Pierre Leroux

Person

San Antonio, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
Wafer target design and method for determining centroid of wafer ta...
- Patent number 7,868,473
- Issue date Jan 11, 2011
- NXP B.V.
- Bryan Hubbard
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measuring the effect of flare on line width
- Patent number 7,709,166
- Issue date May 4, 2010
- NXP B.V.
- David Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measuring the effect of flare on line width
- Patent number 7,556,900
- Issue date Jul 7, 2009
- NXP B.V.
- David Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Self-compensating mark design for stepper alignment
- Patent number 7,556,893
- Issue date Jul 7, 2009
- NXP, B.V.
- Pierre Leroux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle for determining rotational error
- Patent number 7,442,474
- Issue date Oct 28, 2008
- NXP B.V.
- Pierre Leroux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay box structure for measuring process induced line shortening...
- Patent number 7,332,255
- Issue date Feb 19, 2008
- NXP B.V.
- Yuji Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Self-compensating mark design for stepper alignment
- Patent number 7,067,931
- Issue date Jun 27, 2006
- Koninklijke Philips Electronics N.V.
- Pierre Leroux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Calibration wafer for a stepper
- Patent number 7,054,007
- Issue date May 30, 2006
- Koninklijke Philips Electronics N.V.
- Pierre Leroux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining rotational error portion of total misalignme...
- Patent number 6,950,187
- Issue date Sep 27, 2005
- Koninklijke Philips Electronics N.V.
- Pierre Leroux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wafer target design and method for determining centroid of wafer ta...
- Patent number 6,889,162
- Issue date May 3, 2005
- Koninklijke Philips Electronics N.V.
- Bryan Hubbard
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Techniques to characterize iso-dense effects for microdevice manufa...
- Patent number 6,800,403
- Issue date Oct 5, 2004
- Koninklijke Philips Electronics N.V.
- Pierre Leroux
- G01 - MEASURING TESTING
Information Patent Grant
Method for determining wafer misalignment using a pattern on a fine...
- Patent number 6,671,048
- Issue date Dec 30, 2003
- Koninklijke Philips Electronics N.V.
- Pierre Leroux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining rotational error portion of total misalignme...
- Patent number 6,639,676
- Issue date Oct 28, 2003
- Koninklijke Philips Electronics N.V.
- Pierre Leroux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor processing methods and structures for determining ali...
- Patent number 6,544,859
- Issue date Apr 8, 2003
- Koninklijke Philips Electronics N.V.
- David Ziger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for determining magnification error portion of total misalig...
- Patent number 6,541,283
- Issue date Apr 1, 2003
- Koninklijke Philips Electronics N.V.
- Pierre Leroux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor processing methods and structures for determining ali...
- Patent number 6,465,322
- Issue date Oct 15, 2002
- Koninklijke Philips Electronics N.V.
- David Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Arrangement and method for calibrating optical line shortening meas...
- Patent number 6,301,008
- Issue date Oct 9, 2001
- Philips Semiconductor, Inc.
- David Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining translation portion of misalignment error in...
- Patent number 6,258,611
- Issue date Jul 10, 2001
- VLSI Technology, Inc.
- Pierre Leroux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for determining illumination exposure dosage
- Patent number 5,976,741
- Issue date Nov 2, 1999
- VSLI Technology, Inc.
- David Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for removing particles from semiconductor wafe...
- Patent number 5,972,051
- Issue date Oct 26, 1999
- VLSI Technology, Inc.
- Pierre Leroux
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for measuring the effectiveness of optical proximity correct...
- Patent number 5,962,173
- Issue date Oct 5, 1999
- VLSI Technology, Inc.
- Pierre Leroux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for verifying an average topography height function of a pho...
- Patent number 5,960,107
- Issue date Sep 28, 1999
- VLSI Technology, Inc.
- Pierre Leroux
- G01 - MEASURING TESTING
Information Patent Grant
Method for measuring dimensional anomalies in photolithographed int...
- Patent number 5,902,703
- Issue date May 11, 1999
- VLSI Technology, Inc.
- Pierre Leroux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method forming focus/exposure matrix on a wafer using overlapped ex...
- Patent number 5,876,883
- Issue date Mar 2, 1999
- VLSI Technology, Inc.
- Pierre Leroux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wafer with a focus/exposure matrix
- Patent number 5,856,052
- Issue date Jan 5, 1999
- VLSI Technology, Inc.
- Pierre Leroux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for measuring alignment accuracy in a step and repeat system...
- Patent number 5,830,610
- Issue date Nov 3, 1998
- VLSI Technology, Inc.
- Pierre Leroux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and mask design to minimize reflective notching effects
- Patent number 5,780,208
- Issue date Jul 14, 1998
- VLSI Technology, Inc.
- David Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Particle removal wafer
- Patent number 5,762,688
- Issue date Jun 9, 1998
- VLSI Technology, Inc.
- David H. Ziger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for generating dense lines on a semiconductor wafer using ph...
- Patent number 5,407,785
- Issue date Apr 18, 1995
- VLSI Technology, Inc.
- Pierre Leroux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor wafer defect monitoring
- Patent number 5,392,113
- Issue date Feb 21, 1995
- VLSI Technology, Inc.
- Anthony Sayka
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
MEASURING THE EFFECT OF FLARE ON LINE WIDTH
- Publication number 20090220870
- Publication date Sep 3, 2009
- David Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Measuring the effect of flare on line width
- Publication number 20060210885
- Publication date Sep 21, 2006
- David Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Self-compensating mark design for stepper alignment
- Publication number 20060192302
- Publication date Aug 31, 2006
- Pierre Leroux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Calibration wafer for a stepper
- Publication number 20060033917
- Publication date Feb 16, 2006
- Pierre Leroux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Overlay box structure for measuring process induced line shortening...
- Publication number 20050250026
- Publication date Nov 10, 2005
- Koninklijke Philips Electronics N.V.
- Yuji Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for determining rotational error portion of total misalignme...
- Publication number 20050190349
- Publication date Sep 1, 2005
- Pierre Leroux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Wafer target design and method for determining centroid of wafer ta...
- Publication number 20050182593
- Publication date Aug 18, 2005
- Bryan Hubbard
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for determining rotational error portion of total misalignme...
- Publication number 20040138842
- Publication date Jul 15, 2004
- Pierre Leroux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Techniques to characterize iso-dense effects for microdevice manufa...
- Publication number 20030232253
- Publication date Dec 18, 2003
- Pierre Leroux
- G01 - MEASURING TESTING
Information Patent Application
Calibration wafer for a stepper
- Publication number 20030152848
- Publication date Aug 14, 2003
- Koninklijke Philips Electronics N.V.
- Pierre Leroux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor processing methods and structures for determining ali...
- Publication number 20020048922
- Publication date Apr 25, 2002
- DAVID ZIGER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING METHODS AND STRUCTURES FOR DETERMINING ALI...
- Publication number 20010051441
- Publication date Dec 13, 2001
- DAVID ZIGER
- H01 - BASIC ELECTRIC ELEMENTS

