Rafael C. Howell

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method of determining characteristic of patterning process based on...
- Patent number 12,092,963
- Issue date Sep 17, 2024
- ASML Netherlands B.V.
- Xingyue Peng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wavefront optimization for tuning scanner based on performance matc...
- Patent number 11,977,334
- Issue date May 7, 2024
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining patterning device pattern based on manufactu...
- Patent number 11,972,194
- Issue date Apr 30, 2024
- ASML Netherlands B.V.
- Roshni Biswas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods of determining scattering of radiation by structures of fin...
- Patent number 11,789,371
- Issue date Oct 17, 2023
- ASML Netherlands B.V.
- Yu Cao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining curvilinear patterns for patterning device
- Patent number 11,734,490
- Issue date Aug 22, 2023
- ASML Netherlands B.V.
- Quan Zhang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods of tuning process models
- Patent number 11,614,690
- Issue date Mar 28, 2023
- ASML Netherlands B.V.
- Mu Feng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wavefront optimization for tuning scanner based on performance matc...
- Patent number 11,586,114
- Issue date Feb 21, 2023
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining patterning device pattern based on manufactu...
- Patent number 11,580,289
- Issue date Feb 14, 2023
- ASML Netherlands B.V.
- Roshni Biswas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Simulation of lithography using multiple-sampling of angular distri...
- Patent number 11,506,984
- Issue date Nov 22, 2022
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods of determining scattering of radiation by structures of fin...
- Patent number 11,409,203
- Issue date Aug 9, 2022
- ASML Netherlands B.V.
- Yu Cao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining curvilinear patterns for patterning device
- Patent number 11,232,249
- Issue date Jan 25, 2022
- ASML Netherlands B.V.
- Quan Zhang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Profile aware source-mask optimization
- Patent number 11,054,750
- Issue date Jul 6, 2021
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of determining scattering of radiation by structures of fin...
- Patent number 11,016,395
- Issue date May 25, 2021
- ASML Netherlands B.V.
- Yu Cao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Binarization method and freeform mask optimization flow
- Patent number 10,990,003
- Issue date Apr 27, 2021
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Discrete source mask optimization
- Patent number 10,558,124
- Issue date Feb 11, 2020
- ASML Netherlands B.V.
- Xiaofeng Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Flows of optimization for lithographic processes
- Patent number 10,459,346
- Issue date Oct 29, 2019
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimization flows of source, mask and projection optics
- Patent number 10,401,732
- Issue date Sep 3, 2019
- ASML Netherlands B.V.
- Duan-Fu Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Discrete source mask optimization
- Patent number 10,191,384
- Issue date Jan 29, 2019
- ASML Netherlands B.V.
- Xiaofeng Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Flows of optimization for lithographic processes
- Patent number 10,025,201
- Issue date Jul 17, 2018
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimization flows of source, mask and projection optics
- Patent number 9,588,438
- Issue date Mar 7, 2017
- ASML Netherlands B.V.
- Duan-Fu Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Gradient-based pattern and evaluation point selection
- Patent number 8,898,599
- Issue date Nov 25, 2014
- ASML Netherlands B.V.
- Xiaofeng Liu
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF DETERMINING CHARACTERISTIC OF PATTERNING PROCESS BASED ON...
- Publication number 20240419086
- Publication date Dec 19, 2024
- ASML NETHERLANDS B.V.
- Xingyue PENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS, SOFTWARE, AND SYSTEMS FOR DETERMINATION OF CONSTANT-WIDTH...
- Publication number 20240353749
- Publication date Oct 24, 2024
- ASML NETHERLANDS B.V.
- Xingyue PENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETERMINING MASK RULE CHECK VIOLATIONS AND MASK DESIGN
- Publication number 20240241436
- Publication date Jul 18, 2024
- ASML NETHERLANDS B.V.
- Xingyue PENG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ABERRATION IMPACT SYSTEMS, MODELS, AND MANUFACTURING PROCESSES
- Publication number 20230205096
- Publication date Jun 29, 2023
