Ralf Mueller

Person

Aalen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Catadioptric projection objective including a reflective optical co...
- Patent number 10,578,976
- Issue date Mar 3, 2020
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Grant
Method of operating a projection exposure tool for microlithography
- Patent number 10,241,423
- Issue date Mar 26, 2019
- Carl Zeiss SMT GmbH
- Olaf Conradi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Catadioptric projection objective including a reflective optical co...
- Patent number 10,146,137
- Issue date Dec 4, 2018
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Grant
Imaging optical unit and projection exposure apparatus for projecti...
- Patent number 10,139,734
- Issue date Nov 27, 2018
- Carl Zeiss SMT GmbH
- Alexander Epple
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical unit for EUV projection lithography
- Patent number 9,983,484
- Issue date May 29, 2018
- Carl Zeiss SMT GmbH
- Martin Endres
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror of a projection exposure apparatus for microlithography with...
- Patent number 9,606,339
- Issue date Mar 28, 2017
- Carl Zeiss SMT GmbH
- Jochen Hetzler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of operating a projection exposure tool for microlithography
- Patent number 9,442,381
- Issue date Sep 13, 2016
- Carl Zeiss SMT GmbH
- Olaf Conradi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imaging optical system
- Patent number 9,244,361
- Issue date Jan 26, 2016
- Carl Zeiss SMT GmbH
- Ralf Mueller
- G02 - OPTICS
Information Patent Grant
Imaging optics
- Patent number 9,201,226
- Issue date Dec 1, 2015
- Carl Zeiss SMT GmbH
- Ulrich Loering
- G02 - OPTICS
Information Patent Grant
Illumination system of a microlithographic projection exposure appa...
- Patent number 9,013,680
- Issue date Apr 21, 2015
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection objective and projection exposure apparatus for microlit...
- Patent number 8,441,613
- Issue date May 14, 2013
- Carl Zeiss SMT GmbH
- Ralf Mueller
- G02 - OPTICS
Information Patent Grant
Catadioptric projection objective with tilted deflecting mirrors, p...
- Patent number 8,411,356
- Issue date Apr 2, 2013
- Carl Zeiss SMT GmbH
- Ralf Mueller
- G02 - OPTICS
Information Patent Grant
Optical system
- Patent number 8,379,188
- Issue date Feb 19, 2013
- Carl Zeiss SMT GmbH
- Ralf Mueller
- G02 - OPTICS
Information Patent Grant
High transmission, high aperture catadioptric projection objective...
- Patent number 8,345,222
- Issue date Jan 1, 2013
- Carl Zeiss SMT GmbH
- Daniel Kraehmer
- G02 - OPTICS
Information Patent Grant
Catadioptric projection objective
- Patent number 8,300,211
- Issue date Oct 30, 2012
- Carl Zeiss SMT GmbH
- Alexander Epple
- G02 - OPTICS
Information Patent Grant
Interference systems for microlithgraphic projection exposure systems
- Patent number 8,294,991
- Issue date Oct 23, 2012
- Carl Zeiss SMT GmbH
- Ralf Mueller
- G02 - OPTICS
Information Patent Grant
Polarization-modulating optical element and method for manufacturin...
- Patent number 8,213,079
- Issue date Jul 3, 2012
- Carl Zeiss SMT GmbH
- Daniel Kraehmer
- G02 - OPTICS
Information Patent Grant
Optimization and matching of optical systems by use of orientation...
- Patent number 8,126,669
- Issue date Feb 28, 2012
- Carl Zeiss SMT GmbH
- Michael Totzeck
- G01 - MEASURING TESTING
Information Patent Grant
Catadioptric projection objective with tilted deflecting mirrors, p...
- Patent number 8,027,088
- Issue date Sep 27, 2011
- Carl Zeiss SMT GmbH
- Ralf Mueller
- G02 - OPTICS
Information Patent Grant
Projection objective and projection exposure apparatus for microlit...
- Patent number 7,929,115
- Issue date Apr 19, 2011
- Carl Zeiss SMT GmbH
- Ralf Mueller
- G02 - OPTICS
Information Patent Grant
Polarization-modulating optical element and method for manufacturin...
- Patent number 7,903,333
- Issue date Mar 8, 2011
- Carl Zeiss SMT GmbH
- Daniel Kraehmer
- G02 - OPTICS
Information Patent Grant
Illumination system of a microlithographic projection exposure appa...
- Patent number 7,782,443
- Issue date Aug 24, 2010
- Carl Zeiss SMT AG
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE INCLUDING A REFLECTIVE OPTICAL CO...
- Publication number 20190101832
- Publication date Apr 4, 2019
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Application