Pierre Leroux

Person

Patents Grantslast 30 patents

Wafer target design and method for determining centroid of wafer ta...

Measuring the effect of flare on line width

Measuring the effect of flare on line width

Self-compensating mark design for stepper alignment

Reticle for determining rotational error

Overlay box structure for measuring process induced line shortening...

Self-compensating mark design for stepper alignment

Calibration wafer for a stepper

Method for determining rotational error portion of total misalignme...

Wafer target design and method for determining centroid of wafer ta...

Techniques to characterize iso-dense effects for microdevice manufa...

Method for determining wafer misalignment using a pattern on a fine...

Method for determining rotational error portion of total misalignme...

Semiconductor processing methods and structures for determining ali...

Method for determining magnification error portion of total misalig...

Semiconductor processing methods and structures for determining ali...

Arrangement and method for calibrating optical line shortening meas...

Method for determining translation portion of misalignment error in...

Methods for determining illumination exposure dosage

Method and apparatus for removing particles from semiconductor wafe...

Method for measuring the effectiveness of optical proximity correct...

Method for verifying an average topography height function of a pho...

Method for measuring dimensional anomalies in photolithographed int...

Method forming focus/exposure matrix on a wafer using overlapped ex...

Wafer with a focus/exposure matrix

Method for measuring alignment accuracy in a step and repeat system...

Method and mask design to minimize reflective notching effects

Particle removal wafer

Method for generating dense lines on a semiconductor wafer using ph...

Semiconductor wafer defect monitoring

Patents Applicationslast 30 patents

MEASURING THE EFFECT OF FLARE ON LINE WIDTH

Measuring the effect of flare on line width

Self-compensating mark design for stepper alignment

Calibration wafer for a stepper

Overlay box structure for measuring process induced line shortening...

Method for determining rotational error portion of total misalignme...

Wafer target design and method for determining centroid of wafer ta...

Method for determining rotational error portion of total misalignme...

Techniques to characterize iso-dense effects for microdevice manufa...

Calibration wafer for a stepper

Semiconductor processing methods and structures for determining ali...

SEMICONDUCTOR PROCESSING METHODS AND STRUCTURES FOR DETERMINING ALI...