Purushottam Kumar

Person

Hillsboro, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for providing doped silicon using a diffusion barrier layer
- Patent number 12,125,705
- Issue date Oct 22, 2024
- Lam Research Corporation
- Purushottam Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Variable cycle and time RF activation method for film thickness mat...
- Patent number 12,077,859
- Issue date Sep 3, 2024
- Lam Research Corporation
- Ishtak Karim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for cleaning plasma chambers
- Patent number 12,057,300
- Issue date Aug 6, 2024
- Lam Research Corporation
- Adrien Lavoie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dielectric gapfill using atomic layer deposition (ALD), inhibitor p...
- Patent number 12,049,699
- Issue date Jul 30, 2024
- Lam Research Corporation
- Joseph Abel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low-κ ALD gap-fill methods and material
- Patent number 12,020,923
- Issue date Jun 25, 2024
- Lam Research Corporation
- Joseph R. Abel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dynamic precursor dosing for atomic layer deposition
- Patent number 11,970,772
- Issue date Apr 30, 2024
- Lam Research Corporation
- Purushottam Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for modulating film uniformity
- Patent number 11,913,113
- Issue date Feb 27, 2024
- Lam Research Corporation
- Pulkit Agarwal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of atomic layer deposition
- Patent number 11,670,503
- Issue date Jun 6, 2023
- Lam Research Corporation
- Jun Qian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of improving deposition induced CD imbalance using spatially...
- Patent number 11,651,963
- Issue date May 16, 2023
- Lam Research Corporation
- Ishtak Karim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultrathin atomic layer deposition film accuracy thickness control
- Patent number 11,646,198
- Issue date May 9, 2023
- Lam Research Corporation
- Jun Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-cycle ALD process for film uniformity and thickness profile m...
- Patent number 11,479,856
- Issue date Oct 25, 2022
- Lam Research Corporation
- Purushottam Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Surface modified depth controlled deposition for plasma based depos...
- Patent number 11,373,862
- Issue date Jun 28, 2022
- Lam Research Corporation
- Joseph Abel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Controller for controlling core critical dimension variation using...
- Patent number 11,322,416
- Issue date May 3, 2022
- Lam Research Corporation
- Pulkit Agarwal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric gapfill using atomic layer deposition (ALD), inhibitor p...
- Patent number 11,293,098
- Issue date Apr 5, 2022
- Lam Research Corporation
- Joseph Abel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for flow monitoring in a precursor vapor supply...
- Patent number 11,255,017
- Issue date Feb 22, 2022
- Lam Research Corporation
- Jun Qian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dynamic precursor dosing for atomic layer deposition
- Patent number 11,180,850
- Issue date Nov 23, 2021
- Lam Research Corporation
- Purushottam Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ultrathin atomic layer deposition film accuracy thickness control
- Patent number 11,101,129
- Issue date Aug 24, 2021
- Lam Research Corporation
- Jun Qian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Symmetric precursor delivery
- Patent number 11,021,792
- Issue date Jun 1, 2021
- Lam Research Corporation
- Eli Jeon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of improving deposition induced CD imbalance using spatially...
- Patent number 10,978,302
- Issue date Apr 13, 2021
- Lam Research Corporation
- Ishtak Karim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compensating chamber and process effects to improve critical dimens...
- Patent number 10,847,352
- Issue date Nov 24, 2020
- Lam Research Corporation
- Pulkit Agarwal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Atomic layer etch, reactive precursors and energetic sources for pa...