ILLUMINATION OPTICAL UNIT FOR EUV PROJECTION LITHOGRAPHY
- Publication number 20170248851
- Publication date Aug 31, 2017
- Carl Zeiss SMT GMBH
- Martin Endres
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF OPERATING A PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY
- Publication number 20160342097
- Publication date Nov 24, 2016
- Carl Zeiss SMT GMBH
- Olaf Conradi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION SYSTEM FOR EUV PROJECTION LITHOGRAPHY
- Publication number 20160252823
- Publication date Sep 1, 2016
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGING OPTICAL UNIT AND PROJECTION EXPOSURE APPARATUS FOR PROJECTI...
- Publication number 20150293457
- Publication date Oct 15, 2015
- Carl Zeiss SMT GMBH
- Alexander Epple
- G02 - OPTICS
Information Patent Application
METHOD OF OPERATING A PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY
- Publication number 20130301024
- Publication date Nov 14, 2013
- Olaf Conradi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGING OPTICAL SYSTEM
- Publication number 20130070227
- Publication date Mar 21, 2013
- Carl Zeiss SMT GMBH
- Ralf Mueller
- G02 - OPTICS
Information Patent Application
METHOD FOR PRODUCING A MIRROR HAVING AT LEAST TWO MIRROR SURFACES,...
- Publication number 20120224186
- Publication date Sep 6, 2012
- Carl Zeiss SMT GMBH
- Jochen HETZLER
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE INCLUDING A REFLECTIVE OPTICAL CO...
- Publication number 20120218536
- Publication date Aug 30, 2012
- Carl Zeiss SMT GMBH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Application
IMAGING OPTICS
- Publication number 20120208115
- Publication date Aug 16, 2012
- Carl Zeiss SMT GMBH
- Ulrich Loering
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE WITH TILTED DEFLECTING MIRRORS, P...
- Publication number 20110304926
- Publication date Dec 15, 2011
- Carl Zeiss SMT GMBH
- Ralf Mueller
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE AND PROJECTION EXPOSURE APPARATUS FOR MICROLIT...
- Publication number 20110164235
- Publication date Jul 7, 2011
- Carl Zeiss SMT GMBH
- Ralf Mueller
- G02 - OPTICS
Information Patent Application
POLARIZATION-MODULATING OPTICAL ELEMENT AND METHOD FOR MANUFACTURIN...
- Publication number 20110109894
- Publication date May 12, 2011
- Carl Zeiss SMT GMBH
- Daniel Kraehmer
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE
- Publication number 20110075121
- Publication date Mar 31, 2011
- Carl Zeiss SMT AG
- Alexander Epple
- G02 - OPTICS
Information Patent Application
ILLUMINATION SYSTEM OF A MICROLOTHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20100277708
- Publication date Nov 4, 2010
- Carl Zeiss SMT AG
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM
- Publication number 20100231888
- Publication date Sep 16, 2010
- Carl Zeiss SMT AG
- Ralf Mueller
- G02 - OPTICS
Information Patent Application
ILLUMINATION SYSTEM OF A MICROLOTHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20100157268
- Publication date Jun 24, 2010
- Carl Zeiss SMT AG
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20100134891
- Publication date Jun 3, 2010
- Carl Zeiss SMT AG
- Ralf Mueller
- G02 - OPTICS
Information Patent Application
HIGH TRANSMISSION, HIGH APERTURE CATADIOPTRIC PROJECTION OBJECTIVE...
- Publication number 20100097592
- Publication date Apr 22, 2010
- Carl Zeiss SMT AG
- Daniel Kraehmer
- G02 - OPTICS
Information Patent Application
SPECIFICATION, OPTIMIZATION AND MATCHING OF OPTICAL SYSTEMS BY USE...
- Publication number 20090306921
- Publication date Dec 10, 2009
- Carl Zeiss SMT AG
- Michael Totzeck
- G01 - MEASURING TESTING
Information Patent Application
PROJECTION OBJECTIVE AND PROJECTION EXPOSURE APPARATUS FOR MICROLIT...
- Publication number 20080297884
- Publication date Dec 4, 2008
- Carl Zeiss SMT AG
- Ralf Mueller
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE WITH TILTED DEFLECTING MIRRORS, P...
- Publication number 20080158665
- Publication date Jul 3, 2008
- Carl Zeiss SMT AG
- Ralf Mueller
- G02 - OPTICS
Information Patent Application
POLARIZATION-MODULATING OPTICAL ELEMENT AND METHOD FOR MANUFACTURIN...
- Publication number 20070211246
- Publication date Sep 13, 2007
- Carl Zeiss SMT AG
- Daniel Kraehmer
- G02 - OPTICS
Information Patent Application
Optical element, in particular for an objective or an illumination...
- Publication number 20070007491
- Publication date Jan 11, 2007
- Ralf Mueller
- G02 - OPTICS

