Peter Renteln

Person

San Ramon, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Optimized grooving structure for a CMP polishing pad
- Patent number 7,252,582
- Issue date Aug 7, 2007
- JH Rhodes Company, Inc.
- Peter Renteln
- B24 - GRINDING POLISHING
Information Patent Grant
Stacked polyurethane polishing pad and method of producing the same
- Patent number 7,189,156
- Issue date Mar 13, 2007
- JH Rhodes Company, Inc.
- Peter Renteln
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method and apparatus for controlling CMP pad surface finish
- Patent number 6,939,207
- Issue date Sep 6, 2005
- Lam Research Corporation
- Alan J. Jensen
- B24 - GRINDING POLISHING
Information Patent Grant
Partial-membrane carrier head
- Patent number 6,758,726
- Issue date Jul 6, 2004
- Lam Research Corporation
- Peter Renteln
- B24 - GRINDING POLISHING
Information Patent Grant
Method and apparatus for conditioning fixed-abrasive polishing pads
- Patent number 6,752,698
- Issue date Jun 22, 2004
- Lam Research Corporation
- Peter Renteln
- B24 - GRINDING POLISHING
Information Patent Grant
Method and apparatus for controlling CMP pad surface finish
- Patent number 6,645,052
- Issue date Nov 11, 2003
- Lam Research Corporation
- Alan J. Jensen
- B24 - GRINDING POLISHING
Information Patent Grant
Method for optimizing the planarizing length of a polishing pad
- Patent number 6,620,031
- Issue date Sep 16, 2003
- Lam Research Corporation
- Peter Renteln
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
POROUS POLYMERIC POLISHING BRISTLES AND METHODS FOR THEIR MANUFACTURE
- Publication number 20190350356
- Publication date Nov 21, 2019
- JH Rhodes Company, Inc.
- Scott Daskiewich
- A46 - BRUSHWARE
Information Patent Application
POLISHING PAD AND METHODS OF IMPROVING PAD REMOVAL RATES AND PLANAR...
- Publication number 20090017729
- Publication date Jan 15, 2009
- JH RHODES COMPANY, INC.
- Dwaine Halberg
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Fast break-in polishing pad and a method of making the same
- Publication number 20080146129
- Publication date Jun 19, 2008
- Makoto Kouzuma
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
High strength low density fiber
- Publication number 20080145302
- Publication date Jun 19, 2008
- Peter Henry Renteln
- D01 - NATURAL OR ARTIFICIAL THREADS OR FIBRES SPINNING
Information Patent Application
Method of chemical mechanical polishing, and a pad provided therefore
- Publication number 20060099891
- Publication date May 11, 2006
- Peter Renteln
- B24 - GRINDING POLISHING
Information Patent Application
Method of improving removal rate of pads
- Publication number 20060046064
- Publication date Mar 2, 2006
- Dwaine Halberg
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Optimized grooving structure for a CMP polishing pad
- Publication number 20060046626
- Publication date Mar 2, 2006
- Peter Renteln
- B24 - GRINDING POLISHING
Information Patent Application
Method of improving planarization of urethane polishing pads, and u...
- Publication number 20060046627
- Publication date Mar 2, 2006
- Peter Renteln
- B24 - GRINDING POLISHING
Information Patent Application
Stacked polyurethane polishing pad and method of producing the same
- Publication number 20060046628
- Publication date Mar 2, 2006
- Peter Renteln
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method and apparatus for controlling CMP pad surface finish
- Publication number 20040127144
- Publication date Jul 1, 2004
- Lam Research Corporation
- Alan J. Jensen
- B24 - GRINDING POLISHING
Information Patent Application
Partial-membrane carrier head
- Publication number 20040002291
- Publication date Jan 1, 2004
- Lam Research Corp.
- Peter Renteln
- B24 - GRINDING POLISHING
Information Patent Application
Method and apparatus for controlling CMP pad surface finish
- Publication number 20030082997
- Publication date May 1, 2003
- Alan J. Jensen
- B24 - GRINDING POLISHING
Information Patent Application
Method for optimizing the planarizing length of a polishing pad
- Publication number 20020146966
- Publication date Oct 10, 2002
- Lam Research Corporation
- Peter Renteln
- B24 - GRINDING POLISHING

Peter Renteln

Person

Patents Grantslast 30 patents

Optimized grooving structure for a CMP polishing pad

Stacked polyurethane polishing pad and method of producing the same

Method and apparatus for controlling CMP pad surface finish

Partial-membrane carrier head

Method and apparatus for conditioning fixed-abrasive polishing pads

Method and apparatus for controlling CMP pad surface finish

Method for optimizing the planarizing length of a polishing pad

Patents Applicationslast 30 patents

POROUS POLYMERIC POLISHING BRISTLES AND METHODS FOR THEIR MANUFACTURE

POLISHING PAD AND METHODS OF IMPROVING PAD REMOVAL RATES AND PLANAR...

Fast break-in polishing pad and a method of making the same

High strength low density fiber

Method of chemical mechanical polishing, and a pad provided therefore

Method of improving removal rate of pads

Optimized grooving structure for a CMP polishing pad

Method of improving planarization of urethane polishing pads, and u...

Stacked polyurethane polishing pad and method of producing the same

Method and apparatus for controlling CMP pad surface finish

Partial-membrane carrier head

Method and apparatus for controlling CMP pad surface finish

Method for optimizing the planarizing length of a polishing pad