Qiwei Wang

Person

Shanghai, CN

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor structure of split gate flash memory cell
- Patent number 11,723,197
- Issue date Aug 8, 2023
- Shanghai Huali Microelectronics Corporation
- Lei Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure and the manufacturing method thereof
- Patent number 11,695,027
- Issue date Jul 4, 2023
- Shanghai Huali Microelectronics Corporation
- Zhen Gu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure and the manufacturing method thereof
- Patent number 11,676,987
- Issue date Jun 13, 2023
- Shanghai Huali Microelectronics Corporation
- Zhen Gu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method for a semiconductor device
- Patent number 11,462,627
- Issue date Oct 4, 2022
- Shanghai Huali Microelectronics Corporation
- Xiang Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flash with shallow trench in channel region and method for manufact...
- Patent number 11,374,014
- Issue date Jun 28, 2022
- Shanghai Huali Microelectronics Corporation
- Chengcheng Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Non-volatile flash memory device and a manufacturing method thereof
- Patent number 11,335,692
- Issue date May 17, 2022
- SHANGHAI HUALI INTEGRATED CIRCUIT MFG. CO., LTD.
- Qiwei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure of split gate flash memory cell and method...
- Patent number 11,322,506
- Issue date May 3, 2022
- Shanghai Huali Microelectronics Corporation
- Lei Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Global shutter CMOS image sensor having photosensitive doped region...
- Patent number 11,282,874
- Issue date Mar 22, 2022
- Shanghai Huali Microelectronics Corporation
- Haoyu Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method therefor
- Patent number 11,056,498
- Issue date Jul 6, 2021
- Shanghai Huali Microelectronics Corporation
- Jinshuang Zhang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR REDUCING DAMAGE TO FLOATING GATE POLYSILICON DURING ETCHING
- Publication number 20240421215
- Publication date Dec 19, 2024
- Shanghai Huali Integrated Circuit Corporation
- Cuili Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS INTEGRATION METHOD FOR IMPROVING LEAKAGE IN MV DEVICE
- Publication number 20240282635
- Publication date Aug 22, 2024
- Shanghai Huali Integrated Circuit Corporation
- Qiwei WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MV DEVICE AND METHOD FOR MANUFACTURING SAME
- Publication number 20240096989
- Publication date Mar 21, 2024
- Shanghai Huali Integrated Circuit Corporation
- Qiwei WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MV DEVICE AND METHOD FOR MANUFACTURING SAME
- Publication number 20240096992
- Publication date Mar 21, 2024
- Shanghai Huali Integrated Circuit Corporation
- Qiwei WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integrated Structure of MOS Transistors Having Different Working Vo...
- Publication number 20230335641
- Publication date Oct 19, 2023
- Shanghai Huali Intergrated Circuit Corporation
- Qi Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process Method for Improving Reliability of Metal Gate High-Voltage...
- Publication number 20230274931
- Publication date Aug 31, 2023
- Shanghai Huali Integrated Circuit Corporation
- Yaoyu Zhan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MAKING ACTIVE AREA AIR GAP
- Publication number 20230164992
- Publication date May 25, 2023
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- Shaokang Yao
Information Patent Application
ISOLATION TRENCH STRUCTURE OF BACKSIDE ILLUMINATED CMOS IMAGE SENSO...
- Publication number 20230065976
- Publication date Mar 2, 2023
- Shanghai Huali Integrated Circuit Corporation
- Linghao Xiong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND THE MANUFACTURING METHOD THEREOF
- Publication number 20220246667
- Publication date Aug 4, 2022
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- Zhen GU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Manufacturing Method For A Semiconductor Device
- Publication number 20220052180
- Publication date Feb 17, 2022
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- Xiang Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE OF SPLIT GATE FLASH MEMORY CELL
- Publication number 20210384205
- Publication date Dec 9, 2021
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- Lei ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NON-VOLATILE FLASH MEMORY DEVICE AND A MANUFACTURING METHOD THEREOF
- Publication number 20210320112
- Publication date Oct 14, 2021
- Shanghai Huali Integrated Circuit Mfg. Co., Ltd.
- Qiwei WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND THE MANUFACTURING METHOD THEREOF
- Publication number 20210036045
- Publication date Feb 4, 2021
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- Zhen GU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Flash and Method for Manufacturing the Same
- Publication number 20200402987
- Publication date Dec 24, 2020
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- Chengcheng Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Global Shutter CMOS Image Sensor
- Publication number 20200357831
- Publication date Nov 12, 2020
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- Haoyu Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE OF SPLIT GATE FLASH MEMORY CELL AND METHOD...
- Publication number 20200350325
- Publication date Nov 5, 2020
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- Lei ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREFOR
- Publication number 20200006372
- Publication date Jan 2, 2020
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- Jinshuang Zhang
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Semiconductor structure of split gate flash memory cell

Semiconductor structure and the manufacturing method thereof

Semiconductor structure and the manufacturing method thereof

Manufacturing method for a semiconductor device

Flash with shallow trench in channel region and method for manufact...

Non-volatile flash memory device and a manufacturing method thereof

Semiconductor structure of split gate flash memory cell and method...

Global shutter CMOS image sensor having photosensitive doped region...

Semiconductor device and manufacturing method therefor

Patents Applicationslast 30 patents

METHOD FOR REDUCING DAMAGE TO FLOATING GATE POLYSILICON DURING ETCHING

PROCESS INTEGRATION METHOD FOR IMPROVING LEAKAGE IN MV DEVICE

MV DEVICE AND METHOD FOR MANUFACTURING SAME

MV DEVICE AND METHOD FOR MANUFACTURING SAME

Integrated Structure of MOS Transistors Having Different Working Vo...

Process Method for Improving Reliability of Metal Gate High-Voltage...

METHOD FOR MAKING ACTIVE AREA AIR GAP

ISOLATION TRENCH STRUCTURE OF BACKSIDE ILLUMINATED CMOS IMAGE SENSO...

SEMICONDUCTOR STRUCTURE AND THE MANUFACTURING METHOD THEREOF

Manufacturing Method For A Semiconductor Device

SEMICONDUCTOR STRUCTURE OF SPLIT GATE FLASH MEMORY CELL

NON-VOLATILE FLASH MEMORY DEVICE AND A MANUFACTURING METHOD THEREOF

SEMICONDUCTOR STRUCTURE AND THE MANUFACTURING METHOD THEREOF

Flash and Method for Manufacturing the Same

Global Shutter CMOS Image Sensor

SEMICONDUCTOR STRUCTURE OF SPLIT GATE FLASH MEMORY CELL AND METHOD...

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREFOR