Qiang FANG

Person

Ballston Lake, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Chamferless interconnect vias of semiconductor devices
- Patent number 10,770,344
- Issue date Sep 8, 2020
- GLOBALFOUNDRIES Inc.
- Yuping Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned multiple patterning processes with layered mandrels
- Patent number 10,446,395
- Issue date Oct 15, 2019
- GLOBALFOUNDRIES Inc.
- Jiehui Shu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cobalt plated via integration scheme
- Patent number 10,340,183
- Issue date Jul 2, 2019
- GLOBALFOUNDRIES Inc.
- Qiang Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming cobalt contact module and cobalt contact module f...
- Patent number 10,262,942
- Issue date Apr 16, 2019
- GLOBALFOUNDRIES Inc.
- Qiang Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to prevent cobalt recess
- Patent number 10,109,521
- Issue date Oct 23, 2018
- GLOBALFOUNDRIES Inc.
- Qiang Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structure and method for inhibiting cobalt diffusion
- Patent number 9,865,543
- Issue date Jan 9, 2018
- GLOBALFOUNDRIES INC.
- Qiang Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming air gaps in metallization layers on integrated c...
- Patent number 9,768,058
- Issue date Sep 19, 2017
- GLOBALFOUNDRIES Inc.
- Zhiguo Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sacrificial amorphous silicon hard mask for BEOL
- Patent number 9,741,610
- Issue date Aug 22, 2017
- GLOBALFOUNDRIES Inc.
- Qiang Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned lithographic patterning with variable spacings
- Patent number 9,711,447
- Issue date Jul 18, 2017
- GLOBALFOUNDRIES Inc.
- Jiehui Shu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reducing liner corrosion during metallization of semiconductor devices
- Patent number 9,595,493
- Issue date Mar 14, 2017
- GLOBALFOUNDRIES Inc.
- Zhiguo Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liner and cap layer for placeholder source/drain contact structure...
- Patent number 9,466,723
- Issue date Oct 11, 2016
- GLOBALFOUNDRIES Inc.
- Haigou Huang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CHAMFERLESS INTERCONNECT VIAS OF SEMICONDUCTOR DEVICES
- Publication number 20200219763
- Publication date Jul 9, 2020
- GLOBALFOUNDRIES INC.
- YUPING REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED MULTIPLE PATTERNING PROCESSES WITH LAYERED MANDRELS
- Publication number 20190318931
- Publication date Oct 17, 2019
- GLOBALFOUNDRIES INC.
- Jiehui Shu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COBALT PLATED VIA INTEGRATION SCHEME
- Publication number 20190206729
- Publication date Jul 4, 2019
- GLOBALFOUNDRIES INC.
- Qiang FANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING COBALT CONTACT MODULE AND COBALT CONTACT MODULE F...
- Publication number 20190035739
- Publication date Jan 31, 2019
- GLOBALFOUNDRIES INC.
- Qiang Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERCONNECTS WITH INNER SACRIFICIAL SPACERS
- Publication number 20180012791
- Publication date Jan 11, 2018
- GLOBALFOUNDRIES Inc.
- Zhiguo Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING AIR GAPS IN METALLIZATION LAYERS ON INTEGRATED C...
- Publication number 20170047242
- Publication date Feb 16, 2017
- GLOBALFOUNDRIES INC.
- Zhiguo Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REDUCING LINER CORROSION DURING METALLIZATION OF SEMICONDUCTOR DEVICES
- Publication number 20170047282
- Publication date Feb 16, 2017
- GLOBALFOUNDRIES INC.
- Zhiguo SUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SACRIFICIAL AMORPHOUS SILICON HARD MASK FOR BEOL
- Publication number 20160365277
- Publication date Dec 15, 2016
- GLOBALFOUNDRIES INC.
- Qiang FANG
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Chamferless interconnect vias of semiconductor devices

Self-aligned multiple patterning processes with layered mandrels

Cobalt plated via integration scheme

Method of forming cobalt contact module and cobalt contact module f...

Method to prevent cobalt recess

Structure and method for inhibiting cobalt diffusion

Methods of forming air gaps in metallization layers on integrated c...

Sacrificial amorphous silicon hard mask for BEOL

Self-aligned lithographic patterning with variable spacings

Reducing liner corrosion during metallization of semiconductor devices

Liner and cap layer for placeholder source/drain contact structure...

Patents Applicationslast 30 patents

CHAMFERLESS INTERCONNECT VIAS OF SEMICONDUCTOR DEVICES

SELF-ALIGNED MULTIPLE PATTERNING PROCESSES WITH LAYERED MANDRELS

COBALT PLATED VIA INTEGRATION SCHEME

METHOD OF FORMING COBALT CONTACT MODULE AND COBALT CONTACT MODULE F...

INTERCONNECTS WITH INNER SACRIFICIAL SPACERS

METHODS OF FORMING AIR GAPS IN METALLIZATION LAYERS ON INTEGRATED C...

REDUCING LINER CORROSION DURING METALLIZATION OF SEMICONDUCTOR DEVICES

SACRIFICIAL AMORPHOUS SILICON HARD MASK FOR BEOL