Phillip D. Matz

Person

Macungie, PA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method of fabrication of on-chip heat pipes and ancillary heat tran...
- Patent number 7,781,884
- Issue date Aug 24, 2010
- Texas Instruments Incorporated
- Sameer Kumar Ajmera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for using a modified post-etch clean rinsing agent
- Patent number 7,732,345
- Issue date Jun 8, 2010
- Texas Instruments Incorporated
- Phillip Daniel Matz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduction of punch-thru defects in damascene processing
- Patent number 7,727,885
- Issue date Jun 1, 2010
- Texas Instruments Incorporated
- Phillip Daniel Matz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Air gap in integrated circuit inductor fabrication
- Patent number 7,642,619
- Issue date Jan 5, 2010
- Texas Instruments Incorporated
- Phillip D. Matz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Air gap in integrated circuit inductor fabrication
- Patent number 7,566,627
- Issue date Jul 28, 2009
- Texas Instruments Incorporated
- Phillip D Matz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of supercritical fluid for low effective dielectric constant me...
- Patent number 7,485,963
- Issue date Feb 3, 2009
- Texas Instruments Incorporated
- Satyavolu S. Papa Rao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single mask MIM capacitor and resistor with in trench copper drift...
- Patent number 7,189,615
- Issue date Mar 13, 2007
- Texas Instruments Incorporated
- Satyavolu Srinivas Papa Rao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of supercritical fluid for low effective dielectric constant me...
- Patent number 7,179,747
- Issue date Feb 20, 2007
- Texas Instruments Incorporated
- Satyavolu S. Papa Rao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal insulator metal (MIM) capacitor fabrication with sidewall bar...
- Patent number 7,115,467
- Issue date Oct 3, 2006
- Texas Instruments Incorporated
- Sameer Kumar Ajmera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Damage-free resist removal process for ultra-low-k processing
- Patent number 7,067,441
- Issue date Jun 27, 2006
- Texas Instruments Incorporated
- Patricia B. Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to reduce silanol and improve barrier properties in low k di...
- Patent number 7,037,823
- Issue date May 2, 2006
- Texas Instruments Incorporated
- Phillip D. Matz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical treatment of low-k dielectric films
- Patent number 6,838,300
- Issue date Jan 4, 2005
- Texas Instruments Incorporated
- Changming Jin
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD TO PREVENT LOCALIZED ELECTRICAL OPEN CU LEADS IN VLSI CU INT...
- Publication number 20100120242
- Publication date May 13, 2010
- TEXAS INSTRUMENTS INCORPORATED
- Sopa Chevacharoenkul
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AIR GAP IN INTEGRATED CIRCUIT INDUCTOR FABRICATION
- Publication number 20090261453
- Publication date Oct 22, 2009
- TEXAS INSTRUMENTS INCORPORATED
- Phillip D. Matz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Fabrication of On-Chip Heat Pipes and Ancillary Heat Tran...
- Publication number 20090085197
- Publication date Apr 2, 2009
- TEXAS INSTRUMENTS INCORPORATED
- Sameer Kumar Ajmera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AIR GAP IN INTEGRATED CIRCUIT INDUCTOR FABRICATION
- Publication number 20090001510
- Publication date Jan 1, 2009
- Phillip D Matz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR USING A MODIFIED POST-ETCH CLEAN RINSING AGENT
- Publication number 20080057730
- Publication date Mar 6, 2008
- TEXAS INSTRUMENTS INCORPORATED
- Phillip Daniel Matz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reduction of punch-thru defects in damascene processing
- Publication number 20080057711
- Publication date Mar 6, 2008
- Texas Instrumentd incorporated
- Phillip Daniel Matz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for removing residue containing an embedded metal
- Publication number 20070184666
- Publication date Aug 9, 2007
- Texas Instruments Inc.
- Patricia Beauregard Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Use of Supercritical Fluid for Low Effective Dielectric Constant Me...
- Publication number 20070102821
- Publication date May 10, 2007
- TEXAS INSTRUMENTS INCORPORATED
- Satyavolu S. Papa Rao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Single lithography-step planar metal-insulator-metal capacitor and...
- Publication number 20070080426
- Publication date Apr 12, 2007
- TEXAS INSTRUMENTS INCORPORATED
- Phillip D. Matz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Single mask MIM capacitor and resistor with in trench copper drift...
- Publication number 20060160299
- Publication date Jul 20, 2006
- TEXAS INSTRUMENTS INCORPORATED
- Satyavolu Srinivas Papa Rao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metal insulator metal (MIM) capacitor fabrication with sidewall bar...
- Publication number 20060024902
- Publication date Feb 2, 2006
- Sameer Kumar Ajmera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Extraction of impurities in a semiconductor process with a supercri...
- Publication number 20050241672
- Publication date Nov 3, 2005
- TEXAS INSTRUMENTS INCORPORATED
- Phillip D. Matz
- B08 - CLEANING
Information Patent Application
Method to reduce silanol and improve barrier properties in low K di...
- Publication number 20050233586
- Publication date Oct 20, 2005
- Phillip D. Matz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Use of supercritical fluid for low effective dielectric constant me...
- Publication number 20050167841
- Publication date Aug 4, 2005
- Satyavolu S. Papa Rao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Damage-free resist removal process for ultra-low-k processing
- Publication number 20050101125
- Publication date May 12, 2005
- Patricia B. Smith
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Hexamethyldisilazane treatment of low-k dielectric films
- Publication number 20040152296
- Publication date Aug 5, 2004
- TEXAS INSTRUMENTS INCORPORATED
- Phillip D. Matz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chemical treatment of low-k dielectric films
- Publication number 20040150012
- Publication date Aug 5, 2004
- TEXAS INSTRUMENTS INCORPORATED
- Changming Jin
- H01 - BASIC ELECTRIC ELEMENTS