- ASML NETHERLANDS B.V.
- Xingyue PENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WAVEFRONT OPTIMIZATION FOR TUNING SCANNER BASED ON PERFORMANCE MATC...
- Publication number 20230161264
- Publication date May 25, 2023
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING PATTERNING DEVICE PATTERN BASED ON MANUFACTU...
- Publication number 20230141799
- Publication date May 11, 2023
- ASML NETHERLANDS B.V.
- Roshni BISWAS
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS OF DETERMINING SCATTERING OF RADIATION BY STRUCTURES OF FIN...
- Publication number 20220373892
- Publication date Nov 24, 2022
- ASML NETHERLANDS B.V.
- Yu CAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR PHOTOLITHOGRAPHIC IMAGING
- Publication number 20220276564
- Publication date Sep 1, 2022
- Mir Farrokh SHAYEGAN SALEK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DETERMINING CHARACTERISTIC OF PATTERNING PROCESS BASED ON...
- Publication number 20220229374
- Publication date Jul 21, 2022
- ASML NETHERLANS B.V.
- Xingyue PENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING CURVILINEAR PATTERNS FOR PATTERNING DEVICE
- Publication number 20220121804
- Publication date Apr 21, 2022
- ASML Netherland B.V.
- Quan Zhang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR DETERMINING PATTERNING DEVICE PATTERN BASED ON MANUFACTU...
- Publication number 20220050381
- Publication date Feb 17, 2022
- ASML NETHERLANDS B.V.
- Roshni BISWAS
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
WAVEFRONT OPTIMIZATION FOR TUNING SCANNER BASED ON PERFORMANCE MATC...
- Publication number 20210364929
- Publication date Nov 25, 2021
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF DETERMINING SCATTERING OF RADIATION BY STRUCTURES OF FIN...
- Publication number 20210271173
- Publication date Sep 2, 2021
- ASML NETHERLANDS B.V.
- Yu CAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING CURVILINEAR PATTERNS FOR PATTERNING DEVICE
- Publication number 20210048753
- Publication date Feb 18, 2021
- ASML NETHERLANDS B.V.
- Quan ZHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR TRAINING MACHINE LEARNING MODEL FOR COMPUTATION LITHOGR...
- Publication number 20200380362
- Publication date Dec 3, 2020
- ASML NETHERLANDS B.V.
- Yu CAO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
BINARIZATION METHOD AND FREEFORM MASK OPTIMIZATION FLOW
- Publication number 20200363713
- Publication date Nov 19, 2020
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS OF DETERMINING SCATTERING OF RADIATION BY STRUCTURES OF FIN...
- Publication number 20200073260
- Publication date Mar 5, 2020
- ASML NETHERLANDS B.V.
- Yu CAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF TUNING PROCESS MODELS
- Publication number 20190369498
- Publication date Dec 5, 2019
- ASML NETHERLANDS B.V.
- Mu FENG
- G05 - CONTROLLING REGULATING
Information Patent Application
DISCRETE SOURCE MASK OPTIMIZATION
- Publication number 20190155165
- Publication date May 23, 2019
- ASML NETHERLANDS B.V.
- Xiaofeng LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLOWS OF OPTIMIZATION FOR LITHOGRAPHIC PROCESSES
- Publication number 20180341186
- Publication date Nov 29, 2018
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SIMULATION OF LITHOGRAPHY USING MULTIPLE-SAMPLING OF ANGULAR DISTRI...
- Publication number 20180120709
- Publication date May 3, 2018
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPTIMIZATION FLOWS OF SOURCE, MASK AND PROJECTION OPTICS
- Publication number 20170176864
- Publication date Jun 22, 2017
- ASML NETHERLANDS B.V.
- Duan-Fu HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLOWS OF OPTIMIZATION FOR LITHOGRAPHIC PROCESSES
- Publication number 20170038692
- Publication date Feb 9, 2017
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROFILE AWARE SOURCE-MASK OPTIMIZATION
- Publication number 20160231654
- Publication date Aug 11, 2016
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DISCRETE SOURCE MASK OPTIMIZATION
- Publication number 20150378262
- Publication date Dec 31, 2015
- Xiaofeng LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GRADIENT-BASED PATTERN AND EVALUATION POINT SELECTION
- Publication number 20130326437
- Publication date Dec 5, 2013
- ASML NETHERLANDS B.V.
- Xiaofeng LIU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Optimization Flows of Source, Mask and Projection Optics
- Publication number 20120113404
- Publication date May 10, 2012
- ASML NETHERLANDS B.V.
- Duan-Fu Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Rafael C. Howell

Person

Patents Grantslast 30 patents

Method of determining characteristic of patterning process based on...