- Patent number 10,832,909
- Issue date Nov 10, 2020
- Lam Research Corporation
- Adrien LaVoie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface modified depth controlled deposition for plasma based depos...
- Patent number 10,727,046
- Issue date Jul 28, 2020
- Lam Research Corporation
- Joseph Abel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for controlling core critical dimension variation using flas...
- Patent number 10,727,143
- Issue date Jul 28, 2020
- Lam Research Corporation
- Pulkit Agarwal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective atomic layer deposition with post-dose treatment
- Patent number 10,679,848
- Issue date Jun 9, 2020
- Lam Research Corporation
- Purushottam Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Conical wafer centering and holding device for semiconductor proces...
- Patent number 10,655,224
- Issue date May 19, 2020
- Lam Research Corporation
- Pulkit Agarwal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dielectric gapfill of high aspect ratio features utilizing a sacrif...
- Patent number 10,658,172
- Issue date May 19, 2020
- Lam Research Corporation
- Joseph R. Abel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method monitoring chamber drift
- Patent number 10,636,686
- Issue date Apr 28, 2020
- Lam Research Corporation
- Joseph Abel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultrathin atomic layer deposition film accuracy thickness control
- Patent number 10,566,187
- Issue date Feb 18, 2020
- Lam Research Corporation
- Jun Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hardware and process for film uniformity improvement
- Patent number 10,526,700
- Issue date Jan 7, 2020
- Lam Research Corporation
- Purushottam Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-cycle ALD process for film uniformity and thickness profile m...
- Patent number 10,526,701
- Issue date Jan 7, 2020
- Lam Research Corporation
- Purushottam Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR PROVIDING DOPED SILICON USING A DIFFUSION BARRIER LAYER
- Publication number 20250046613
- Publication date Feb 6, 2025
- LAM RESEARCH CORPORATION
- Purushottam KUMAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR CLEANING PLASMA CHAMBERS
- Publication number 20240395513
- Publication date Nov 28, 2024
- LAM RESEARCH CORPORATION
- Adrien LAVOIE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW-K ALD GAP-FILL METHODS AND MATERIAL
- Publication number 20240347337
- Publication date Oct 17, 2024
- LAM RESEARCH CORPORATION
- Joseph R. Abel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DYNAMIC PRECURSOR DOSING FOR ATOMIC LAYER DEPOSITION
- Publication number 20240240316
- Publication date Jul 18, 2024
- LAM RESEARCH CORPORATION
- Purushottam Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR MODULATING FILM UNIFORMITY
- Publication number 20240183034
- Publication date Jun 6, 2024
- LAM RESEARCH CORPORATION
- Pulkit Agarwal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ULTRATHIN ATOMIC LAYER DEPOSITION FILM ACCURACY THICKNESS CONTROL
- Publication number 20230298884
- Publication date Sep 21, 2023
- LAM RESEARCH CORPORATION
- Jun Qian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS FEED SYSTEM FOR SURFACE MODIFIED DEPTH CONTROLLED DEPOSITION FO...
- Publication number 20220301866
- Publication date Sep 22, 2022
- LAM RESEARCH CORPORATION
- Joseph Abel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DYNAMIC PROCESS CONTROL IN SEMICONDUCTOR MANUFACTURING
- Publication number 20220293442
- Publication date Sep 15, 2022
- LAM RESEARCH CORPORATION
- Purushottam Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU CONTROL OF FILM PROPERTIES DURING ATOMIC LAYER DEPOSITION
- Publication number 20220238325
- Publication date Jul 28, 2022
- LAM RESEARCH CORPORATION
- Douglas Walter Agnew
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC GAPFILL USING ATOMIC LAYER DEPOSITION (ALD), INHIBITOR P...
- Publication number 20220205096
- Publication date Jun 30, 2022
- LAM RESEARCH CORPORATION
- Joseph ABEL
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR CLEANING PLASMA CHAMBERS
- Publication number 20220181128
- Publication date Jun 9, 2022