Ralf Mueller

Person

Patents Grantslast 30 patents

Catadioptric projection objective including a reflective optical co...

Method of operating a projection exposure tool for microlithography

Catadioptric projection objective including a reflective optical co...

Imaging optical unit and projection exposure apparatus for projecti...

Illumination optical unit for EUV projection lithography

Mirror of a projection exposure apparatus for microlithography with...

Method of operating a projection exposure tool for microlithography

Imaging optical system

Imaging optics

Illumination system of a microlithographic projection exposure appa...

Projection objective and projection exposure apparatus for microlit...

Catadioptric projection objective with tilted deflecting mirrors, p...

Optical system

High transmission, high aperture catadioptric projection objective...

Catadioptric projection objective

Interference systems for microlithgraphic projection exposure systems

Polarization-modulating optical element and method for manufacturin...

Optimization and matching of optical systems by use of orientation...

Catadioptric projection objective with tilted deflecting mirrors, p...

Projection objective and projection exposure apparatus for microlit...

Polarization-modulating optical element and method for manufacturin...

Illumination system of a microlithographic projection exposure appa...

Patents Applicationslast 30 patents

CATADIOPTRIC PROJECTION OBJECTIVE INCLUDING A REFLECTIVE OPTICAL CO...

ILLUMINATION OPTICAL UNIT FOR EUV PROJECTION LITHOGRAPHY

METHOD OF OPERATING A PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY

ILLUMINATION SYSTEM FOR EUV PROJECTION LITHOGRAPHY

IMAGING OPTICAL UNIT AND PROJECTION EXPOSURE APPARATUS FOR PROJECTI...

METHOD OF OPERATING A PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY

IMAGING OPTICAL SYSTEM

METHOD FOR PRODUCING A MIRROR HAVING AT LEAST TWO MIRROR SURFACES,...

CATADIOPTRIC PROJECTION OBJECTIVE INCLUDING A REFLECTIVE OPTICAL CO...

IMAGING OPTICS

CATADIOPTRIC PROJECTION OBJECTIVE WITH TILTED DEFLECTING MIRRORS, P...

PROJECTION OBJECTIVE AND PROJECTION EXPOSURE APPARATUS FOR MICROLIT...

POLARIZATION-MODULATING OPTICAL ELEMENT AND METHOD FOR MANUFACTURIN...

CATADIOPTRIC PROJECTION OBJECTIVE

ILLUMINATION SYSTEM OF A MICROLOTHOGRAPHIC PROJECTION EXPOSURE APPA...

OPTICAL SYSTEM

ILLUMINATION SYSTEM OF A MICROLOTHOGRAPHIC PROJECTION EXPOSURE APPA...

OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

HIGH TRANSMISSION, HIGH APERTURE CATADIOPTRIC PROJECTION OBJECTIVE...

SPECIFICATION, OPTIMIZATION AND MATCHING OF OPTICAL SYSTEMS BY USE...

PROJECTION OBJECTIVE AND PROJECTION EXPOSURE APPARATUS FOR MICROLIT...

CATADIOPTRIC PROJECTION OBJECTIVE WITH TILTED DEFLECTING MIRRORS, P...

POLARIZATION-MODULATING OPTICAL ELEMENT AND METHOD FOR MANUFACTURIN...

Optical element, in particular for an objective or an illumination...