Phillip D. Matz

Person

Patents Grantslast 30 patents

Method of fabrication of on-chip heat pipes and ancillary heat tran...

Method for using a modified post-etch clean rinsing agent

Reduction of punch-thru defects in damascene processing

Air gap in integrated circuit inductor fabrication

Air gap in integrated circuit inductor fabrication

Use of supercritical fluid for low effective dielectric constant me...

Single mask MIM capacitor and resistor with in trench copper drift...

Use of supercritical fluid for low effective dielectric constant me...

Metal insulator metal (MIM) capacitor fabrication with sidewall bar...

Damage-free resist removal process for ultra-low-k processing

Method to reduce silanol and improve barrier properties in low k di...

Chemical treatment of low-k dielectric films

Patents Applicationslast 30 patents

METHOD TO PREVENT LOCALIZED ELECTRICAL OPEN CU LEADS IN VLSI CU INT...

AIR GAP IN INTEGRATED CIRCUIT INDUCTOR FABRICATION

Method of Fabrication of On-Chip Heat Pipes and Ancillary Heat Tran...

AIR GAP IN INTEGRATED CIRCUIT INDUCTOR FABRICATION

METHOD FOR USING A MODIFIED POST-ETCH CLEAN RINSING AGENT

Reduction of punch-thru defects in damascene processing

Method for removing residue containing an embedded metal

Use of Supercritical Fluid for Low Effective Dielectric Constant Me...

Single lithography-step planar metal-insulator-metal capacitor and...

Single mask MIM capacitor and resistor with in trench copper drift...

Metal insulator metal (MIM) capacitor fabrication with sidewall bar...

Extraction of impurities in a semiconductor process with a supercri...

Method to reduce silanol and improve barrier properties in low K di...

Use of supercritical fluid for low effective dielectric constant me...

Damage-free resist removal process for ultra-low-k processing

Hexamethyldisilazane treatment of low-k dielectric films

Chemical treatment of low-k dielectric films