- LAM RESEARCH CORPORATION
- Adrien LAVOIE
- B08 - CLEANING
Information Patent Application
METHOD FOR PROVIDING DOPED SILICON
- Publication number 20220165563
- Publication date May 26, 2022
- LAM RESEARCH CORPORATION
- Purushottam KUMAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VARIABLE CYCLE AND TIME RF ACTIVATION METHOD FOR FILM THICKNESS MAT...
- Publication number 20220154336
- Publication date May 19, 2022
- LAM RESEARCH CORPORATION
- Ishtak Karim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW-K ALD GAP-FILL METHODS AND MATERIAL
- Publication number 20220037146
- Publication date Feb 3, 2022
- LAM RESEARCH CORPORATION
- Joseph R. Abel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DYNAMIC PRECURSOR DOSING FOR ATOMIC LAYER DEPOSITION
- Publication number 20220033967
- Publication date Feb 3, 2022
- LAM RESEARCH CORPORATION
- Purushottam Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MODIFYING HYDROPHOBICITY OF A WAFER SURFACE USING AN ORGANOSILICON...
- Publication number 20210384029
- Publication date Dec 9, 2021
- LAM RESEARCH CORPORATION
- Jeremy D. Fields
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRATHIN ATOMIC LAYER DEPOSITION FILM ACCURACY THICKNESS CONTROL
- Publication number 20210343520
- Publication date Nov 4, 2021
- LAM RESEARCH CORPORATION
- Jun Qian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYMMETRIC PRECURSOR DELIVERY
- Publication number 20210238743
- Publication date Aug 5, 2021
- LAM RESEARCH CORPORATION
- Eli Jeon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF IMPROVING DEPOSITION INDUCED CD IMBALANCE USING SPATIALLY...
- Publication number 20210202250
- Publication date Jul 1, 2021
- LAM RESEARCH CORPORATION
- Ishtak KARIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR FLOW MONITORING IN A PRECURSOR VAPOR SUPPLY...
- Publication number 20200407849
- Publication date Dec 31, 2020
- LAM RESEARCH CORPORATION
- Jun Qian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SURFACE MODIFIED DEPTH CONTROLLED DEPOSITION FOR PLASMA BASED DEPOS...
- Publication number 20200357636
- Publication date Nov 12, 2020
- LAM RESEARCH CORPORATION
- Joseph Abel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Controller for Controlling Core Critical Dimension Variation Using...
- Publication number 20200350219
- Publication date Nov 5, 2020
- LAM RESEARCH CORPORATION
- Pulkit Agarwal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRATHIN ATOMIC LAYER DEPOSITION FILM ACCURACY THICKNESS CONTROL
- Publication number 20200152446
- Publication date May 14, 2020
- LAM RESEARCH CORPORATION
- Jun Qian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-CYCLE ALD PROCESS FOR FILM UNIFORMITY AND THICKNESS PROFILE M...
- Publication number 20200087786
- Publication date Mar 19, 2020
- LAM RESEARCH CORPORATION
- Purushottam Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR MODULATING FILM UNIFORMITY
- Publication number 20200063259
- Publication date Feb 27, 2020
- LAM RESEARCH CORPORATION
- Pulkit Agarwal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYMMETRIC PRECURSOR DELIVERY
- Publication number 20200056288
- Publication date Feb 20, 2020
- LAM RESEARCH CORPORATION
- Eli Jeon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COMPENSATING CHAMBER AND PROCESS EFFECTS TO IMPROVE CRITICAL DIMENS...
- Publication number 20200043709
- Publication date Feb 6, 2020
- LAM RESEARCH CORPORATION
- Pulkit Agarwal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for Controlling Core Critical Dimension Variation Using Flas...
- Publication number 20200035572
- Publication date Jan 30, 2020
- LAM RESEARCH CORPORATION
- Pulkit Agarwal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC GAPFILL USING ATOMIC LAYER DEPOSITION (ALD), INHIBITOR P...
- Publication number 20200017967
- Publication date Jan 16, 2020
- LAM RESEARCH CORPORATION
- Joseph ABEL
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SURFACE MODIFIED DEPTH CONTROLLED DEPOSITION FOR PLASMA BASED DEPOS...
- Publication number 20200013616
- Publication date Jan 9, 2020
- LAM RESEARCH CORPORATION
- Joseph Abel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Purushottam Kumar