Wavefront optimization for tuning scanner based on performance matc...

Method for determining patterning device pattern based on manufactu...

Methods of determining scattering of radiation by structures of fin...

Method for determining curvilinear patterns for patterning device

Methods of tuning process models

Wavefront optimization for tuning scanner based on performance matc...

Method for determining patterning device pattern based on manufactu...

Simulation of lithography using multiple-sampling of angular distri...

Methods of determining scattering of radiation by structures of fin...

Method for determining curvilinear patterns for patterning device

Profile aware source-mask optimization

Methods of determining scattering of radiation by structures of fin...

Binarization method and freeform mask optimization flow

Discrete source mask optimization

Flows of optimization for lithographic processes

Optimization flows of source, mask and projection optics

Discrete source mask optimization

Flows of optimization for lithographic processes

Optimization flows of source, mask and projection optics

Gradient-based pattern and evaluation point selection

Patents Applicationslast 30 patents

METHOD OF DETERMINING CHARACTERISTIC OF PATTERNING PROCESS BASED ON...

METHODS, SOFTWARE, AND SYSTEMS FOR DETERMINATION OF CONSTANT-WIDTH...

DETERMINING MASK RULE CHECK VIOLATIONS AND MASK DESIGN

ABERRATION IMPACT SYSTEMS, MODELS, AND MANUFACTURING PROCESSES

WAVEFRONT OPTIMIZATION FOR TUNING SCANNER BASED ON PERFORMANCE MATC...

METHOD FOR DETERMINING PATTERNING DEVICE PATTERN BASED ON MANUFACTU...

METHODS OF DETERMINING SCATTERING OF RADIATION BY STRUCTURES OF FIN...

METHOD AND APPARATUS FOR PHOTOLITHOGRAPHIC IMAGING

METHOD OF DETERMINING CHARACTERISTIC OF PATTERNING PROCESS BASED ON...

METHOD FOR DETERMINING CURVILINEAR PATTERNS FOR PATTERNING DEVICE

METHOD FOR DETERMINING PATTERNING DEVICE PATTERN BASED ON MANUFACTU...

WAVEFRONT OPTIMIZATION FOR TUNING SCANNER BASED ON PERFORMANCE MATC...

METHODS OF DETERMINING SCATTERING OF RADIATION BY STRUCTURES OF FIN...

METHOD FOR DETERMINING CURVILINEAR PATTERNS FOR PATTERNING DEVICE

METHODS FOR TRAINING MACHINE LEARNING MODEL FOR COMPUTATION LITHOGR...

BINARIZATION METHOD AND FREEFORM MASK OPTIMIZATION FLOW

METHODS OF DETERMINING SCATTERING OF RADIATION BY STRUCTURES OF FIN...

METHODS OF TUNING PROCESS MODELS

DISCRETE SOURCE MASK OPTIMIZATION

FLOWS OF OPTIMIZATION FOR LITHOGRAPHIC PROCESSES

SIMULATION OF LITHOGRAPHY USING MULTIPLE-SAMPLING OF ANGULAR DISTRI...

OPTIMIZATION FLOWS OF SOURCE, MASK AND PROJECTION OPTICS

FLOWS OF OPTIMIZATION FOR LITHOGRAPHIC PROCESSES

PROFILE AWARE SOURCE-MASK OPTIMIZATION

DISCRETE SOURCE MASK OPTIMIZATION

GRADIENT-BASED PATTERN AND EVALUATION POINT SELECTION

Optimization Flows of Source, Mask and Projection Optics