSITIONING SYSTEM AND DEVICE MANUFA...
- Publication number 20180149986
- Publication date May 31, 2018
- ASML NETHERLANDS B.V.
- Paul Corné Henri DE WIT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM FOR POSITIONING AN OBJECT IN LITHOGRAPHY
- Publication number 20160377996
- Publication date Dec 29, 2016
- ASML NETHERLANDS B.V.
- Peter Paul HEMPENIUS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS HAVING A CHUCK WITH A VISCO-ELASTIC DAMPING...
- Publication number 20090231567
- Publication date Sep 17, 2009
- ASML NETHERLANDS B.V.
- Peter Paul HEMPENIUS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS
- Publication number 20090195763
- Publication date Aug 6, 2009
- ASML NETHERLANDS B.V.
- Hans Butler
- G10 - MUSICAL INSTRUMENTS ACOUSTICS
Information Patent Application
Lithographic Apparatus, Method and Device Manufacturing Method
- Publication number 20090195760
- Publication date Aug 6, 2009
- ASML NETHERLANDS B.V.
- Peter Paul HEMPENIUS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Stage system and lithographic apparatus comprising such a stage system
- Publication number 20080309911
- Publication date Dec 18, 2008
- ASML NETHERLANDS B.V.
- Youssef Karel Maria De Vos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20080259299
- Publication date Oct 23, 2008
- ASML NETHERLANDS B.V.
- Johan Hendrik Geerke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20070182947
- Publication date Aug 9, 2007
- ASML NETHERLANDS B.V.
- Peter Hempenius
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Peter Hempenius

Person

Patents Grantslast 30 patents

Charged particle beam apparatus, and systems and methods for operat...

Stage apparatus suitable for electron beam inspection apparatus

Substrate positioning device and electron beam inspection tool

E-beam apparatus

Electron beam inspection apparatus stage positioning

E-beam apparatus

Stage system and metrology tool

Lithographic apparatus, object positioning system and device manufa...

System for positioning an object in lithography

Lithographic apparatus with actuator to compensate acoustic vibration

Lithographic apparatus having a chuck with a visco-elastic damping...

Lithographic apparatus, method and device manufacturing method

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Stage system and lithographic apparatus comprising such a stage system

Patents Applicationslast 30 patents

PLATFORM FOR CHARGED PARTICLE APPARATUS AND COMPONENTS WITHIN A CHA...

CHARGED PARTICLE ASSESSMENT SYSTEM AND METHOD

DUAL FOCUS SOLUTON FOR SEM METROLOGY TOOLS

E-BEAM APPARATUS

SUBSTRATE POSITIONING DEVICE AND ELECTRON BEAM INSPECTION TOOL

ELECTRON BEAM INSPECTION TOOL AND METHOD FOR POSITIONING AN OBJECT...

CHARGED PARTICLE BEAM APPARATUS, AND SYSTEMS AND METHODS FOR OPERAT...

ELECTRON BEAM INSPECTION APPARATUS STAGE POSITIONING

STAGE APPARATUS SUITABLE FOR ELECTRON BEAM INSPECTION APPARATUS

E-BEAM APPARATUS

Stage System and Metrology Tool

LITHOGRAPHIC APPARATUS, OBJECT POSITIONING SYSTEM AND DEVICE MANUFA...

SYSTEM FOR POSITIONING AN OBJECT IN LITHOGRAPHY

LITHOGRAPHIC APPARATUS HAVING A CHUCK WITH A VISCO-ELASTIC DAMPING...

LITHOGRAPHIC APPARATUS

Lithographic Apparatus, Method and Device Manufacturing Method

Stage system and lithographic apparatus comprising such a stage system

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method