Person

Patents Grantslast 30 patents

Method for providing doped silicon using a diffusion barrier layer

Variable cycle and time RF activation method for film thickness mat...

Apparatus for cleaning plasma chambers

Dielectric gapfill using atomic layer deposition (ALD), inhibitor p...

Low-κ ALD gap-fill methods and material

Dynamic precursor dosing for atomic layer deposition

Method and apparatus for modulating film uniformity

Method of atomic layer deposition

Method of improving deposition induced CD imbalance using spatially...

Ultrathin atomic layer deposition film accuracy thickness control

Multi-cycle ALD process for film uniformity and thickness profile m...

Surface modified depth controlled deposition for plasma based depos...

Controller for controlling core critical dimension variation using...

Dielectric gapfill using atomic layer deposition (ALD), inhibitor p...

Systems and methods for flow monitoring in a precursor vapor supply...

Dynamic precursor dosing for atomic layer deposition

Ultrathin atomic layer deposition film accuracy thickness control

Symmetric precursor delivery

Method of improving deposition induced CD imbalance using spatially...

Compensating chamber and process effects to improve critical dimens...

Atomic layer etch, reactive precursors and energetic sources for pa...

Surface modified depth controlled deposition for plasma based depos...

Method for controlling core critical dimension variation using flas...

Selective atomic layer deposition with post-dose treatment

Conical wafer centering and holding device for semiconductor proces...

Dielectric gapfill of high aspect ratio features utilizing a sacrif...

Method monitoring chamber drift

Ultrathin atomic layer deposition film accuracy thickness control

Hardware and process for film uniformity improvement

Multi-cycle ALD process for film uniformity and thickness profile m...

Patents Applicationslast 30 patents

METHOD FOR PROVIDING DOPED SILICON USING A DIFFUSION BARRIER LAYER

APPARATUS FOR CLEANING PLASMA CHAMBERS

LOW-K ALD GAP-FILL METHODS AND MATERIAL

DYNAMIC PRECURSOR DOSING FOR ATOMIC LAYER DEPOSITION

METHOD AND APPARATUS FOR MODULATING FILM UNIFORMITY

ULTRATHIN ATOMIC LAYER DEPOSITION FILM ACCURACY THICKNESS CONTROL

GAS FEED SYSTEM FOR SURFACE MODIFIED DEPTH CONTROLLED DEPOSITION FO...

DYNAMIC PROCESS CONTROL IN SEMICONDUCTOR MANUFACTURING

IN-SITU CONTROL OF FILM PROPERTIES DURING ATOMIC LAYER DEPOSITION

DIELECTRIC GAPFILL USING ATOMIC LAYER DEPOSITION (ALD), INHIBITOR P...

APPARATUS FOR CLEANING PLASMA CHAMBERS

METHOD FOR PROVIDING DOPED SILICON

VARIABLE CYCLE AND TIME RF ACTIVATION METHOD FOR FILM THICKNESS MAT...

LOW-K ALD GAP-FILL METHODS AND MATERIAL

DYNAMIC PRECURSOR DOSING FOR ATOMIC LAYER DEPOSITION

MODIFYING HYDROPHOBICITY OF A WAFER SURFACE USING AN ORGANOSILICON...

ULTRATHIN ATOMIC LAYER DEPOSITION FILM ACCURACY THICKNESS CONTROL

SYMMETRIC PRECURSOR DELIVERY

METHOD OF IMPROVING DEPOSITION INDUCED CD IMBALANCE USING SPATIALLY...

SYSTEMS AND METHODS FOR FLOW MONITORING IN A PRECURSOR VAPOR SUPPLY...

SURFACE MODIFIED DEPTH CONTROLLED DEPOSITION FOR PLASMA BASED DEPOS...

Controller for Controlling Core Critical Dimension Variation Using...

ULTRATHIN ATOMIC LAYER DEPOSITION FILM ACCURACY THICKNESS CONTROL

MULTI-CYCLE ALD PROCESS FOR FILM UNIFORMITY AND THICKNESS PROFILE M...

METHOD AND APPARATUS FOR MODULATING FILM UNIFORMITY

SYMMETRIC PRECURSOR DELIVERY

COMPENSATING CHAMBER AND PROCESS EFFECTS TO IMPROVE CRITICAL DIMENS...

Method for Controlling Core Critical Dimension Variation Using Flas...

DIELECTRIC GAPFILL USING ATOMIC LAYER DEPOSITION (ALD), INHIBITOR P...

SURFACE MODIFIED DEPTH CONTROLLED DEPOSITION FOR PLASMA BASED DEPOS...